GB1191519A - Microwave Plasma Light Source - Google Patents

Microwave Plasma Light Source

Info

Publication number
GB1191519A
GB1191519A GB58508/67A GB5850867A GB1191519A GB 1191519 A GB1191519 A GB 1191519A GB 58508/67 A GB58508/67 A GB 58508/67A GB 5850867 A GB5850867 A GB 5850867A GB 1191519 A GB1191519 A GB 1191519A
Authority
GB
United Kingdom
Prior art keywords
chamber
lamp
supplied
helium
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB58508/67A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of GB1191519A publication Critical patent/GB1191519A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H01J49/161—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission using photoionisation, e.g. by laser
    • H01J49/162—Direct photo-ionisation, e.g. single photon or multi-photon ionisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/044—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by a separate microwave unit

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Plasma Technology (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)

Abstract

1,191,519. Discharge lamps; ion sources. HITACHI Ltd. 22 Dec., 1967 [28 Dec., 1966]. No. 58508/67. Heading H1D. An electrodeless discharge lamp 1 supplied with helium from a source 7 and energized by microwave energy supplied -to a resonant cavity 8 surrounding the lamp is characterized by the provision of a metal plate 12 adapted to reflect the microwave power and thereby produce standing waves, such waves containing sufficient energy to excite the 304 Š.U. helium line; if the plate 12 is removed by rotation (Fig. 3) or by displacement (Fig. 1, not shown), the usual 584 Š.U. line is excited. When the lamp is to be used as a radiation source the chamber 3 is provided with a window of lithium fluoride (Fig. 1, not shown); this is replaced by a slit when the 304 Š.U. line is generated. In Fig. 3 the lamp is used to photo-ionize a gas supplied to the ion source of a mass spectrometer 27 and is connected to the ion source chamber 19 by a tube 18 which is sufficiently small to isolate the atmospheres in chambers 3 and 19 from each other. The pressure in chamber 19 may be 10<SP>-4</SP> mm., whereas chamber 3 may be kept at a pressure of 10<SP>-3</SP>-10<SP>-5</SP> mm. by the evacuation system 5; the lamp chamber 1 may be supplied with helium at 0À1-5 mm. pressure, and communicates with the chamber 3 through apertures in the end wall and in the plate 12. The intensity of the radiation may be measured by allowing it to fall on a gold target 25 and measuring the current from a collector electrode 26.
GB58508/67A 1966-12-28 1967-12-22 Microwave Plasma Light Source Expired GB1191519A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8533466 1966-12-28

Publications (1)

Publication Number Publication Date
GB1191519A true GB1191519A (en) 1970-05-13

Family

ID=13855725

Family Applications (1)

Application Number Title Priority Date Filing Date
GB58508/67A Expired GB1191519A (en) 1966-12-28 1967-12-22 Microwave Plasma Light Source

Country Status (2)

Country Link
US (1) US3541372A (en)
GB (1) GB1191519A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0321792A2 (en) * 1987-12-23 1989-06-28 Hewlett-Packard Company Microwave resonant cavity
EP0395798A2 (en) * 1989-05-01 1990-11-07 Hewlett-Packard Company Microwave resonant cavity
GB2462506A (en) * 2008-08-11 2010-02-17 Agilent Technologies Inc Variable energy photo-ionisation device and method for mass spectrometry
GB2586686A (en) * 2019-05-13 2021-03-03 Micromass Ltd Aperture plate assembly

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3641389A (en) * 1969-11-05 1972-02-08 Varian Associates High-power microwave excited plasma discharge lamp
US3806728A (en) * 1970-05-27 1974-04-23 C Lindholm Electron impact spectrometer with an improved source of monochromatic electrons
US3911318A (en) * 1972-03-29 1975-10-07 Fusion Systems Corp Method and apparatus for generating electromagnetic radiation
US3872349A (en) * 1973-03-29 1975-03-18 Fusion Systems Corp Apparatus and method for generating radiation
CA1024246A (en) * 1973-08-22 1978-01-10 Donald M. Spero Apparatus and method for generating radiation
US4053783A (en) * 1974-10-29 1977-10-11 University Patents, Inc. X-ray laser utilizing gas jet
DE2952046C2 (en) * 1979-12-22 1982-04-15 Deutsche Forschungs- und Versuchsanstalt für Luft- und Raumfahrt e.V., 5300 Bonn Method and device for generating an electrical discharge in a gas flowing at supersonic speed
JPS56126250A (en) * 1980-03-10 1981-10-03 Mitsubishi Electric Corp Light source device of micro wave discharge
DE3147986C2 (en) * 1981-12-04 1992-02-27 Leybold-Heraeus GmbH, 5000 Köln Device for generating a microwave plasma for the treatment of substrates, in particular for the plasma polymerization of monomers
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
AU574435B2 (en) * 1984-03-02 1988-07-07 Mitsubishi Denki Kabushiki Kaisha Microwave discharge light source apparatus
US4746799A (en) * 1986-07-30 1988-05-24 Mcmillan Michael R Atomic jet radiation source
US4792732A (en) * 1987-06-12 1988-12-20 United States Of America As Represented By The Secretary Of The Air Force Radio frequency plasma generator
US20100327155A1 (en) * 2007-10-31 2010-12-30 Agilent Technologies, Inc. Micro-plasma Illumination Device and Method
FR2952786B1 (en) * 2009-11-17 2012-06-08 Centre Nat Rech Scient PLASMA TORCH AND METHOD OF STABILIZING A PLASMA TORCH
US8736174B2 (en) * 2010-01-15 2014-05-27 Agilent Technologies, Inc. Plasma generation device with split-ring resonator and electrode extensions
US8217343B2 (en) * 2010-01-26 2012-07-10 Agilent Technologies, Inc. Device and method using microplasma array for ionizing samples for mass spectrometry

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2882493A (en) * 1953-10-27 1959-04-14 Robert H Dicke Gas cells for microwave spectroscopy and frequency-stabilization
US2811644A (en) * 1955-01-26 1957-10-29 Rca Corp Gas resonance system
US3280364A (en) * 1963-03-05 1966-10-18 Hitachi Ltd High-frequency discharge plasma generator utilizing an auxiliary flame to start, maintain and stop the main flame
US3374393A (en) * 1965-02-12 1968-03-19 Melpar Inc Intense incoherent light source obtained by quenching the higher excited states and concentrating the energy on the lower states
NL6613076A (en) * 1966-09-16 1968-03-18

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0321792A2 (en) * 1987-12-23 1989-06-28 Hewlett-Packard Company Microwave resonant cavity
EP0321792A3 (en) * 1987-12-23 1991-03-20 Hewlett-Packard Company Microwave resonant cavity
EP0395798A2 (en) * 1989-05-01 1990-11-07 Hewlett-Packard Company Microwave resonant cavity
EP0395798A3 (en) * 1989-05-01 1991-03-20 Hewlett-Packard Company Microwave resonant cavity
GB2462506A (en) * 2008-08-11 2010-02-17 Agilent Technologies Inc Variable energy photo-ionisation device and method for mass spectrometry
GB2462506B (en) * 2008-08-11 2013-03-20 Agilent Technologies Inc Variable energy photoionization device and method for mass spectrometry
GB2586686A (en) * 2019-05-13 2021-03-03 Micromass Ltd Aperture plate assembly
GB2586686B (en) * 2019-05-13 2023-08-16 Micromass Ltd Aperture plate assembly

Also Published As

Publication number Publication date
US3541372A (en) 1970-11-17

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees