GB1150747A - Nitrogen-Containing Sulphonic Acids and Their Use in the Electrodeposition of Copper - Google Patents
Nitrogen-Containing Sulphonic Acids and Their Use in the Electrodeposition of CopperInfo
- Publication number
- GB1150747A GB1150747A GB51710/65A GB5171065A GB1150747A GB 1150747 A GB1150747 A GB 1150747A GB 51710/65 A GB51710/65 A GB 51710/65A GB 5171065 A GB5171065 A GB 5171065A GB 1150747 A GB1150747 A GB 1150747A
- Authority
- GB
- United Kingdom
- Prior art keywords
- radical
- alkyl
- nitrogen
- sulphonic acids
- electrodeposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
- C07D277/62—Benzothiazoles
- C07D277/68—Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
- C07D277/70—Sulfur atoms
- C07D277/74—Sulfur atoms substituted by carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
1,150,747. Nitrogen-containing sulphonic acids. F. I. NOBEL, and B. D. OSTROW. 6 Dec., 1965 [19 Oct., 1965], No. 51710/65. Heading C2C. [Also in Division C7] Novel compounds of the general formula G(RCHO) m -(CH 2 ) n SO 3 M wherein R is H or a C 1 -C 3 alkyl radical, m is an integer of at least 1 and n is 3-8, M is H, Na or K and G is a radical of the general formula in which R 1 is an aromatic radical or its alkyl derivative or a cyclic alkyl radical and R 2 and R 3 are alkyl radicals or may be joined together to form with the nitrogen atom a saturated heterocyclic ring, are prepared by reacting a compound containing one of the groupings (a) -N=C(S)S- or (b) =N-CSS- where linked to one S and N in (a) may be an aromatic or cyclic alkyl radical and to the N in (b) may be linked 2 alkyl radicals or a cyclic alkyl radical, with an alkyl aldehyde in alkaline solution and subsequently adding a sultone.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US498084A US3414493A (en) | 1965-10-19 | 1965-10-19 | Electrodeposition of copper |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1150747A true GB1150747A (en) | 1969-04-30 |
Family
ID=23979541
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB51710/65A Expired GB1150747A (en) | 1965-10-19 | 1965-12-06 | Nitrogen-Containing Sulphonic Acids and Their Use in the Electrodeposition of Copper |
Country Status (3)
Country | Link |
---|---|
US (1) | US3414493A (en) |
FR (1) | FR1479049A (en) |
GB (1) | GB1150747A (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3923613A (en) * | 1972-02-22 | 1975-12-02 | Kampschulte & Cie Dr W | Acidic galvanic copper bath |
US3725220A (en) * | 1972-04-27 | 1973-04-03 | Lea Ronal Inc | Electrodeposition of copper from acidic baths |
US4134803A (en) * | 1977-12-21 | 1979-01-16 | R. O. Hull & Company, Inc. | Nitrogen and sulfur compositions and acid copper plating baths |
US4376685A (en) * | 1981-06-24 | 1983-03-15 | M&T Chemicals Inc. | Acid copper electroplating baths containing brightening and leveling additives |
DE3323476A1 (en) * | 1982-07-01 | 1984-01-05 | Kollmorgen Technologies Corp., 75201 Dallas, Tex. | IMPROVED METHOD FOR GALVANIC METAL DEPOSITION ON NON-METALLIC SURFACES |
US4786746A (en) * | 1987-09-18 | 1988-11-22 | Pennsylvania Research Corporation | Copper electroplating solutions and methods of making and using them |
US4948474A (en) * | 1987-09-18 | 1990-08-14 | Pennsylvania Research Corporation | Copper electroplating solutions and methods |
DE10123210C1 (en) | 2001-05-12 | 2002-10-02 | Clariant Gmbh | New ether carboxylic acids and salts derived from alkoxylated mercaptobenzothiazoles are used as corrosion inhibitors in metal working and petroleum and natural gas recovery and processing |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2891065A (en) * | 1959-06-16 | Production of sulfonic acid derivatives | ||
NL298381A (en) * | 1953-09-19 | |||
DE1007592B (en) * | 1955-01-19 | 1957-05-02 | Dehydag Gmbh | Bath for the production of galvanic metal coatings |
DE1152863B (en) * | 1957-03-16 | 1963-08-14 | Riedel & Co | Acid baths for the production of leveling copper coatings |
BE572016A (en) * | 1957-11-30 | |||
NL134137C (en) * | 1961-02-02 | |||
DE1184172B (en) * | 1961-08-31 | 1964-12-23 | Dehydag Gmbh | Process for the galvanic deposition of firmly adhering and high-gloss copper coatings |
-
1965
- 1965-10-19 US US498084A patent/US3414493A/en not_active Expired - Lifetime
- 1965-12-06 GB GB51710/65A patent/GB1150747A/en not_active Expired
-
1966
- 1966-05-09 FR FR60784A patent/FR1479049A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR1479049A (en) | 1967-04-28 |
US3414493A (en) | 1968-12-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PLNP | Patent lapsed through nonpayment of renewal fees |