GB1148426A - Electron beam apparatus including filament current control means - Google Patents

Electron beam apparatus including filament current control means

Info

Publication number
GB1148426A
GB1148426A GB57022/67A GB5702267A GB1148426A GB 1148426 A GB1148426 A GB 1148426A GB 57022/67 A GB57022/67 A GB 57022/67A GB 5702267 A GB5702267 A GB 5702267A GB 1148426 A GB1148426 A GB 1148426A
Authority
GB
United Kingdom
Prior art keywords
current
filament
change
signal
amplifier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB57022/67A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1148426A publication Critical patent/GB1148426A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02Electron guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/52Arrangements for controlling intensity of ray or beam, e.g. for modulation

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)

Abstract

1,148,426. Automatic current control of electron beam apparatus. INTERNATIONAL BUSINESS MACHINES CORP. Dec. 15, 1967 [Jan.13, 1967], No.57022/67. Heading G3R. Electron beam apparatus is operated at a desired point on the beam current/filament current characteristic by superimposing on the normal filament working current a cyclic variation of constant amplitude which is small relative to the normal working current, detecting the consequent change in beam current, comparing this change with a reference representative of the change corresponding to operation at the desired point and using the error signal to vary the filament working current to maintain the change at the reference value. As shown the filament 14 of the apparatus 11 is fed from a D. C. supply 31 through parallel-connected transistors 33, 34 which respectively contribute the cyclical and steady components of the filament current, the former component being produced by an oscillator 44 controlling the base of transistor 33. The cyclical beam current change produced by the varying filament current, Fig. 2 (not shown) is detected by a resistor 48 connected between the filament 14 and the high voltage supply 53, the A. C. signal so obtained being amplified, rectified and smoothed in members 59, 60 to produce a D. C. voltage which is applied to a summing amplifier 61 for comparison with a reference voltage obtained from members 66, 67. The error signal is fed through an operating amplifier 69 to the base of transistor 34 to control the steady component of the filament current in accordance with the beam current change. The above-described control system ensures that the most efficient operation of the filament is obtained irrespective of changes in the characteristic due to filament ageing or replacement. To prevent the control system from locking on to the lower (undesired) one (77) of its two stable operating points, Fig. 3 (not shown), the amplifier 61 is provided with a third signal from a terminal 81 through a switch 79 whose state is dependent on the current carried by the transistor 34 (via terminals 82, 84). For values of this current below a predetermined magnitude the switch 79 is closed to apply the third signal to the amplifier 61, but upon reaching this magnitude the switch 79 opens to remove the signal and so allow the system to lock on to the desired operating point (76).
GB57022/67A 1967-01-13 1967-12-15 Electron beam apparatus including filament current control means Expired GB1148426A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US609224A US3413517A (en) 1967-01-13 1967-01-13 Filament current control by a superposed dithering voltage

Publications (1)

Publication Number Publication Date
GB1148426A true GB1148426A (en) 1969-04-10

Family

ID=24439854

Family Applications (1)

Application Number Title Priority Date Filing Date
GB57022/67A Expired GB1148426A (en) 1967-01-13 1967-12-15 Electron beam apparatus including filament current control means

Country Status (8)

Country Link
US (1) US3413517A (en)
BE (1) BE708599A (en)
CH (1) CH462962A (en)
DE (1) DE1591234C3 (en)
FR (1) FR1555891A (en)
GB (1) GB1148426A (en)
NL (1) NL6800569A (en)
SE (1) SE338372B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114556513A (en) * 2019-03-26 2022-05-27 尼康计量公众有限公司 Method for setting filament requirements in an X-ray apparatus, controller, X-ray apparatus, control program and storage medium

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1152224A (en) * 1967-05-15 1969-05-14 Vickers Ltd Electron-Beam Welding
DE2100506C3 (en) * 1970-01-09 1974-02-07 Hitachi, Ltd., Tokio Ion source especially for ion micro-analyzers
DE221138C (en) * 1971-04-30
US3760279A (en) * 1971-09-16 1973-09-18 United States Steel Corp Beam current limiting circuit
US3780256A (en) * 1972-08-08 1973-12-18 Atomic Energy Commission Method for producing spike-free electron beam partial penetration welds
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
US4020318A (en) * 1975-01-24 1977-04-26 The Welding Institute Electron beam generators
DE2637628C2 (en) * 1976-08-20 1982-03-11 Siemens AG, 1000 Berlin und 8000 München Circuit arrangement for feeding the cathode heating of tubes, in particular television tubes, with direct current
US4167676A (en) * 1978-02-21 1979-09-11 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
DE2844183C2 (en) * 1978-10-10 1984-09-13 Messer Griesheim Gmbh, 6000 Frankfurt Method and device for setting the cathode heating current in a technical electron beam device
JPS5731134A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Drawing device by electron beam
US4464564A (en) * 1982-10-27 1984-08-07 Conoco Inc. Current controller for heating stage on leitz microscope
US4754200A (en) * 1985-09-09 1988-06-28 Applied Materials, Inc. Systems and methods for ion source control in ion implanters
US4743767A (en) * 1985-09-09 1988-05-10 Applied Materials, Inc. Systems and methods for ion implantation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU37811A1 (en) * 1958-10-27
US3072822A (en) * 1961-05-19 1963-01-08 Julian C Holmes Emission current regulator
US3320474A (en) * 1963-11-01 1967-05-16 Gen Electric Emission current regulated power supply for thermionic filament
US3315124A (en) * 1964-08-14 1967-04-18 Gen Electric Transistorized constant emission current regulator using a resonant transformer in the power supply
US3346769A (en) * 1965-10-07 1967-10-10 Nat Res Corp Orbiting vacuum pump power supply with a filament current regulator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114556513A (en) * 2019-03-26 2022-05-27 尼康计量公众有限公司 Method for setting filament requirements in an X-ray apparatus, controller, X-ray apparatus, control program and storage medium

Also Published As

Publication number Publication date
US3413517A (en) 1968-11-26
NL6800569A (en) 1968-07-15
CH462962A (en) 1968-09-30
FR1555891A (en) 1969-01-31
DE1591234C3 (en) 1975-10-23
DE1591234B2 (en) 1975-03-20
BE708599A (en) 1968-05-02
DE1591234A1 (en) 1970-08-20
SE338372B (en) 1971-09-06

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