GB1282168A - Method of vapour growing ternary epitaxial films - Google Patents
Method of vapour growing ternary epitaxial filmsInfo
- Publication number
- GB1282168A GB1282168A GB43734/69A GB4373469A GB1282168A GB 1282168 A GB1282168 A GB 1282168A GB 43734/69 A GB43734/69 A GB 43734/69A GB 4373469 A GB4373469 A GB 4373469A GB 1282168 A GB1282168 A GB 1282168A
- Authority
- GB
- United Kingdom
- Prior art keywords
- vapours
- substrate
- source
- sept
- furnaces
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/54—Accessories
- G03B21/64—Means for mounting individual pictures to be projected, e.g. frame for transparency
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/064—Gp II-VI compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
1282168 Semi-conductors INTERNATIONAL BUSINESS MACHINES CORP 4 Sept 1969 [27 Sept 1968] 43734/69 Heading H1K [Also in Division C7] A cooled substrate 58 of, e.g. Cd-Te, Pb-Te or Sn-Te is coated with a ternary epitaxial film of a Group II-VI compound, e.g. Cd-Te-Hg by heating the elements and passing the vapours with a transport gas, which does not react with the vapours, e.g. hydrogen, argon or a mixture thereof, over the substrate, the temperature of the vapours being such as to inhibit binary reactions. In an example hydrogen from a source 13 is first vented through the apparatus, and the substrate back-etched, during this operation, the source furnaces 10, 12 are switched on and the heating coil 52 is moved against the coil 51 and both heated to the same temperature. The coils are then separated and with the sources furnaces 10, 11, 12 in operation vapours pass through the mixing furnace 14, having baffles 47, 48, 49, to the substrate. After deposition, the source furnace 12 is left on to prevent Hg volatilizing during cooling.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US76314768A | 1968-09-27 | 1968-09-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1282168A true GB1282168A (en) | 1972-07-19 |
Family
ID=25067001
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB43734/69A Expired GB1282168A (en) | 1968-09-27 | 1969-09-04 | Method of vapour growing ternary epitaxial films |
Country Status (5)
Country | Link |
---|---|
US (1) | US3619282A (en) |
JP (1) | JPS4949310B1 (en) |
CA (1) | CA918548A (en) |
FR (1) | FR2018988A1 (en) |
GB (1) | GB1282168A (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3779803A (en) * | 1969-11-17 | 1973-12-18 | Ibm | Infrared sensitive semiconductor device and method of manufacture |
US3884788A (en) * | 1973-08-30 | 1975-05-20 | Honeywell Inc | Substrate preparation for liquid phase epitaxy of mercury cadmium telluride |
JPS512828A (en) * | 1974-06-26 | 1976-01-10 | Matsushita Electric Ind Co Ltd | |
US3987772A (en) * | 1975-03-10 | 1976-10-26 | Texas Instruments Incorporated | Self-regulating heater |
US4115163A (en) * | 1976-01-08 | 1978-09-19 | Yulia Ivanovna Gorina | Method of growing epitaxial semiconductor films utilizing radiant heating |
US4107515A (en) * | 1976-09-09 | 1978-08-15 | Texas Instruments Incorporated | Compact PTC resistor |
JPS5541505U (en) * | 1978-09-08 | 1980-03-17 | ||
JPS5954739U (en) * | 1982-10-01 | 1984-04-10 | トヨタ自動車株式会社 | Internal combustion engine intake air heating device |
US4568397A (en) * | 1984-09-12 | 1986-02-04 | Raytheon Company | Metalorganic vapor phase epitaxial growth of group II-VI semiconductor materials |
FR2599558B1 (en) * | 1986-05-27 | 1988-09-02 | Labo Electronique Physique | METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE, INCLUDING THE DEPOSITION IN VAPOR PHASE OF LAYERS ON A SUBSTRATE |
US4886683A (en) * | 1986-06-20 | 1989-12-12 | Raytheon Company | Low temperature metalorganic chemical vapor depostion growth of group II-VI semiconductor materials |
US4950358A (en) * | 1986-07-07 | 1990-08-21 | Santa Barbara Research Center | Vapor phase epitaxy of semiconductor material in a quasi-open system |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1233833B (en) * | 1961-03-27 | 1967-02-09 | Philips Nv | Method for producing a single crystal, in particular a semiconductor single crystal |
NL279828A (en) * | 1961-07-05 | |||
FR1447257A (en) * | 1965-05-25 | 1966-07-29 | Centre Nat Rech Scient | Method for depositing volatile materials by crystal growth on solid supports |
US3420704A (en) * | 1966-08-19 | 1969-01-07 | Nasa | Depositing semiconductor films utilizing a thermal gradient |
US3462323A (en) * | 1966-12-05 | 1969-08-19 | Monsanto Co | Process for the preparation of compound semiconductors |
-
1968
- 1968-09-27 US US763147A patent/US3619282A/en not_active Expired - Lifetime
-
1969
- 1969-06-23 CA CA055031A patent/CA918548A/en not_active Expired
- 1969-08-19 FR FR6928461A patent/FR2018988A1/fr not_active Withdrawn
- 1969-09-04 GB GB43734/69A patent/GB1282168A/en not_active Expired
- 1969-09-26 JP JP44076297A patent/JPS4949310B1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE1944985A1 (en) | 1970-05-27 |
CA918548A (en) | 1973-01-09 |
US3619282A (en) | 1971-11-09 |
DE1944985B2 (en) | 1972-10-26 |
FR2018988A1 (en) | 1970-06-26 |
JPS4949310B1 (en) | 1974-12-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |