GB1003654A - Semiconductor devices - Google Patents
Semiconductor devicesInfo
- Publication number
- GB1003654A GB1003654A GB1702664A GB1702664A GB1003654A GB 1003654 A GB1003654 A GB 1003654A GB 1702664 A GB1702664 A GB 1702664A GB 1702664 A GB1702664 A GB 1702664A GB 1003654 A GB1003654 A GB 1003654A
- Authority
- GB
- United Kingdom
- Prior art keywords
- region
- type
- semi
- oxide
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 2
- 238000005299 abrasion Methods 0.000 abstract 2
- 229910052698 phosphorus Inorganic materials 0.000 abstract 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 abstract 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract 1
- 230000001154 acute effect Effects 0.000 abstract 1
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000003486 chemical etching Methods 0.000 abstract 1
- 238000010276 construction Methods 0.000 abstract 1
- 229910003460 diamond Inorganic materials 0.000 abstract 1
- 239000010432 diamond Substances 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 229910052733 gallium Inorganic materials 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 239000010931 gold Substances 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 239000011733 molybdenum Substances 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 239000011574 phosphorus Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
- H01L29/0661—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body specially adapted for altering the breakdown voltage by removing semiconductor material at, or in the neighbourhood of, a reverse biased junction, e.g. by bevelling, moat etching, depletion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Thyristors (AREA)
Abstract
1,003,654. Semi-conductor devices. STANDARD TELEPHONES & CABLES Ltd. April 24, 1964, No. 17026/64. Heading H1K. A PNP or NPN semi-conductor device is formed in a body of the shape shown in Fig. 1, the central N or P region 4 being of higher resistivity than the adjacent regions 3 and 6 and the PN junctions 9 and 10 breaking out into the surface of the body only at the top of the upstanding peripheral wall portion 11, the latter being so shaped as to provide acute angles a and # between the junctions and the surfaces at which they break out. This construction is designed to ensure that any junction breakdown occurs in the body and not on the surface of the device and is particularly applicable to semi-conductor controlled rectifiers of the avalanche type. The particular devices shown has a PNPN structure in which the anode and cathode regions 3 and 6 are P type and the trigger region 8 and intermediate high resistivity region 4 are N type. The device is formed by first removing-by chemical etching, air abrasion or ultrasonic shaping- a central zone from one face of a disc of high resistivity N-type silicon or germanium, oxidizing the surface 14, Fig. 6, and diffusing gallium through the oxide to form the P regions 3 and 6. By successive selective removal and replacement of oxide, using the remaining oxide at each stage as a mask, the N region 8 (phosphorus doped), P+ region 2 (boron-doped) and gold on nickel electrodes 1, 5, 7 are successively deposited. Finally the groove 12 is cut by etching, air abrasion or diamond cutting and the device cleaned, varnished, mounted between molybdenum discs and encapsulated.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1702664A GB1003654A (en) | 1964-04-24 | 1964-04-24 | Semiconductor devices |
DE19651514755 DE1514755A1 (en) | 1964-04-24 | 1965-04-15 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1702664A GB1003654A (en) | 1964-04-24 | 1964-04-24 | Semiconductor devices |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1003654A true GB1003654A (en) | 1965-09-08 |
Family
ID=10087877
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1702664A Expired GB1003654A (en) | 1964-04-24 | 1964-04-24 | Semiconductor devices |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE1514755A1 (en) |
GB (1) | GB1003654A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3437886A (en) * | 1965-03-25 | 1969-04-08 | Asea Ab | Thyristor with positively bevelled junctions |
CN100429508C (en) * | 2006-11-22 | 2008-10-29 | 哈尔滨工业大学 | Phosphorus-doped amorphous diamond film electrode and preparation method of the same |
-
1964
- 1964-04-24 GB GB1702664A patent/GB1003654A/en not_active Expired
-
1965
- 1965-04-15 DE DE19651514755 patent/DE1514755A1/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3437886A (en) * | 1965-03-25 | 1969-04-08 | Asea Ab | Thyristor with positively bevelled junctions |
CN100429508C (en) * | 2006-11-22 | 2008-10-29 | 哈尔滨工业大学 | Phosphorus-doped amorphous diamond film electrode and preparation method of the same |
Also Published As
Publication number | Publication date |
---|---|
DE1514755A1 (en) | 1969-06-19 |
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