GB1129465A - Method for oxidizing silicon - Google Patents
Method for oxidizing siliconInfo
- Publication number
- GB1129465A GB1129465A GB5753/66A GB575366A GB1129465A GB 1129465 A GB1129465 A GB 1129465A GB 5753/66 A GB5753/66 A GB 5753/66A GB 575366 A GB575366 A GB 575366A GB 1129465 A GB1129465 A GB 1129465A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicon
- feb
- bath
- water
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6304—Formation by oxidation, e.g. oxidation of the substrate
- H10P14/6306—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials
- H10P14/6308—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors
- H10P14/6309—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors of silicon in uncombined form, i.e. pure silicon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6324—Formation by anodic treatments, e.g. anodic oxidation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR5129A FR1432750A (fr) | 1965-02-11 | 1965-02-11 | Procédé d'oxydation du silicium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1129465A true GB1129465A (en) | 1968-10-09 |
Family
ID=8570672
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5753/66A Expired GB1129465A (en) | 1965-02-11 | 1966-02-09 | Method for oxidizing silicon |
Country Status (4)
| Country | Link |
|---|---|
| DE (1) | DE1496762A1 (https=) |
| FR (1) | FR1432750A (https=) |
| GB (1) | GB1129465A (https=) |
| NL (1) | NL6601694A (https=) |
-
1965
- 1965-02-11 FR FR5129A patent/FR1432750A/fr not_active Expired
-
1966
- 1966-02-09 GB GB5753/66A patent/GB1129465A/en not_active Expired
- 1966-02-10 DE DE19661496762 patent/DE1496762A1/de active Pending
- 1966-02-10 NL NL6601694A patent/NL6601694A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE1496762A1 (de) | 1969-08-07 |
| FR1432750A (fr) | 1966-03-25 |
| NL6601694A (https=) | 1966-08-12 |
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