GB1259537A - - Google Patents

Info

Publication number
GB1259537A
GB1259537A GB1259537DA GB1259537A GB 1259537 A GB1259537 A GB 1259537A GB 1259537D A GB1259537D A GB 1259537DA GB 1259537 A GB1259537 A GB 1259537A
Authority
GB
United Kingdom
Prior art keywords
pattern
patterns
photo
plate
array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1259537A publication Critical patent/GB1259537A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
GB1259537D 1969-09-12 1969-09-12 Expired GB1259537A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4508569 1969-09-12

Publications (1)

Publication Number Publication Date
GB1259537A true GB1259537A (de) 1972-01-05

Family

ID=10435825

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1259537D Expired GB1259537A (de) 1969-09-12 1969-09-12

Country Status (1)

Country Link
GB (1) GB1259537A (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408875A (en) * 1980-12-29 1983-10-11 Fujitsu Limited Method of projecting circuit patterns
US4603974A (en) * 1984-03-05 1986-08-05 Fujitsu Limited Reticle used in semiconductor device fabrication and a method for inspecting a reticle pattern thereon
US4869998A (en) * 1986-05-01 1989-09-26 Smiths Industries Public Limited Company Intergrated circuit substrates

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408875A (en) * 1980-12-29 1983-10-11 Fujitsu Limited Method of projecting circuit patterns
US4603974A (en) * 1984-03-05 1986-08-05 Fujitsu Limited Reticle used in semiconductor device fabrication and a method for inspecting a reticle pattern thereon
US4869998A (en) * 1986-05-01 1989-09-26 Smiths Industries Public Limited Company Intergrated circuit substrates

Similar Documents

Publication Publication Date Title
US3716296A (en) Method and electronic circuit arrangement for producing photomasks
BE750430A (fr) Procede de production d'une emulsion photographique a l'halogenure d'argent. (
BE838332R (fr) Procede de fabrication d'un succedane d'amuse-geule
IL36862A0 (en) A photographic mask,a light sensitive plate suitable for producing same and process for preparing said plate
CA931007A (en) Process for producing photographic patterns on a substrate
GB1259537A (de)
FR2336711A1 (fr) Procede pour former une image en couleur magenta
BE748208A (fr) Panneau a circuit imprime et son procede de fabrication
GB985353A (en) Photo-light painting method and apparatus
GB1233782A (de)
BR7607641A (pt) Processo para formacao de uma imagem em um elemento fotossensivel
GB1206650A (en) Method and apparatus for the production of masks for use in the manufacture of planar transistors and integrated circuits
GB1145987A (en) Improvements in methods of etching
GB1252713A (de)
GB1068856A (en) Improvements in or relating to photographic type composition
GB1323647A (en) Photographic mask
JPS5772327A (en) Formation of resist pattern
FR2285784A1 (fr) Procede de fabrication de cartes de circuit imprime par ensembles de plusieurs cartes
JPS52127A (en) Multi-layer memory
JPS5214348A (en) Film producing method
CH548147A (fr) Procede de fabrication d'un circuit imprime et circuit imprime resultant de ce procede.
BE845241A (fr) Procede de fabrication d'une masse photosensible
BE762323A (fr) Procede de fabrication de bis (benzothiazylsulfene)
GB1293599A (en) Apparatus for use in the production of areal patterns on a substrate, comprising a multibarrel photorepeater
BE744244A (fr) Procede de fabrication de grenaille destinee a des procedes de projection de grenaille

Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees