GB1148426A - Electron beam apparatus including filament current control means - Google Patents
Electron beam apparatus including filament current control meansInfo
- Publication number
- GB1148426A GB1148426A GB57022/67A GB5702267A GB1148426A GB 1148426 A GB1148426 A GB 1148426A GB 57022/67 A GB57022/67 A GB 57022/67A GB 5702267 A GB5702267 A GB 5702267A GB 1148426 A GB1148426 A GB 1148426A
- Authority
- GB
- United Kingdom
- Prior art keywords
- current
- filament
- change
- signal
- amplifier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 3
- 230000032683 aging Effects 0.000 abstract 1
- 125000004122 cyclic group Chemical group 0.000 abstract 1
- 230000001419 dependent effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/52—Arrangements for controlling intensity of ray or beam, e.g. for modulation
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
Abstract
1,148,426. Automatic current control of electron beam apparatus. INTERNATIONAL BUSINESS MACHINES CORP. Dec. 15, 1967 [Jan.13, 1967], No.57022/67. Heading G3R. Electron beam apparatus is operated at a desired point on the beam current/filament current characteristic by superimposing on the normal filament working current a cyclic variation of constant amplitude which is small relative to the normal working current, detecting the consequent change in beam current, comparing this change with a reference representative of the change corresponding to operation at the desired point and using the error signal to vary the filament working current to maintain the change at the reference value. As shown the filament 14 of the apparatus 11 is fed from a D. C. supply 31 through parallel-connected transistors 33, 34 which respectively contribute the cyclical and steady components of the filament current, the former component being produced by an oscillator 44 controlling the base of transistor 33. The cyclical beam current change produced by the varying filament current, Fig. 2 (not shown) is detected by a resistor 48 connected between the filament 14 and the high voltage supply 53, the A. C. signal so obtained being amplified, rectified and smoothed in members 59, 60 to produce a D. C. voltage which is applied to a summing amplifier 61 for comparison with a reference voltage obtained from members 66, 67. The error signal is fed through an operating amplifier 69 to the base of transistor 34 to control the steady component of the filament current in accordance with the beam current change. The above-described control system ensures that the most efficient operation of the filament is obtained irrespective of changes in the characteristic due to filament ageing or replacement. To prevent the control system from locking on to the lower (undesired) one (77) of its two stable operating points, Fig. 3 (not shown), the amplifier 61 is provided with a third signal from a terminal 81 through a switch 79 whose state is dependent on the current carried by the transistor 34 (via terminals 82, 84). For values of this current below a predetermined magnitude the switch 79 is closed to apply the third signal to the amplifier 61, but upon reaching this magnitude the switch 79 opens to remove the signal and so allow the system to lock on to the desired operating point (76).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US609224A US3413517A (en) | 1967-01-13 | 1967-01-13 | Filament current control by a superposed dithering voltage |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1148426A true GB1148426A (en) | 1969-04-10 |
Family
ID=24439854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB57022/67A Expired GB1148426A (en) | 1967-01-13 | 1967-12-15 | Electron beam apparatus including filament current control means |
Country Status (8)
Country | Link |
---|---|
US (1) | US3413517A (en) |
BE (1) | BE708599A (en) |
CH (1) | CH462962A (en) |
DE (1) | DE1591234C3 (en) |
FR (1) | FR1555891A (en) |
GB (1) | GB1148426A (en) |
NL (1) | NL6800569A (en) |
SE (1) | SE338372B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114556513A (en) * | 2019-03-26 | 2022-05-27 | 尼康计量公众有限公司 | Method for setting filament requirements in an X-ray apparatus, controller, X-ray apparatus, control program and storage medium |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1152224A (en) * | 1967-05-15 | 1969-05-14 | Vickers Ltd | Electron-Beam Welding |
DE2100506C3 (en) * | 1970-01-09 | 1974-02-07 | Hitachi, Ltd., Tokio | Ion source especially for ion micro-analyzers |
DE221138C (en) * | 1971-04-30 | |||
US3760279A (en) * | 1971-09-16 | 1973-09-18 | United States Steel Corp | Beam current limiting circuit |
US3780256A (en) * | 1972-08-08 | 1973-12-18 | Atomic Energy Commission | Method for producing spike-free electron beam partial penetration welds |
US3801792A (en) * | 1973-05-23 | 1974-04-02 | Bell Telephone Labor Inc | Electron beam apparatus |
US4020318A (en) * | 1975-01-24 | 1977-04-26 | The Welding Institute | Electron beam generators |
DE2637628C2 (en) * | 1976-08-20 | 1982-03-11 | Siemens AG, 1000 Berlin und 8000 München | Circuit arrangement for feeding the cathode heating of tubes, in particular television tubes, with direct current |
US4167676A (en) * | 1978-02-21 | 1979-09-11 | Bell Telephone Laboratories, Incorporated | Variable-spot scanning in an electron beam exposure system |
DE2844183C2 (en) * | 1978-10-10 | 1984-09-13 | Messer Griesheim Gmbh, 6000 Frankfurt | Method and device for setting the cathode heating current in a technical electron beam device |
JPS5731134A (en) * | 1980-08-01 | 1982-02-19 | Hitachi Ltd | Drawing device by electron beam |
US4464564A (en) * | 1982-10-27 | 1984-08-07 | Conoco Inc. | Current controller for heating stage on leitz microscope |
US4754200A (en) * | 1985-09-09 | 1988-06-28 | Applied Materials, Inc. | Systems and methods for ion source control in ion implanters |
US4743767A (en) * | 1985-09-09 | 1988-05-10 | Applied Materials, Inc. | Systems and methods for ion implantation |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
LU37811A1 (en) * | 1958-10-27 | |||
US3072822A (en) * | 1961-05-19 | 1963-01-08 | Julian C Holmes | Emission current regulator |
US3320474A (en) * | 1963-11-01 | 1967-05-16 | Gen Electric | Emission current regulated power supply for thermionic filament |
US3315124A (en) * | 1964-08-14 | 1967-04-18 | Gen Electric | Transistorized constant emission current regulator using a resonant transformer in the power supply |
US3346769A (en) * | 1965-10-07 | 1967-10-10 | Nat Res Corp | Orbiting vacuum pump power supply with a filament current regulator |
-
1967
- 1967-01-13 US US609224A patent/US3413517A/en not_active Expired - Lifetime
- 1967-12-15 GB GB57022/67A patent/GB1148426A/en not_active Expired
- 1967-12-19 FR FR1555891D patent/FR1555891A/fr not_active Expired
- 1967-12-27 BE BE708599D patent/BE708599A/xx unknown
- 1967-12-30 DE DE1591234A patent/DE1591234C3/en not_active Expired
-
1968
- 1968-01-11 CH CH35768A patent/CH462962A/en unknown
- 1968-01-12 NL NL6800569A patent/NL6800569A/xx unknown
- 1968-01-12 SE SE00409/68A patent/SE338372B/xx unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114556513A (en) * | 2019-03-26 | 2022-05-27 | 尼康计量公众有限公司 | Method for setting filament requirements in an X-ray apparatus, controller, X-ray apparatus, control program and storage medium |
Also Published As
Publication number | Publication date |
---|---|
US3413517A (en) | 1968-11-26 |
NL6800569A (en) | 1968-07-15 |
CH462962A (en) | 1968-09-30 |
FR1555891A (en) | 1969-01-31 |
DE1591234C3 (en) | 1975-10-23 |
DE1591234B2 (en) | 1975-03-20 |
BE708599A (en) | 1968-05-02 |
DE1591234A1 (en) | 1970-08-20 |
SE338372B (en) | 1971-09-06 |
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