GB1121279A - A process for the production of ultra-finely divided oxides - Google Patents

A process for the production of ultra-finely divided oxides

Info

Publication number
GB1121279A
GB1121279A GB5616667A GB5616667A GB1121279A GB 1121279 A GB1121279 A GB 1121279A GB 5616667 A GB5616667 A GB 5616667A GB 5616667 A GB5616667 A GB 5616667A GB 1121279 A GB1121279 A GB 1121279A
Authority
GB
United Kingdom
Prior art keywords
flame
halide
supplied
metal
finely divided
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5616667A
Inventor
Friedrich Bittner
Helmut Brunner
Dieter Schutte
Jean Diether
Franz Theo Schmitz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Degussa GmbH
Deutsche Gold und Silber Scheideanstalt
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa GmbH, Deutsche Gold und Silber Scheideanstalt filed Critical Degussa GmbH
Priority to GB5616667A priority Critical patent/GB1121279A/en
Publication of GB1121279A publication Critical patent/GB1121279A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
    • C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area

Abstract

Finely divided metal or silicon oxides are prepared by the vapour phase hydrolytic reaction of volatile metal or silicon halides in a flame into which the halide is introduced in admixture with oxygen and a gas whose combustion is accompanied by the formation of water, in such proportions that the mixture contains enough oxygen for the complete combustion of the flammable gas whilst the amount of water formed is at least sufficient to hydrolyse the volatile halide, said flame <PICT:1121279/C1/1> burning in an enclosed reaction zone and being surrounded by a gas inert to the reactions in the flame. In the diagram, the mixture of gases is fed to a burner 11 and the flame 12 burns in a flame tube 13 in an atmosphere of nitrogen supplied by a feed pipe 16 via a gauze 15. The air may be supplied to the burner in two streams, primary air supplied direct and supporting air bearing the metal halide.
GB5616667A 1965-07-28 1965-07-28 A process for the production of ultra-finely divided oxides Expired GB1121279A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB5616667A GB1121279A (en) 1965-07-28 1965-07-28 A process for the production of ultra-finely divided oxides

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5616667A GB1121279A (en) 1965-07-28 1965-07-28 A process for the production of ultra-finely divided oxides

Publications (1)

Publication Number Publication Date
GB1121279A true GB1121279A (en) 1968-07-24

Family

ID=10475905

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5616667A Expired GB1121279A (en) 1965-07-28 1965-07-28 A process for the production of ultra-finely divided oxides

Country Status (1)

Country Link
GB (1) GB1121279A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4067954A (en) * 1971-05-11 1978-01-10 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler Process for the production of finely divided silicon dioxide having a large specific surface
US4258023A (en) * 1978-11-17 1981-03-24 Deutsche Gold-Und Silber-Scheideanstalt Vormals Roessler Process for the pyrogenous production of very finely divided oxides of a metal and/or of a metalloid
US4276274A (en) * 1975-07-30 1981-06-30 Degussa Ag Process for the production of finely divided oxides of metals or silicon
US4297143A (en) * 1979-08-06 1981-10-27 Degussa Aktiengesellschaft Temperature stabilized silicon dioxide-mixed oxide, the process for its production and use
US5340560A (en) * 1993-04-30 1994-08-23 General Electric Company Method for making fumed silica having a reduced aggregate size and product
WO2005097312A1 (en) * 2004-04-02 2005-10-20 Kerr-Mcgee Chemical Llc High flow rate gaseous reactant supply

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4067954A (en) * 1971-05-11 1978-01-10 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler Process for the production of finely divided silicon dioxide having a large specific surface
US4276274A (en) * 1975-07-30 1981-06-30 Degussa Ag Process for the production of finely divided oxides of metals or silicon
US4258023A (en) * 1978-11-17 1981-03-24 Deutsche Gold-Und Silber-Scheideanstalt Vormals Roessler Process for the pyrogenous production of very finely divided oxides of a metal and/or of a metalloid
US4297143A (en) * 1979-08-06 1981-10-27 Degussa Aktiengesellschaft Temperature stabilized silicon dioxide-mixed oxide, the process for its production and use
US5340560A (en) * 1993-04-30 1994-08-23 General Electric Company Method for making fumed silica having a reduced aggregate size and product
WO2005097312A1 (en) * 2004-04-02 2005-10-20 Kerr-Mcgee Chemical Llc High flow rate gaseous reactant supply

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