GB1147776A - Photomechanical production of printing plates - Google Patents
Photomechanical production of printing platesInfo
- Publication number
- GB1147776A GB1147776A GB34759/66A GB3475966A GB1147776A GB 1147776 A GB1147776 A GB 1147776A GB 34759/66 A GB34759/66 A GB 34759/66A GB 3475966 A GB3475966 A GB 3475966A GB 1147776 A GB1147776 A GB 1147776A
- Authority
- GB
- United Kingdom
- Prior art keywords
- isocyanate
- printing plates
- polyisocyanate
- aug
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012948 isocyanate Substances 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229920001228 polyisocyanate Polymers 0.000 abstract 2
- 239000005056 polyisocyanate Substances 0.000 abstract 2
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Substances CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 2
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 abstract 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 1
- UWRZIZXBOLBCON-UHFFFAOYSA-N 2-phenylethenamine Chemical class NC=CC1=CC=CC=C1 UWRZIZXBOLBCON-UHFFFAOYSA-N 0.000 abstract 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- QORUGOXNWQUALA-UHFFFAOYSA-N N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 Chemical compound N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 QORUGOXNWQUALA-UHFFFAOYSA-N 0.000 abstract 1
- 239000004952 Polyamide Substances 0.000 abstract 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 abstract 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 abstract 1
- 150000003926 acrylamides Chemical class 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 150000002334 glycols Chemical class 0.000 abstract 1
- -1 hexamethylene- Chemical class 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 150000002513 isocyanates Chemical class 0.000 abstract 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229920002647 polyamide Polymers 0.000 abstract 1
- 238000012719 thermal polymerization Methods 0.000 abstract 1
- 229940113165 trimethylolpropane Drugs 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
- C08G69/48—Polymers modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEB0083130 | 1965-08-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1147776A true GB1147776A (en) | 1969-04-10 |
Family
ID=6981819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB34759/66A Expired GB1147776A (en) | 1965-08-04 | 1966-08-03 | Photomechanical production of printing plates |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3486891A (cg-RX-API-DMAC7.html) |
| BE (1) | BE685013A (cg-RX-API-DMAC7.html) |
| CH (1) | CH475582A (cg-RX-API-DMAC7.html) |
| DE (1) | DE1447928A1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB1147776A (cg-RX-API-DMAC7.html) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3645732A (en) * | 1969-05-19 | 1972-02-29 | Keuffel & Esser Co | Etching alcohol-soluble nylon with aqueous solutions |
| US4001016A (en) * | 1971-05-25 | 1977-01-04 | Agfa-Gevaert, A.G. | Polymers which can be cross-linked by photopolymerization |
| GB1388388A (en) * | 1971-06-02 | 1975-03-26 | Agfa Gevaert | Masked isocyanates |
| US3884702A (en) * | 1972-12-14 | 1975-05-20 | Unitika Ltd | Photosensitive polyamide composition |
| US4069056A (en) * | 1974-05-02 | 1978-01-17 | General Electric Company | Photopolymerizable composition containing group Va aromatic onium salts |
| US4269930A (en) * | 1979-11-13 | 1981-05-26 | Matrix Unlimited, Inc. | Photopolymeric composition containing polyamide and dicarboxylic acid diester |
| US4345022A (en) * | 1979-11-13 | 1982-08-17 | Matrix Unlimited, Inc. | Process of recovering unpolymerized photopolymer from printing plates |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1067219B (de) * | 1955-12-19 | 1959-10-15 | Farbenfabriken Bayer Aktiengesellschaft, Leverkusen - Bayerwerk | Verfahren zur Herstellung von durch Lichteinwirkung vernetzenden hochpolymeren Verbindungen |
| US2997391A (en) * | 1957-04-22 | 1961-08-22 | Time Inc | Photosensitive polyamide resins containing stilbene units in the molecule |
| US3103437A (en) * | 1959-04-10 | 1963-09-10 | Hardening | |
| US3147116A (en) * | 1961-11-28 | 1964-09-01 | Gen Aniline & Film Corp | Printing plates comprising hydrophobic resisto formed by crosslinking photopolymerized hydrophilic monomers with an isocyanate |
| US3278305A (en) * | 1963-07-12 | 1966-10-11 | Gevaert Photo Prod Nv | Photochemical cross-linking of polymers |
-
1965
- 1965-08-04 DE DE19651447928 patent/DE1447928A1/de active Pending
-
1966
- 1966-08-02 US US569590A patent/US3486891A/en not_active Expired - Lifetime
- 1966-08-02 CH CH1114966A patent/CH475582A/de not_active IP Right Cessation
- 1966-08-03 GB GB34759/66A patent/GB1147776A/en not_active Expired
- 1966-08-03 BE BE685013D patent/BE685013A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| BE685013A (cg-RX-API-DMAC7.html) | 1967-02-03 |
| CH475582A (de) | 1969-07-15 |
| US3486891A (en) | 1969-12-30 |
| DE1447928A1 (de) | 1968-12-12 |
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