GB1145224A - Glass polishing - Google Patents
Glass polishingInfo
- Publication number
- GB1145224A GB1145224A GB1526267A GB1526267A GB1145224A GB 1145224 A GB1145224 A GB 1145224A GB 1526267 A GB1526267 A GB 1526267A GB 1526267 A GB1526267 A GB 1526267A GB 1145224 A GB1145224 A GB 1145224A
- Authority
- GB
- United Kingdom
- Prior art keywords
- polishing
- glass
- slurry
- zinc salt
- zinc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
1,145,224. Polishing glass. LIBBEYOWENS-FORD GLASS CO. 4 April, 1967, No. 15262/67. Heading B3D. [Also in Division C4] A glass surface is polished by rubbing over it with a soft tool a slurry of water and cerium oxide or iron oxide, the slurry containing a zinc salt. The composition may comprise: The zinc salt is preferably zinc chloride or sulphate; zinc nitrate, bromide, acetate or fluoride may be used. Cerous nitrate or chloride may also be present in the composition. Plate glass blanks 13 are embedded in a layer of plaster 14 on tables 11 moved under rotating grinding tools 15 and rotating polishing runners 16 each including felt covered polishing tools 17. A sand-water mixture is fed through conduits 18 in the shafts 19 of the grinding tools and is removed by a squeegee 21. Slurry containing a zinc salt may be used for all the polishing stations, being supplied through pipes 22; alternatively, this slurry is used only for final polishing, rouge being used for the initial polishing and being removed by a squeegee 24.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1526267A GB1145224A (en) | 1967-04-04 | 1967-04-04 | Glass polishing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1526267A GB1145224A (en) | 1967-04-04 | 1967-04-04 | Glass polishing |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1145224A true GB1145224A (en) | 1969-03-12 |
Family
ID=10055948
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1526267A Expired GB1145224A (en) | 1967-04-04 | 1967-04-04 | Glass polishing |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1145224A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108138029A (en) * | 2015-10-02 | 2018-06-08 | 三星Sdi株式会社 | Organic film CMP slurry constituent and use its grinding method |
CN111315836A (en) * | 2017-11-10 | 2020-06-19 | 三星Sdi株式会社 | Organic film CMP slurry composition and polishing method using the same |
-
1967
- 1967-04-04 GB GB1526267A patent/GB1145224A/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108138029A (en) * | 2015-10-02 | 2018-06-08 | 三星Sdi株式会社 | Organic film CMP slurry constituent and use its grinding method |
CN108138029B (en) * | 2015-10-02 | 2021-05-18 | 三星Sdi株式会社 | Application of organic film CMP slurry composition and polishing method using same |
CN111315836A (en) * | 2017-11-10 | 2020-06-19 | 三星Sdi株式会社 | Organic film CMP slurry composition and polishing method using the same |
CN111315836B (en) * | 2017-11-10 | 2022-03-15 | 三星Sdi株式会社 | Organic film CMP slurry composition and polishing method using the same |
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