GB1288049A - - Google Patents
Info
- Publication number
- GB1288049A GB1288049A GB5980369A GB5980369A GB1288049A GB 1288049 A GB1288049 A GB 1288049A GB 5980369 A GB5980369 A GB 5980369A GB 5980369 A GB5980369 A GB 5980369A GB 1288049 A GB1288049 A GB 1288049A
- Authority
- GB
- United Kingdom
- Prior art keywords
- target
- sio
- substrate
- layer
- signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910004298 SiO 2 Inorganic materials 0.000 abstract 7
- 239000000758 substrate Substances 0.000 abstract 3
- 238000010894 electron beam technology Methods 0.000 abstract 2
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
- H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
- H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/36—Photoelectric screens; Charge-storage screens
- H01J29/39—Charge-storage screens
- H01J29/41—Charge-storage screens using secondary emission, e.g. for supericonoscope
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02258—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by anodic treatment, e.g. anodic oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
- H01L21/3165—Inorganic layers composed of oxides or glassy oxides or oxide based glass formed by oxidation
- H01L21/31654—Inorganic layers composed of oxides or glassy oxides or oxide based glass formed by oxidation of semiconductor materials, e.g. the body itself
- H01L21/3167—Inorganic layers composed of oxides or glassy oxides or oxide based glass formed by oxidation of semiconductor materials, e.g. the body itself of anodic oxidation
- H01L21/31675—Inorganic layers composed of oxides or glassy oxides or oxide based glass formed by oxidation of semiconductor materials, e.g. the body itself of anodic oxidation of silicon
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
- Semiconductor Memories (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US84069869A | 1969-07-10 | 1969-07-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1288049A true GB1288049A (xx) | 1972-09-06 |
Family
ID=25282989
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5980369A Expired GB1288049A (xx) | 1969-07-10 | 1969-12-08 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3631294A (xx) |
| CA (1) | CA1006568A (xx) |
| DE (1) | DE1964058B2 (xx) |
| FR (1) | FR2034086A1 (xx) |
| GB (1) | GB1288049A (xx) |
| NL (1) | NL7000313A (xx) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4490643A (en) * | 1969-01-08 | 1984-12-25 | Rca Corporation | Storage device having a semiconductor target |
| US3886530A (en) * | 1969-06-02 | 1975-05-27 | Massachusetts Inst Technology | Signal storage device |
| US4302703A (en) * | 1969-11-10 | 1981-11-24 | Bell Telephone Laboratories, Incorporated | Video storage system |
| US3737715A (en) * | 1970-02-02 | 1973-06-05 | Rca Corp | Bistable storage device and method of operation utilizing a storage target exhibiting electrical breakdown |
| US3740465A (en) * | 1971-06-14 | 1973-06-19 | Rca Corp | Television frame storage apparatus |
| US3892454A (en) * | 1972-06-28 | 1975-07-01 | Raytheon Co | Method of forming silicon storage target |
| US4051406A (en) * | 1974-01-02 | 1977-09-27 | Princeton Electronic Products, Inc. | Electronic storage tube target having a radiation insensitive layer |
| US3940651A (en) * | 1974-03-08 | 1976-02-24 | Princeton Electronics Products, Inc. | Target structure for electronic storage tubes of the coplanar grid type having a grid structure of at least one pedestal mounted layer |
| JPS50137028A (xx) * | 1974-04-17 | 1975-10-30 | ||
| JPS5136017A (ja) * | 1974-09-20 | 1976-03-26 | Matsushita Electronics Corp | Nidenshijugatasosahenkankan |
| JPS5252519A (en) * | 1975-10-27 | 1977-04-27 | Matsushita Electric Ind Co Ltd | Pickup storage tube and camera equipment |
| US4389591A (en) * | 1978-02-08 | 1983-06-21 | Matsushita Electric Industrial Company, Limited | Image storage target and image pick-up and storage tube |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2859376A (en) * | 1955-05-19 | 1958-11-04 | Bell Telephone Labor Inc | Electron discharge storage device |
| GB881471A (en) * | 1957-02-28 | 1961-11-01 | Emi Ltd | Improvements relating to colour-picture reproducing cathode ray tubes |
| US3293474A (en) * | 1963-08-01 | 1966-12-20 | Tektronix Inc | Phosphor dielectric storage target for cathode ray tube |
| US3277333A (en) * | 1963-12-13 | 1966-10-04 | Itt | Storage tube system and method |
| US3339099A (en) * | 1966-05-31 | 1967-08-29 | Tektronix Inc | Combined direct viewing storage target and fluorescent screen display structure |
| US3401293A (en) * | 1966-11-28 | 1968-09-10 | Tektronix Inc | Mesa type combined direct viewing storage target and fluorescent screen for cathode ray tube |
| US3428850A (en) * | 1967-09-12 | 1969-02-18 | Bell Telephone Labor Inc | Cathode ray storage devices |
| US3480482A (en) * | 1967-10-18 | 1969-11-25 | Hughes Aircraft Co | Method for making storage targets for cathode ray tubes |
-
1969
- 1969-07-10 US US840698A patent/US3631294A/en not_active Expired - Lifetime
- 1969-12-08 GB GB5980369A patent/GB1288049A/en not_active Expired
- 1969-12-09 CA CA069,407A patent/CA1006568A/en not_active Expired
- 1969-12-11 FR FR6942885A patent/FR2034086A1/fr not_active Withdrawn
- 1969-12-22 DE DE19691964058 patent/DE1964058B2/de not_active Withdrawn
-
1970
- 1970-01-09 NL NL7000313A patent/NL7000313A/xx not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| US3631294A (en) | 1971-12-28 |
| DE1964058B2 (de) | 1972-04-20 |
| CA1006568A (en) | 1977-03-08 |
| FR2034086A1 (xx) | 1970-12-11 |
| DE1964058A1 (de) | 1971-01-28 |
| NL7000313A (xx) | 1971-01-12 |
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| US3921022A (en) | Field emitting device and method of making same | |
| US3670213A (en) | Semiconductor photosensitive device with a rare earth oxide compound forming a rectifying junction | |
| GB1288049A (xx) | ||
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| US2877376A (en) | Phosphor screen device | |
| US3886530A (en) | Signal storage device | |
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| EP0068111A2 (en) | Method of forming a cathode structure | |
| US3737715A (en) | Bistable storage device and method of operation utilizing a storage target exhibiting electrical breakdown | |
| US3646391A (en) | Image-transducing storage tube | |
| US3046440A (en) | Signal storage arrangements | |
| Kalibjian | Space-charge temporal broadening effects in streak-camera tubes | |
| US3902181A (en) | Reproducing system employing an electron tube as a charge recording tube | |
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| EP0038865A1 (en) | Electron beam storage apparatus | |
| US3950669A (en) | Erasing method for storage tube employing raster scan | |
| US3940651A (en) | Target structure for electronic storage tubes of the coplanar grid type having a grid structure of at least one pedestal mounted layer | |
| US3493803A (en) | Dielectric coated mesh storage target having conductive regions co-terminous with the mesh for use in scan converter tubes | |
| US2934673A (en) | Image control tube | |
| US3873873A (en) | Digital storage tube target structure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |