GB1258647A - - Google Patents

Info

Publication number
GB1258647A
GB1258647A GB1258647DA GB1258647A GB 1258647 A GB1258647 A GB 1258647A GB 1258647D A GB1258647D A GB 1258647DA GB 1258647 A GB1258647 A GB 1258647A
Authority
GB
United Kingdom
Prior art keywords
formula
colloid
group
derivative
vinylidene chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1258647A publication Critical patent/GB1258647A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/38—Dispersants; Agents facilitating spreading
    • G03C1/385—Dispersants; Agents facilitating spreading containing fluorine
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
    • G03C1/93—Macromolecular substances therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Abstract

1,258,647. Photographic organic colloid layers containing polyfluoro compounds. E. I. DU PONT DE NEMOURS & CO. Aug. 19, 1969 [Oct. 16, 1968], No.41265/69. Heading G2C. A photographic material having a reduced tendency to formation of water-repellant spots comprises a support bearing a hydropholic polymer layer carrying an organic colloid layer wherein the colloid layer contains a polyfluorocarbon compound capable of reducing the surface tension of water to 15-20 dynes per sp. cm. and having the formula:- C b -C H -(A)-(Z) where C b represents a perfluoroalkyl chain of at least 5 carbons and which may be interrupted by ether linkages; C H represents a direct bond or an alkylene or oxyalkylene group containing at least 2 carbon atoms in the chain; A represents -CO- or -SO 2 -; Z represents a substituted amino group or the group OY, wherein Y is H, an alkali metal or an ammonium group. The perfluorocarbon compound may be a perfluorocarboxylic acid or derivative thereof of the formula C b -CO-Z or a perfluorosulphonic acid or derivative thereof of the formula:- C b -C H -SO 2 -Z. The colloid may be a waterpermeable organic colloid which may contain radiation-sensitive silver halide or a matted acrylic polymer. The support may be a polyethylene terephthalate film having an anchoring substratum of a vinylidene chloride addition copolymer of at least 35% by weight vinylidene chloride (U. S. A. Specification 2, 779, 684 corresponding to Specification 786,176). The object of the present invention is to prevent areas of the photographic material remaining uncoated after the coating operation due to the presence of oily contaminants.
GB1258647D 1968-10-16 1969-08-19 Expired GB1258647A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US76816968A 1968-10-16 1968-10-16

Publications (1)

Publication Number Publication Date
GB1258647A true GB1258647A (en) 1971-12-30

Family

ID=25081752

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1258647D Expired GB1258647A (en) 1968-10-16 1969-08-19

Country Status (3)

Country Link
US (1) US3589906A (en)
DE (1) DE1950121C3 (en)
GB (1) GB1258647A (en)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3888678A (en) * 1971-07-16 1975-06-10 Eastman Kodak Co Method for adjusting triboelectric charging characteristics of materials
US3850642A (en) * 1971-07-16 1974-11-26 Eastman Kodak Co Multilayer radiation sensitive element having controlled triboelectric charging characteristics
US3775126A (en) * 1972-02-29 1973-11-27 Eastman Kodak Co Light-sensitive element comprising a coating layer containing a mixture of a cationic perfluorinated alkyl and an alkylphenoxypoly(propylene oxide)
IT966734B (en) * 1972-07-24 1974-02-20 Minnesota Mining & Mfg METHOD TO REDUCE THE STATIC LOADABILITY OF PHOTOGRAPHIC LAYERS AND PHOTOGRAPHIC ELEMENTS PHOTOGRAPHIC LAYERS AND PHOTOGRAPHIC ELEMENTS OBTAINED WITH THIS METHOD
US4201586A (en) * 1974-06-17 1980-05-06 Fuji Photo Film Co., Ltd. Photographic light-sensitive material
US4175969A (en) * 1978-03-17 1979-11-27 Gaf Corporation Antistatic photographic X-ray film having a uniform protective surface coating of surfactant oligomer of tetrafluoroethylene
JPS57146248A (en) * 1981-03-04 1982-09-09 Fuji Photo Film Co Ltd Silver halide photographic material
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
JPS5816233A (en) * 1981-07-22 1983-01-29 Fuji Photo Film Co Ltd Photosensitive silver halide material
JPS59116647A (en) 1982-12-13 1984-07-05 Konishiroku Photo Ind Co Ltd Silver halide photosensitive material
DE3782351T2 (en) 1986-03-25 1993-05-27 Konishiroku Photo Ind LIGHT SENSITIVE PHOTOGRAPHIC SILVER HALOGENID MATERIAL USED FOR FAST DEVELOPMENT.
US5122558A (en) * 1986-12-09 1992-06-16 The Dow Chemical Company Static dissipative interpolymers
US4806571A (en) * 1988-05-06 1989-02-21 The Dow Chemical Company Organic composition containing a fluoroalkyl sulfonic acid salt
US5541049A (en) * 1994-06-30 1996-07-30 Minnesota Mining And Manufacturing Company Silver halide photographic material having improved antistatic properties
EP0693709A1 (en) * 1994-07-18 1996-01-24 Minnesota Mining And Manufacturing Company Fluoropolymers and fluorochemical surface active agents for improving the antistatic behaviour of materials and light sensitive material having improved antistatic behaviour
US5576074A (en) * 1995-08-23 1996-11-19 Minnesota Mining And Manufacturing Company Laser write process for making a conductive metal circuit
US5874191A (en) * 1997-06-12 1999-02-23 Eastman Kodak Company Auxiliary layers for imaging elements applied from aqueous coating compositions containing fluoropolymer latex
US5866285A (en) * 1997-06-12 1999-02-02 Eastman Kodak Company Auxiliary layer for imaging elements containing solvent-soluble fluoropolymer
US5866312A (en) * 1997-06-19 1999-02-02 Eastman Kodak Company Photographic element having surface protective layer
US5955250A (en) * 1997-12-16 1999-09-21 Eastman Kodak Company Electrically-conductive overcoat layer for photographic elements
US5888712A (en) * 1997-12-16 1999-03-30 Eastman Kodak Company Electrically-conductive overcoat for photographic elements
EP0967086B1 (en) 1998-06-18 2001-03-21 ILFORD Imaging Switzerland GmbH Recording materials for ink jet printing
US6071688A (en) * 1998-07-29 2000-06-06 Eastman Kodak Company Providing additives to a coating composition by vaporization
US6936075B2 (en) * 2001-01-30 2005-08-30 Milliken Textile substrates for image printing
US20030077959A1 (en) * 2001-10-22 2003-04-24 Elizabeth Cates Textile substrate having coating containing repellant finish chemical, organic cationic material, and sorbant polymer thereon, for image printing
US6749641B2 (en) * 2001-10-22 2004-06-15 Milliken & Company Textile substrate having coating containing multiphase fluorochemical, organic cationic material, and sorbant polymer thereon, for image printing
US7037346B2 (en) 2001-10-22 2006-05-02 Milliken & Company Textile substrate having coating containing multiphase fluorochemical and cationic material thereon for image printing
US6936076B2 (en) 2001-10-22 2005-08-30 Milliken & Company Textile substrate having coating containing multiphase fluorochemical, cationic material, and sorbant polymer thereon, for image printing
US20030141487A1 (en) * 2001-12-26 2003-07-31 Eastman Kodak Company Composition containing electronically conductive polymer particles
US6699648B2 (en) 2002-03-27 2004-03-02 Eastman Kodak Company Modified antistatic compositions and thermally developable materials containing same
US6762013B2 (en) 2002-10-04 2004-07-13 Eastman Kodak Company Thermally developable materials containing fluorochemical conductive layers
EP2155830A1 (en) * 2007-05-23 2010-02-24 3M Innovative Properties Company Aqueous compositions of fluorinated surfactants and methods of using the same
WO2008154345A1 (en) * 2007-06-06 2008-12-18 3M Innovative Properties Company Fluorinated ether compositions and methods of using the same
JP2011528659A (en) * 2008-07-18 2011-11-24 スリーエム イノベイティブ プロパティズ カンパニー Fluorinated ether compounds and methods of use thereof
JP2012509937A (en) * 2008-11-25 2012-04-26 スリーエム イノベイティブ プロパティズ カンパニー Fluorinated ether urethane and method of use thereof
CN102317403A (en) 2008-12-18 2012-01-11 3M创新有限公司 Method of contacting hydrocarbon-bearing formations with fluorinated ether compositions
CN114466881A (en) * 2019-09-26 2022-05-10 大金工业株式会社 Fluorinated polyether-based compound

Also Published As

Publication number Publication date
DE1950121C3 (en) 1979-08-30
DE1950121B2 (en) 1979-01-04
DE1950121A1 (en) 1970-04-16
US3589906A (en) 1971-06-29

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Legal Events

Date Code Title Description
414F Notice of opposition given (sect. 14/1949)
PS Patent sealed [section 19, patents act 1949]
414A Case decided by the comptroller ** specification amended (sect. 14/1949)
SPA Amended specification published
PS Patent sealed [section 19, patents act 1949]
PE20 Patent expired after termination of 20 years