GB1107198A - Plating brighteners and electrolytes - Google Patents

Plating brighteners and electrolytes

Info

Publication number
GB1107198A
GB1107198A GB40682/66A GB4068266A GB1107198A GB 1107198 A GB1107198 A GB 1107198A GB 40682/66 A GB40682/66 A GB 40682/66A GB 4068266 A GB4068266 A GB 4068266A GB 1107198 A GB1107198 A GB 1107198A
Authority
GB
United Kingdom
Prior art keywords
terminal
acetylenic
disodium
esters
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB40682/66A
Inventor
Richard Pollard Cope
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cowles Chemical Co
Original Assignee
Cowles Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cowles Chemical Co filed Critical Cowles Chemical Co
Priority to GB40682/66A priority Critical patent/GB1107198A/en
Priority to DE19661645385 priority patent/DE1645385A1/en
Priority to NL6613418A priority patent/NL6613418A/xx
Priority to FR77387A priority patent/FR1501047A/en
Publication of GB1107198A publication Critical patent/GB1107198A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/16—Acetylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/67—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
    • C07C69/675—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids of saturated hydroxy-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/67—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
    • C07C69/675—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids of saturated hydroxy-carboxylic acids
    • C07C69/70—Tartaric acid esters
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

An aqueous acidic solution for electro-depositing nickel and/or cobalt contains (a) a soluble salt of the metal(s) and (b) a brightener which is an ester of an amino- and/or hydroxy-substituted C2 to C4 aliphatic carboxylic acid and an acetylenic dibasic alcohol having up to 8 carbon atoms in which the hydroxyl groups are both terminal and the acetylenic bond is non-terminal. Optional additional ingredients specified are saccharin, sodium styrene sulphonate, disodium 2, 5-benzenedisulphonate, disodium 2, 5-benzenedisulphonate, disodium 2, 7-naphthalenedisulphonate, trisodium 1, 3, 6-naphthalenetrisulphonate, sodium chloride and ammonium sulphate. A copper electrolyte which contains the glycinebutynediol reaction product as a grain refining agent is also mentioned.ALSO:Novel esters are obtained by reacting (A) an amino- and/or hydroxy-substituted C2 to C4 aliphatic carboxylic acid with (B) an acetylenic dibasic alcohol having up to 8 carbon atoms in which the hydroxyl groups are both terminal and the acetylenic bond is non-terminal, in the presence of an aromatic hydrocarbon solvent. Esters are specified which are derived from glycine, threonine, alanine, b -aminobutyric acid, b -aminopropionic acid, potassium hydrogen tartrate and malic acid. The esters are useful as brighteners or grain-refining agents in electroplating compositions (see Division C7).
GB40682/66A 1965-09-23 1966-08-08 Plating brighteners and electrolytes Expired GB1107198A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
GB40682/66A GB1107198A (en) 1966-08-08 1966-08-08 Plating brighteners and electrolytes
DE19661645385 DE1645385A1 (en) 1965-09-23 1966-09-16 Process for the preparation of a copolymer by emulsion polymerization of vinylidene chloride and one or more acrylic esters
NL6613418A NL6613418A (en) 1965-09-23 1966-09-22
FR77387A FR1501047A (en) 1965-09-23 1966-09-23 Copolymer of vinylidene chloride and acrylic esters

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB40682/66A GB1107198A (en) 1966-08-08 1966-08-08 Plating brighteners and electrolytes

Publications (1)

Publication Number Publication Date
GB1107198A true GB1107198A (en) 1968-03-20

Family

ID=10416104

Family Applications (1)

Application Number Title Priority Date Filing Date
GB40682/66A Expired GB1107198A (en) 1965-09-23 1966-08-08 Plating brighteners and electrolytes

Country Status (1)

Country Link
GB (1) GB1107198A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2213479A (en) * 1987-12-11 1989-08-16 George Henry William Milburn Chiral diacetylenes
EP2113587A1 (en) * 2008-04-28 2009-11-04 ATOTECH Deutschland GmbH Aqueous acidic bath and method for electroplating copper
CN107849722A (en) * 2015-06-30 2018-03-27 麦德美乐思公司 The cobalt filling of interconnection in microelectronic circuit

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2213479A (en) * 1987-12-11 1989-08-16 George Henry William Milburn Chiral diacetylenes
GB2213479B (en) * 1987-12-11 1991-09-25 George Henry William Milburn Chiral diacetylenes
EP2113587A1 (en) * 2008-04-28 2009-11-04 ATOTECH Deutschland GmbH Aqueous acidic bath and method for electroplating copper
WO2009132861A2 (en) * 2008-04-28 2009-11-05 Atotech Deutschland Gmbh Aqueous, acid bath and method for the electrolytic deposition of copper
WO2009132861A3 (en) * 2008-04-28 2010-04-15 Atotech Deutschland Gmbh Aqueous, acid bath and method for the electrolytic deposition of copper
US8679316B2 (en) 2008-04-28 2014-03-25 Atotech Deutschland Gmbh Aqueous, acid bath and method for the electrolytic deposition of copper
CN107849722A (en) * 2015-06-30 2018-03-27 麦德美乐思公司 The cobalt filling of interconnection in microelectronic circuit

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