GB1205566A - Light sensitive compositions - Google Patents

Light sensitive compositions

Info

Publication number
GB1205566A
GB1205566A GB4358066A GB4358066A GB1205566A GB 1205566 A GB1205566 A GB 1205566A GB 4358066 A GB4358066 A GB 4358066A GB 4358066 A GB4358066 A GB 4358066A GB 1205566 A GB1205566 A GB 1205566A
Authority
GB
United Kingdom
Prior art keywords
acid
nylon
azide
sept
developed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4358066A
Inventor
Wojciech Maria Przezdziecki
Hans Max Wagner
Edward Bowes Knott
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Ltd
Original Assignee
Kodak Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Ltd filed Critical Kodak Ltd
Priority to GB4358066A priority Critical patent/GB1205566A/en
Priority to BE704446D priority patent/BE704446A/xx
Priority to DE19671597545 priority patent/DE1597545C/en
Publication of GB1205566A publication Critical patent/GB1205566A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1,205,566. Photographic materials. KODAK Ltd. Sept.29, 1967 [Sept.29, 1966], No.43580/66. Heading G2C. A photographic material contains an azide which does not have acid groups, a polymer with amide groups and an acid which is an aromatic or unsaturated aliphatic or alicyclic carboxylic or sulphonic acid e.g. phthalic acid, 5 -norbonene 2, 3-dicarboxylic acid and hexachloro-5 [2: 2: 1]- bicycloheptene 2-3-di carboxylic acid. In the examples, a solution of methoxymethyl nylon, an azide, an acid such as ethyl-N-acryloyl glycine or cis-4-cyclohexane-1, 2-dicarboxylic acid and optionally a thiapyrylium sensitizer is coated on a support and imagewise exposed. If the material is developed with alkali, the exposed areas are removed to produce a positive plate whereas development with an organic solvent for the nylon produces a negative plate. A copolymer of methyl acrylate and N-acrylryl-N'-butyl-glycinamide may be used instead of methoxymethyl nylon. If a positive image is produced, the remaining photo-sensitive areas may be imagewise exposed and developed with ethanol to produce a second negative image.
GB4358066A 1966-09-29 1966-09-29 Light sensitive compositions Expired GB1205566A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB4358066A GB1205566A (en) 1966-09-29 1966-09-29 Light sensitive compositions
BE704446D BE704446A (en) 1966-09-29 1967-09-28
DE19671597545 DE1597545C (en) 1966-09-29 1967-09-29 Photographic recording material!

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4358066A GB1205566A (en) 1966-09-29 1966-09-29 Light sensitive compositions

Publications (1)

Publication Number Publication Date
GB1205566A true GB1205566A (en) 1970-09-16

Family

ID=10429390

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4358066A Expired GB1205566A (en) 1966-09-29 1966-09-29 Light sensitive compositions

Country Status (2)

Country Link
BE (1) BE704446A (en)
GB (1) GB1205566A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4036644A (en) 1973-03-16 1977-07-19 International Business Machines Corporation Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
US4106943A (en) * 1973-09-27 1978-08-15 Japan Synthetic Rubber Co., Ltd. Photosensitive cross-linkable azide containing polymeric composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4036644A (en) 1973-03-16 1977-07-19 International Business Machines Corporation Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
US4106943A (en) * 1973-09-27 1978-08-15 Japan Synthetic Rubber Co., Ltd. Photosensitive cross-linkable azide containing polymeric composition

Also Published As

Publication number Publication date
BE704446A (en) 1968-02-01
DE1597545A1 (en) 1970-06-11

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees