GB1144605A - Photolithography - Google Patents

Photolithography

Info

Publication number
GB1144605A
GB1144605A GB19047/66A GB1904766A GB1144605A GB 1144605 A GB1144605 A GB 1144605A GB 19047/66 A GB19047/66 A GB 19047/66A GB 1904766 A GB1904766 A GB 1904766A GB 1144605 A GB1144605 A GB 1144605A
Authority
GB
United Kingdom
Prior art keywords
emulsion
compound
hydrophilic
exposed
photographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB19047/66A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horizons Inc
Original Assignee
Horizons Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horizons Inc filed Critical Horizons Inc
Publication of GB1144605A publication Critical patent/GB1144605A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB19047/66A 1965-07-19 1966-04-29 Photolithography Expired GB1144605A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US473238A US3374094A (en) 1965-07-19 1965-07-19 Lithographic plate made from an n-vinyl-amine and an organic halogen compound dispersed in an hydrophilic colloid

Publications (1)

Publication Number Publication Date
GB1144605A true GB1144605A (en) 1969-03-05

Family

ID=23878729

Family Applications (1)

Application Number Title Priority Date Filing Date
GB19047/66A Expired GB1144605A (en) 1965-07-19 1966-04-29 Photolithography

Country Status (5)

Country Link
US (1) US3374094A (enrdf_load_stackoverflow)
BE (1) BE682454A (enrdf_load_stackoverflow)
DE (1) DE1522483A1 (enrdf_load_stackoverflow)
GB (1) GB1144605A (enrdf_load_stackoverflow)
NL (1) NL6607628A (enrdf_load_stackoverflow)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3495987A (en) * 1965-09-03 1970-02-17 Du Pont Photopolymerizable products
US3443945A (en) * 1965-10-22 1969-05-13 Horizons Research Inc Photosensitive color-forming composition
US3902903A (en) * 1966-03-18 1975-09-02 Keuffel & Esser Co Carbonyl bisulfite adducts as fixers for halogen liberating free radical systems
US3512977A (en) * 1966-07-21 1970-05-19 Bell & Howell Co Carbonyl-bisulfite complex stabilization of light sensitive systems
US3485629A (en) * 1966-07-21 1969-12-23 Bell & Howell Co Photo process
US3512976A (en) * 1966-07-21 1970-05-19 Bell & Howell Co Ammonium and metal sulfites as stabilizers of light sensitive systems
US3544321A (en) * 1966-07-21 1970-12-01 Bell & Howell Co Stabilization of organic photosensitive material
US3544320A (en) * 1966-07-21 1970-12-01 Yoshikazu Yamada Stabilization of light sensitive film with a peroxide,perchlorate or perborate
US3544322A (en) * 1966-07-21 1970-12-01 Yoshikazu Yamada Photosensitive dispersion in a hydrophilic binder incorporating a stabilizer
DE1597784C3 (de) * 1967-08-31 1976-01-02 Hoechst Ag, 6000 Frankfurt Sensibilisierte Druckplatte
US3617288A (en) * 1969-09-12 1971-11-02 Minnesota Mining & Mfg Propenone sensitizers for the photolysis of organic halogen compounds
US3769023A (en) * 1971-05-07 1973-10-30 Horizons Inc Light sensitive reproduction and electron beam sensitive material
US3856531A (en) * 1971-08-02 1974-12-24 Eastman Kodak Co Photographic compositions and processes
US3767409A (en) * 1971-08-02 1973-10-23 Eastman Kodak Co Photographic triorganophosphine-azide dye forming composition and article
US4266481A (en) * 1975-04-07 1981-05-12 The Dow Chemical Company Image-bearing lithographic plates with desensitizing coating
US4200688A (en) * 1975-04-07 1980-04-29 The Dow Chemical Company Method of treating image-bearing lithographic plates
US4186250A (en) * 1975-04-07 1980-01-29 The Dow Chemical Company Method of desensitizing image-bearing lithographic plates
NL7606078A (nl) * 1975-06-12 1976-12-14 Dow Chemical Co Werkwijze voor het bereiden van een bevochti- gingsoplossing voor lithografische drukken.
US4021242A (en) * 1975-08-15 1977-05-03 Horizons Incorporated, A Division Of Horizons Research Incorporated Negative working photoresist material comprising a N-vinyl monomer, an organic halogen compound photoactivator and a maleic anhydride modified rosin and the use thereof
US4143021A (en) * 1976-07-23 1979-03-06 The Dow Chemical Company Composition suitable for use as desensitizing gumming solution for lithographic printing plates
JPS5540406A (en) * 1978-09-14 1980-03-21 Oji Paper Co Ltd Photosensitive lithographic printing plate
US4517276A (en) * 1982-11-29 1985-05-14 Varian Associates, Inc. Metal-containing organic photoresists
US20040134882A1 (en) * 2003-01-15 2004-07-15 Ping Mei UV-curable polymerizable mixture

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2882262A (en) * 1956-05-14 1959-04-14 Eastman Kodak Co N-(acryloxyalkyl)- and n-(methacryloxyalkyl)-2-pyrrolidones and polymers thereof
BE594285A (enrdf_load_stackoverflow) * 1959-08-27
NL263797A (enrdf_load_stackoverflow) * 1960-04-19

Also Published As

Publication number Publication date
US3374094A (en) 1968-03-19
DE1522483A1 (de) 1969-08-28
NL6607628A (enrdf_load_stackoverflow) 1967-01-20
BE682454A (enrdf_load_stackoverflow) 1966-11-14

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