GB1166724A - Photosensitive Material Containing Scribe Layers - Google Patents
Photosensitive Material Containing Scribe LayersInfo
- Publication number
- GB1166724A GB1166724A GB753067A GB753067A GB1166724A GB 1166724 A GB1166724 A GB 1166724A GB 753067 A GB753067 A GB 753067A GB 753067 A GB753067 A GB 753067A GB 1166724 A GB1166724 A GB 1166724A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- ultraviolet
- acrylic resin
- scraper
- dye image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 5
- 229920000178 Acrylic resin Polymers 0.000 abstract 3
- 239000004925 Acrylic resin Substances 0.000 abstract 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 abstract 2
- 239000011230 binding agent Substances 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- CSUUDNFYSFENAE-UHFFFAOYSA-N (2-methoxyphenyl)-phenylmethanone Chemical compound COC1=CC=CC=C1C(=O)C1=CC=CC=C1 CSUUDNFYSFENAE-UHFFFAOYSA-N 0.000 abstract 1
- 235000021355 Stearic acid Nutrition 0.000 abstract 1
- 230000002745 absorbent Effects 0.000 abstract 1
- 239000002250 absorbent Substances 0.000 abstract 1
- 150000008360 acrylonitriles Chemical class 0.000 abstract 1
- CEGOLXSVJUTHNZ-UHFFFAOYSA-K aluminium tristearate Chemical compound [Al+3].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CEGOLXSVJUTHNZ-UHFFFAOYSA-K 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 229910000019 calcium carbonate Inorganic materials 0.000 abstract 1
- 229920002678 cellulose Polymers 0.000 abstract 1
- 150000001989 diazonium salts Chemical class 0.000 abstract 1
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 abstract 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 abstract 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
- 238000007790 scraping Methods 0.000 abstract 1
- 239000008117 stearic acid Substances 0.000 abstract 1
- 229920001169 thermoplastic Polymers 0.000 abstract 1
- 239000004416 thermosoftening plastic Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US52837166A | 1966-02-18 | 1966-02-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1166724A true GB1166724A (en) | 1969-10-08 |
Family
ID=24105415
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB753067A Expired GB1166724A (en) | 1966-02-18 | 1967-02-16 | Photosensitive Material Containing Scribe Layers |
Country Status (7)
| Country | Link |
|---|---|
| AT (1) | AT279348B (enrdf_load_stackoverflow) |
| BE (1) | BE694123A (enrdf_load_stackoverflow) |
| CH (1) | CH479897A (enrdf_load_stackoverflow) |
| DE (1) | DE1572097A1 (enrdf_load_stackoverflow) |
| FR (1) | FR1511518A (enrdf_load_stackoverflow) |
| GB (1) | GB1166724A (enrdf_load_stackoverflow) |
| NL (1) | NL6702429A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2127571A (en) * | 1982-09-22 | 1984-04-11 | Keuffel & Esser Co | Diazotype compositions |
| EP0368630A3 (en) * | 1988-11-10 | 1991-06-12 | Somar Corporation | Masking film |
| US5368962A (en) * | 1988-11-10 | 1994-11-29 | Somar Corporation | Masking film |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2721687C2 (de) * | 1977-05-13 | 1986-11-20 | Hoechst Ag, 6230 Frankfurt | Verfahren zum Abdecken von Kopiervorlagen mit Masken |
-
1967
- 1967-02-11 DE DE19671572097 patent/DE1572097A1/de active Pending
- 1967-02-15 AT AT149367A patent/AT279348B/de not_active IP Right Cessation
- 1967-02-15 BE BE694123D patent/BE694123A/xx unknown
- 1967-02-16 FR FR95175A patent/FR1511518A/fr not_active Expired
- 1967-02-16 GB GB753067A patent/GB1166724A/en not_active Expired
- 1967-02-17 NL NL6702429A patent/NL6702429A/xx unknown
- 1967-02-17 CH CH237767A patent/CH479897A/de not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2127571A (en) * | 1982-09-22 | 1984-04-11 | Keuffel & Esser Co | Diazotype compositions |
| EP0368630A3 (en) * | 1988-11-10 | 1991-06-12 | Somar Corporation | Masking film |
| US5368962A (en) * | 1988-11-10 | 1994-11-29 | Somar Corporation | Masking film |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1572097A1 (de) | 1970-02-19 |
| BE694123A (enrdf_load_stackoverflow) | 1967-08-16 |
| AT279348B (de) | 1970-03-10 |
| NL6702429A (enrdf_load_stackoverflow) | 1967-08-21 |
| FR1511518A (fr) | 1968-01-26 |
| CH479897A (de) | 1969-10-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |