BE682454A - - Google Patents

Info

Publication number
BE682454A
BE682454A BE682454DA BE682454A BE 682454 A BE682454 A BE 682454A BE 682454D A BE682454D A BE 682454DA BE 682454 A BE682454 A BE 682454A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE682454A publication Critical patent/BE682454A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE682454D 1965-07-19 1966-06-13 BE682454A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US473238A US3374094A (en) 1965-07-19 1965-07-19 Lithographic plate made from an n-vinyl-amine and an organic halogen compound dispersed in an hydrophilic colloid

Publications (1)

Publication Number Publication Date
BE682454A true BE682454A (xx) 1966-11-14

Family

ID=23878729

Family Applications (1)

Application Number Title Priority Date Filing Date
BE682454D BE682454A (xx) 1965-07-19 1966-06-13

Country Status (5)

Country Link
US (1) US3374094A (xx)
BE (1) BE682454A (xx)
DE (1) DE1522483A1 (xx)
GB (1) GB1144605A (xx)
NL (1) NL6607628A (xx)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3495987A (en) * 1965-09-03 1970-02-17 Du Pont Photopolymerizable products
US3443945A (en) * 1965-10-22 1969-05-13 Horizons Research Inc Photosensitive color-forming composition
US3902903A (en) * 1966-03-18 1975-09-02 Keuffel & Esser Co Carbonyl bisulfite adducts as fixers for halogen liberating free radical systems
US3512976A (en) * 1966-07-21 1970-05-19 Bell & Howell Co Ammonium and metal sulfites as stabilizers of light sensitive systems
US3544320A (en) * 1966-07-21 1970-12-01 Yoshikazu Yamada Stabilization of light sensitive film with a peroxide,perchlorate or perborate
US3485629A (en) * 1966-07-21 1969-12-23 Bell & Howell Co Photo process
US3512977A (en) * 1966-07-21 1970-05-19 Bell & Howell Co Carbonyl-bisulfite complex stabilization of light sensitive systems
US3544322A (en) * 1966-07-21 1970-12-01 Yoshikazu Yamada Photosensitive dispersion in a hydrophilic binder incorporating a stabilizer
US3544321A (en) * 1966-07-21 1970-12-01 Bell & Howell Co Stabilization of organic photosensitive material
DE1597784C3 (de) * 1967-08-31 1976-01-02 Hoechst Ag, 6000 Frankfurt Sensibilisierte Druckplatte
US3617288A (en) * 1969-09-12 1971-11-02 Minnesota Mining & Mfg Propenone sensitizers for the photolysis of organic halogen compounds
US3769023A (en) * 1971-05-07 1973-10-30 Horizons Inc Light sensitive reproduction and electron beam sensitive material
US3856531A (en) * 1971-08-02 1974-12-24 Eastman Kodak Co Photographic compositions and processes
US3767409A (en) * 1971-08-02 1973-10-23 Eastman Kodak Co Photographic triorganophosphine-azide dye forming composition and article
US4200688A (en) * 1975-04-07 1980-04-29 The Dow Chemical Company Method of treating image-bearing lithographic plates
US4266481A (en) * 1975-04-07 1981-05-12 The Dow Chemical Company Image-bearing lithographic plates with desensitizing coating
US4186250A (en) * 1975-04-07 1980-01-29 The Dow Chemical Company Method of desensitizing image-bearing lithographic plates
NL7606078A (nl) * 1975-06-12 1976-12-14 Dow Chemical Co Werkwijze voor het bereiden van een bevochti- gingsoplossing voor lithografische drukken.
US4021242A (en) * 1975-08-15 1977-05-03 Horizons Incorporated, A Division Of Horizons Research Incorporated Negative working photoresist material comprising a N-vinyl monomer, an organic halogen compound photoactivator and a maleic anhydride modified rosin and the use thereof
US4143021A (en) * 1976-07-23 1979-03-06 The Dow Chemical Company Composition suitable for use as desensitizing gumming solution for lithographic printing plates
JPS5540406A (en) * 1978-09-14 1980-03-21 Oji Paper Co Ltd Photosensitive lithographic printing plate
US4517276A (en) * 1982-11-29 1985-05-14 Varian Associates, Inc. Metal-containing organic photoresists
US20040134882A1 (en) * 2003-01-15 2004-07-15 Ping Mei UV-curable polymerizable mixture

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2882262A (en) * 1956-05-14 1959-04-14 Eastman Kodak Co N-(acryloxyalkyl)- and n-(methacryloxyalkyl)-2-pyrrolidones and polymers thereof
BE594285A (xx) * 1959-08-27
NL263797A (xx) * 1960-04-19

Also Published As

Publication number Publication date
NL6607628A (xx) 1967-01-20
US3374094A (en) 1968-03-19
GB1144605A (en) 1969-03-05
DE1522483A1 (de) 1969-08-28

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