GB1163324A - - Google Patents

Info

Publication number
GB1163324A
GB1163324A GB1163324DA GB1163324A GB 1163324 A GB1163324 A GB 1163324A GB 1163324D A GB1163324D A GB 1163324DA GB 1163324 A GB1163324 A GB 1163324A
Authority
GB
United Kingdom
Prior art keywords
oct
formula
sodium hypobromite
group
sulphoxides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1163324A publication Critical patent/GB1163324A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/675Compositions containing polyhalogenated compounds as photosensitive substances
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/62Benzothiazoles
    • C07D277/68Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D277/70Sulfur atoms
    • C07D277/76Sulfur atoms attached to a second hetero atom

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Indole Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
GB1163324D 1965-10-20 1966-10-14 Expired GB1163324A (ro)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6406965 1965-10-20

Publications (1)

Publication Number Publication Date
GB1163324A true GB1163324A (ro) 1969-09-04

Family

ID=13247420

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1163324D Expired GB1163324A (ro) 1965-10-20 1966-10-14

Country Status (7)

Country Link
US (1) US3502476A (ro)
BE (1) BE688466A (ro)
CH (1) CH470003A (ro)
DE (1) DE1572089A1 (ro)
FR (1) FR1499525A (ro)
GB (1) GB1163324A (ro)
NL (1) NL6614847A (ro)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5217843A (en) * 1989-03-11 1993-06-08 Hoechst Aktiengesellschaft Positive radiation-sensitive mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation
US5286602A (en) * 1991-04-20 1994-02-15 Hoechst Aktiengesellschaft Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture
US5338641A (en) * 1989-09-09 1994-08-16 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound
US5340682A (en) * 1989-09-09 1994-08-23 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound
EP0622666A1 (en) * 1993-04-29 1994-11-02 Minnesota Mining And Manufacturing Company Post-processing stabilizers for photothermographic articles
US5424166A (en) * 1990-02-28 1995-06-13 Hoechst Aktiengesellschaft Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom
US5614351A (en) * 1989-03-11 1997-03-25 Hoechst Aktiengesellschaft Radiation-curable mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3988159A (en) * 1967-07-28 1976-10-26 American Can Company Light-sensitive material containing nitrone for forming heat-fixed images
US3765883A (en) * 1970-02-04 1973-10-16 Canon Kk Organic photoconductors sensitized with free radical liberators and organometallic compounds
US3847607A (en) * 1970-02-04 1974-11-12 Canon Kk Organic photoconductors sensitized by free radical liberators and organometallic compounds
JPS5113569B1 (ro) * 1970-11-05 1976-04-30
JPS4923885B1 (ro) * 1970-12-19 1974-06-19
US4042388A (en) * 1972-03-15 1977-08-16 Canon Kabushiki Kaisha Process for the preparation of sensitized material for electrophotography
GB1431435A (en) * 1972-07-10 1976-04-07 Agfa Gevaert Image recording process including image stabilization
US3923521A (en) * 1973-01-31 1975-12-02 Horizons Inc Ultraviolet holdback of nonsilver photosensitive systems by incorporating therein certain organic additives
US3907569A (en) * 1973-01-31 1975-09-23 Horizons Inc Ultraviolet holdback of nonsilver photosensitive systems by incorporating therein certain organic additives
US4251622A (en) * 1973-05-25 1981-02-17 Nippon Paint Co., Ltd. Photo-sensitive composition for dry formation of image
US3935012A (en) * 1973-07-12 1976-01-27 Minnesota Mining And Manufacturing Company Photosensitive sheet materials
US4039332A (en) * 1973-09-20 1977-08-02 Agfa-Gevaert N.V. Stabilization of photosensitive recording material
DE2433373A1 (de) * 1974-07-11 1976-01-29 Agfa Gevaert Ag Lichtempfindliches material
GB1587823A (en) * 1976-11-18 1981-04-08 Agfa Gevaert High intensity photon image recording
JPS5555335A (en) * 1978-10-19 1980-04-23 Fuji Photo Film Co Ltd Photosensitive composition
US4247625A (en) * 1978-12-20 1981-01-27 Eastman Kodak Company Imaging processes, elements and compositions featuring dye-retaining binders for reaction products of cobalt complexes and aromatic dialdehyde
