GB1072739A - Improvements in thin film circuits - Google Patents

Improvements in thin film circuits

Info

Publication number
GB1072739A
GB1072739A GB23805/66A GB2380566A GB1072739A GB 1072739 A GB1072739 A GB 1072739A GB 23805/66 A GB23805/66 A GB 23805/66A GB 2380566 A GB2380566 A GB 2380566A GB 1072739 A GB1072739 A GB 1072739A
Authority
GB
United Kingdom
Prior art keywords
thin film
film circuits
deposition
another
anodizable metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB23805/66A
Inventor
Roger George Duckwo Rth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ultra Electronics Ltd
Original Assignee
Ultra Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultra Electronics Ltd filed Critical Ultra Electronics Ltd
Priority to GB23805/66A priority Critical patent/GB1072739A/en
Publication of GB1072739A publication Critical patent/GB1072739A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Abstract

A capacitor or resistor is made by vacuum deposition, e.g sputtering, of either (a) simultaneous deposition of Ta and another anodizable metal other than Al or Nb or (b) deposition of a compound of Ta and another anodizable metal other than Al.
GB23805/66A 1965-03-01 1965-03-01 Improvements in thin film circuits Expired GB1072739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB23805/66A GB1072739A (en) 1965-03-01 1965-03-01 Improvements in thin film circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB23805/66A GB1072739A (en) 1965-03-01 1965-03-01 Improvements in thin film circuits

Publications (1)

Publication Number Publication Date
GB1072739A true GB1072739A (en) 1967-06-21

Family

ID=10201606

Family Applications (1)

Application Number Title Priority Date Filing Date
GB23805/66A Expired GB1072739A (en) 1965-03-01 1965-03-01 Improvements in thin film circuits

Country Status (1)

Country Link
GB (1) GB1072739A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0342894A1 (en) * 1988-05-16 1989-11-23 Kabushiki Kaisha Toshiba Sputtering target

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0342894A1 (en) * 1988-05-16 1989-11-23 Kabushiki Kaisha Toshiba Sputtering target
EP0618306A2 (en) * 1988-05-16 1994-10-05 Kabushiki Kaisha Toshiba Sputtering target
EP0618306A3 (en) * 1988-05-16 1994-10-26 Toshiba Kk Sputtering target.

Similar Documents

Publication Publication Date Title
ES348482A1 (en) Method of making a thin film having a high coercive field
GB1067831A (en) Improvements in thin film circuits
GB1072739A (en) Improvements in thin film circuits
CA984334A (en) Deposition of magnetizable layers by means of cathode sputtering
CA669443A (en) Metallized thin film capacitor
GB1185814A (en) Fabrication of Thin Film Capacitors
CA783037A (en) Deposition of thin film by impact evaporation
CA678938A (en) Bifilar thin film superconductor circuits
CA764357A (en) Fabrication of thin film resistors
Umezu Materiales for Vapour Sources in Vacuum
AU413381B2 (en) Magnetic recording member and vacuum deposition of ferromagnetic metal films
GETLER Use of an in-line, multi-chamber, continuously operating vacuum machine in which a thin tantalum film is deposited on glass or ceramic substrates for thin-film circuits
AU6122965A (en) Magnetic recording member and vacuum deposition of ferromagnetic metal films
IE31418L (en) Depositing thin films on substrates
CA772320A (en) Thin film magnetic register
CA734890A (en) Metallization of textile surfaces by vapor deposition of metals in high vacuum
AU428497B2 (en) Thin film circuits
CA639837A (en) Vapor deposited metal films
AU423831B2 (en) Precision etching of semiconductors
CA764627A (en) Thin film magnetic stores
AU284692B2 (en) Deposition of oxide films
AU4083068A (en) Thin film piezoelectric oscillator
CA757284A (en) Thin film capacitors
CA785443A (en) Thin film capacitors
AU404440B2 (en) Method of etching a graded metallic film