GB1181750A - An Ultrahigh-Vacuum Enclosure - Google Patents

An Ultrahigh-Vacuum Enclosure

Info

Publication number
GB1181750A
GB1181750A GB59444/68A GB5944468A GB1181750A GB 1181750 A GB1181750 A GB 1181750A GB 59444/68 A GB59444/68 A GB 59444/68A GB 5944468 A GB5944468 A GB 5944468A GB 1181750 A GB1181750 A GB 1181750A
Authority
GB
United Kingdom
Prior art keywords
chamber
enclosure
skirt
vacuum
acting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB59444/68A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of GB1181750A publication Critical patent/GB1181750A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D8/00Cold traps; Cold baffles
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/06Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
    • F04B37/08Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1,181,750. Vacuum chambers; producing vacuum. COMMISSARIAT A L'ENERGIE ATOMIQUE. Dec. 13, 1968 [Jan.5, 1968], No.59444/68. Headings FIN and FIX. An ultrahigh-vacuum enclosure, e.g. for deposition of metals by evaporation, comprises a casing 1 supporting a removable bell housing 26 and incorporating a cryogenic vacuum pump, which can be isolated from the rest of the enclosure by a skirt 7 when the enclosure is opened by removing housing 26. Skirt 7 is moved downwardly to its closed position, from its open position shown, by pneumatic jacks 43, 44, acting through a rod 33 carrying sealing pistons 37, 50. Guide wheels 47 on skirt 7 run on rods 45. The cryogenic pump comprises an outer annular chamber 17, 18, 19 containing liquid nitrogen, surrounding an annular chamber 20 containing liquid helium, annular plates 22 extending from chamber 20 acting as condensation trays. A radiation shield 21 of thin metal surrounds chamber 17, 18 and 19, and a radiation shield 49 of flat or herringbone fins, Figs.2 and 3 (not shown), thermally insulates chamber 20 from the casing interior.
GB59444/68A 1968-01-05 1968-12-13 An Ultrahigh-Vacuum Enclosure Expired GB1181750A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR135093 1968-01-05

Publications (1)

Publication Number Publication Date
GB1181750A true GB1181750A (en) 1970-02-18

Family

ID=8644212

Family Applications (1)

Application Number Title Priority Date Filing Date
GB59444/68A Expired GB1181750A (en) 1968-01-05 1968-12-13 An Ultrahigh-Vacuum Enclosure

Country Status (8)

Country Link
US (1) US3512369A (en)
BE (1) BE725393A (en)
DE (1) DE1900454A1 (en)
ES (1) ES362123A1 (en)
FR (1) FR1557891A (en)
GB (1) GB1181750A (en)
LU (1) LU57621A1 (en)
NL (1) NL6900130A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2319035A1 (en) * 1975-07-22 1977-02-18 Physimeca Vessel evacuation appts. using cryogenic pump - has gas molecule trap plate connected to vessel by double walled cooled nozzle
US4311018A (en) * 1979-12-17 1982-01-19 Varian Associates, Inc. Cryogenic pump
US4438632A (en) * 1982-07-06 1984-03-27 Helix Technology Corporation Means for periodic desorption of a cryopump
US4763483A (en) * 1986-07-17 1988-08-16 Helix Technology Corporation Cryopump and method of starting the cryopump
US4907413A (en) * 1988-06-02 1990-03-13 Grumman Aerospace Corporation Regenerable cryosorption pump with movable physical barrier and physical barrier thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2737779A (en) * 1946-05-24 1956-03-13 Ernest O Lawrence Condensable vapor extraction apparatus
US3360949A (en) * 1965-09-20 1968-01-02 Air Reduction Cryopumping configuration
US3327491A (en) * 1966-06-08 1967-06-27 Andonian Associates Inc Windowless vacuum chamber for exposing a cooled device to successive samplers

Also Published As

Publication number Publication date
DE1900454A1 (en) 1969-09-04
NL6900130A (en) 1969-07-08
FR1557891A (en) 1969-02-21
US3512369A (en) 1970-05-19
ES362123A1 (en) 1970-11-01
LU57621A1 (en) 1969-04-08
BE725393A (en) 1969-05-16

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