US4252884A (en) * 1979-08-14 1981-02-24 James River Graphics, Inc. Negative-working diazotype photoreproduction
US4368254A (en) * 1979-08-20 1983-01-11 Vannikov Anatoly V Non-silver light-sensitive composition
US4370401A (en) * 1979-12-07 1983-01-25 Minnesota Mining And Manufacturing Company Light sensitive, thermally developable imaging system
US4460677A (en) * 1981-03-26 1984-07-17 Minnesota Mining And Manufacturing Company Visible light sensitive, thermally developable imaging systems
US4386154A (en) * 1981-03-26 1983-05-31 Minnesota Mining And Manufacturing Company Visible light sensitive, thermally developable imaging systems
US4705729A (en) * 1984-11-19 1987-11-10 Hewlett-Packard Company Method for photochemically enhancing resolution in photolithography processes
DE4142956C2 (de) * 1991-12-24 1996-08-14 Du Pont Deutschland Bleichbares Lichthofschutzsystem für photographische Aufzeichnungsmaterialien
CA2120838A1 (en) * 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US5865471A (en) 1993-08-05 1999-02-02 Kimberly-Clark Worldwide, Inc. Photo-erasable data processing forms
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5643356A (en) * 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5739175A (en) * 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US5685754A (en) * 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
US5849411A (en) * 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
RU2170943C2 (ru) 1995-06-05 2001-07-20 Кимберли-Кларк Уорлдвайд, Инк. Новые прекрасители
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
US5811199A (en) * 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5798015A (en) * 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5747550A (en) * 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
JP2000506550A (ja) 1995-06-28 2000-05-30 キンバリー クラーク ワールドワイド インコーポレイテッド 新規な着色剤および着色剤用改質剤
CA2210480A1 (en) 1995-11-28 1997-06-05 Kimberly-Clark Worldwide, Inc. Improved colorant stabilizers
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
EP1062285A2 (en) 1998-06-03 2000-12-27 Kimberly-Clark Worldwide, Inc. Neonanoplasts and microemulsion technology for inks and ink jet printing
BR9906513A (pt) 1998-06-03 2001-10-30 Kimberly Clark Co Fotoiniciadores novos e aplicações para osmesmos
US6228157B1 (en) 1998-07-20 2001-05-08 Ronald S. Nohr Ink jet ink compositions
DE69930948T2 (de) 1998-09-28 2006-09-07 Kimberly-Clark Worldwide, Inc., Neenah Chelate mit chinoiden gruppen als photoinitiatoren
ATE238393T1 (de) 1999-01-19 2003-05-15 Kimberly Clark Co Farbstoffe, farbstoffstabilisatoren, tintenzusammensetzungen und verfahren zu deren herstellung
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
MXPA02012011A (es) 2000-06-19 2003-04-22 Kimberly Clark Co Fotoiniciaodres novedosos y aplicaciones para los mismos.

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL295582A (ro) * 1962-07-25

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5217843A (en) * 1989-03-11 1993-06-08 Hoechst Aktiengesellschaft Positive radiation-sensitive mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation
US5614351A (en) * 1989-03-11 1997-03-25 Hoechst Aktiengesellschaft Radiation-curable mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation
US5338641A (en) * 1989-09-09 1994-08-16 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound
US5340682A (en) * 1989-09-09 1994-08-23 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound
US5424166A (en) * 1990-02-28 1995-06-13 Hoechst Aktiengesellschaft Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom
US5286602A (en) * 1991-04-20 1994-02-15 Hoechst Aktiengesellschaft Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture
EP0622666A1 (en) * 1993-04-29 1994-11-02 Minnesota Mining And Manufacturing Company Post-processing stabilizers for photothermographic articles
US5464737A (en) * 1993-04-29 1995-11-07 Minnesota Mining And Manufacturing Company Post-processing stabilizers for photothermographic articles

Also Published As

Publication number Publication date
NL6614847A (ro) 1967-04-21
BE688466A (ro) 1967-04-19
DE1572089A1 (ro) 1970-12-23
FR1499525A (fr) 1967-10-27
CH470003A (de) 1969-03-15
US3502476A (en) 1970-03-24

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees