GB1275577A - Arrangement and method for controlling the displacements of a wafer or like sample in electronic apparatus - Google Patents
Arrangement and method for controlling the displacements of a wafer or like sample in electronic apparatusInfo
- Publication number
- GB1275577A GB1275577A GB5122669A GB5122669A GB1275577A GB 1275577 A GB1275577 A GB 1275577A GB 5122669 A GB5122669 A GB 5122669A GB 5122669 A GB5122669 A GB 5122669A GB 1275577 A GB1275577 A GB 1275577A
- Authority
- GB
- United Kingdom
- Prior art keywords
- wafer
- circuit
- specimen
- interferometers
- servo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006073 displacement reaction Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000010894 electron beam technology Methods 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 abstract 1
- 238000005305 interferometry Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D3/00—Control of position or direction
- G05D3/12—Control of position or direction using feedback
- G05D3/20—Control of position or direction using feedback using a digital comparing device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Automation & Control Theory (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR171342 | 1968-10-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1275577A true GB1275577A (en) | 1972-05-24 |
Family
ID=8656116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5122669A Expired GB1275577A (en) | 1968-10-25 | 1969-10-17 | Arrangement and method for controlling the displacements of a wafer or like sample in electronic apparatus |
Country Status (4)
Country | Link |
---|---|
DE (1) | DE1953712C3 (xx) |
FR (1) | FR1587573A (xx) |
GB (1) | GB1275577A (xx) |
SE (1) | SE362987B (xx) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2133930A (en) * | 1983-01-08 | 1984-08-01 | Canon Kk | Workpiece carriages |
WO2007001900A1 (en) * | 2005-06-23 | 2007-01-04 | Lewis George C | System and method for positioning an object |
CN107665827A (zh) * | 2016-07-29 | 2018-02-06 | 上海微电子装备(集团)股份有限公司 | 芯片键合装置和方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8204450A (nl) * | 1982-11-17 | 1984-06-18 | Philips Nv | Verplaatsingsinrichting, in het bijzonder voor het stralingslithografisch behandelen van een substraat. |
US5140242A (en) * | 1990-04-30 | 1992-08-18 | International Business Machines Corporation | Servo guided stage system |
ATE175089T1 (de) * | 1992-11-16 | 1999-01-15 | Winterhalter Gastronom Gmbh | Geschirrspülmaschine |
-
1968
- 1968-10-25 FR FR1587573D patent/FR1587573A/fr not_active Expired
-
1969
- 1969-10-17 GB GB5122669A patent/GB1275577A/en not_active Expired
- 1969-10-23 SE SE1453669A patent/SE362987B/xx unknown
- 1969-10-24 DE DE19691953712 patent/DE1953712C3/de not_active Expired
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2133930A (en) * | 1983-01-08 | 1984-08-01 | Canon Kk | Workpiece carriages |
WO2007001900A1 (en) * | 2005-06-23 | 2007-01-04 | Lewis George C | System and method for positioning an object |
US7298495B2 (en) | 2005-06-23 | 2007-11-20 | Lewis George C | System and method for positioning an object through use of a rotating laser metrology system |
CN107665827A (zh) * | 2016-07-29 | 2018-02-06 | 上海微电子装备(集团)股份有限公司 | 芯片键合装置和方法 |
CN107665827B (zh) * | 2016-07-29 | 2020-01-24 | 上海微电子装备(集团)股份有限公司 | 芯片键合装置和方法 |
Also Published As
Publication number | Publication date |
---|---|
FR1587573A (xx) | 1970-03-20 |
SE362987B (xx) | 1973-12-27 |
DE1953712B2 (de) | 1979-09-06 |
DE1953712C3 (de) | 1980-06-26 |
DE1953712A1 (de) | 1970-06-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3900737A (en) | Electron beam exposure system | |
US3648048A (en) | System and method for positioning a wafer coated with photoresist and for controlling the displacements of said wafer in a scanning electron apparatus | |
GB1193297A (en) | Device for the Fine Adjustment of Photomasks with respect to Semiconductor Elements | |
SE7514083L (sv) | Anordning for programmerad uppritning av monster pa ett substrat | |
US4621371A (en) | Method of forming by projection an integrated circuit pattern on a semiconductor wafer | |
US3922546A (en) | Electron beam pattern generator | |
GB1160353A (en) | Radiation Beam Apparatus. | |
JPS6335094B2 (xx) | ||
US3797935A (en) | Systems for writing patterns on photosensitive substrates | |
GB1275577A (en) | Arrangement and method for controlling the displacements of a wafer or like sample in electronic apparatus | |
GB1361804A (en) | Alignment of members to electron beams | |
US2868993A (en) | Apparatus for reproducing a pattern outline | |
US3301949A (en) | Stored image control system for beam machining | |
US3518083A (en) | Method and apparatus for producing photolithographic structures,particularly on semiconductor crystal surfaces | |
GB1280328A (en) | Improvements in or relating to corpuscular beam apparatus | |
US3840749A (en) | Method and apparatus for electron beam alignment with a semiconductor member | |
US4530064A (en) | Exposure method utilizing an energy beam | |
GB2041639B (en) | Electron beam lithography | |
FR2365879A1 (fr) | Procede pour representer l'image de diffraction dans un microscope a balayage a transmission, a faisceau corpusculaire | |
GB1425610A (en) | Mask alignment in manufacturing semiconductor integrated circuits | |
EP0130497B1 (en) | Alignment technique for a scanning beam | |
US3643098A (en) | Mark-sensing photosensor | |
US2877298A (en) | Apparatus for producing printing forms with variable reproduction scale | |
GB939261A (en) | Improvements in or relating to methods of producing three-dimensional articles that are similar to three-dimensional originals | |
GB786092A (en) | Cathode ray character tracer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |