GB0901958D0 - Production of a surface relief on a substrate - Google Patents

Production of a surface relief on a substrate

Info

Publication number
GB0901958D0
GB0901958D0 GBGB0901958.9A GB0901958A GB0901958D0 GB 0901958 D0 GB0901958 D0 GB 0901958D0 GB 0901958 A GB0901958 A GB 0901958A GB 0901958 D0 GB0901958 D0 GB 0901958D0
Authority
GB
United Kingdom
Prior art keywords
substrate
production
surface relief
relief
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB0901958.9A
Other versions
GB2468635B (en
GB2468635A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
API Group Ltd
Original Assignee
API Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by API Group Ltd filed Critical API Group Ltd
Priority to GB0901958.9A priority Critical patent/GB2468635B/en
Publication of GB0901958D0 publication Critical patent/GB0901958D0/en
Priority to EP10152005A priority patent/EP2216681A3/en
Priority to US12/695,410 priority patent/US20100196617A1/en
Publication of GB2468635A publication Critical patent/GB2468635A/en
Application granted granted Critical
Publication of GB2468635B publication Critical patent/GB2468635B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
GB0901958.9A 2009-02-05 2009-02-05 Production of a surface relief on a substrate Expired - Fee Related GB2468635B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB0901958.9A GB2468635B (en) 2009-02-05 2009-02-05 Production of a surface relief on a substrate
EP10152005A EP2216681A3 (en) 2009-02-05 2010-01-28 Production of a surface relief on a substrate
US12/695,410 US20100196617A1 (en) 2009-02-05 2010-01-28 Production of a surface relief on a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0901958.9A GB2468635B (en) 2009-02-05 2009-02-05 Production of a surface relief on a substrate

Publications (3)

Publication Number Publication Date
GB0901958D0 true GB0901958D0 (en) 2009-03-11
GB2468635A GB2468635A (en) 2010-09-22
GB2468635B GB2468635B (en) 2014-05-14

Family

ID=40469684

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0901958.9A Expired - Fee Related GB2468635B (en) 2009-02-05 2009-02-05 Production of a surface relief on a substrate

Country Status (3)

Country Link
US (1) US20100196617A1 (en)
EP (1) EP2216681A3 (en)
GB (1) GB2468635B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104297835B (en) * 2014-10-17 2017-03-08 京东方科技集团股份有限公司 A kind of preparation method of wire grid polarizer
CN104483733B (en) 2014-12-30 2017-11-21 京东方科技集团股份有限公司 A kind of wire grid polarizer and preparation method thereof, display device

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4420527A (en) * 1980-09-05 1983-12-13 Rexham Corporation Thermoset relief patterned sheet
US5173442A (en) * 1990-07-23 1992-12-22 Microelectronics And Computer Technology Corporation Methods of forming channels and vias in insulating layers
JPH0580530A (en) * 1991-09-24 1993-04-02 Hitachi Ltd Production of thin film pattern
EP0623440B1 (en) * 1993-03-16 1997-09-10 Koninklijke Philips Electronics N.V. Method of and device for providing a patterned relief of cured photoresist on a flat substrate surface
JP3311302B2 (en) * 1998-10-27 2002-08-05 キヤノン株式会社 Exposure method
US6660362B1 (en) * 2000-11-03 2003-12-09 Kimberly-Clark Worldwide, Inc. Deflection members for tissue production
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6926921B2 (en) * 2003-05-05 2005-08-09 Hewlett-Packard Development Company, L.P. Imprint lithography for superconductor devices
CH697447B1 (en) 2003-12-23 2008-10-15 3D Ag Substrate's i.e. embossing matrix, surface structure producing method for e.g. manufacturing decorative pattern, involves applying surface reliefs, and forming impression of substrate before formation of production unit
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7691275B2 (en) * 2005-02-28 2010-04-06 Board Of Regents, The University Of Texas System Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing
US8999218B2 (en) * 2005-06-06 2015-04-07 Canon Kabushiki Kaisha Process for producing member having pattern, pattern transfer apparatus, and mold
US8011916B2 (en) * 2005-09-06 2011-09-06 Canon Kabushiki Kaisha Mold, imprint apparatus, and process for producing structure
WO2008060266A2 (en) * 2005-10-03 2008-05-22 Massachusetts Institute Of Technology Nanotemplate arbitrary-imprint lithography
CA2643510C (en) * 2006-02-27 2014-04-29 Microcontinuum, Inc. Formation of pattern replicating tools
KR100803749B1 (en) * 2006-08-31 2008-02-15 삼성전기주식회사 Manufacturing method of broad stamper
US8303866B2 (en) * 2007-04-23 2012-11-06 Digitaloptics Corporation East Mass production of micro-optical devices, corresponding tools, and resultant structures
JP5473266B2 (en) * 2007-08-03 2014-04-16 キヤノン株式会社 Imprint method, substrate processing method, and semiconductor device manufacturing method by substrate processing method
JP5274128B2 (en) * 2007-08-03 2013-08-28 キヤノン株式会社 Imprint method and substrate processing method
JP4799575B2 (en) * 2008-03-06 2011-10-26 株式会社東芝 Imprint method
GB0809062D0 (en) * 2008-05-19 2008-06-25 Zbd Displays Ltd Method for patterning a surface using selective adhesion
US8496779B2 (en) * 2008-09-16 2013-07-30 Armstrong World Industries, Inc. Sheet goods having a large repeat length and tile with numerous patterns

Also Published As

Publication number Publication date
EP2216681A2 (en) 2010-08-11
GB2468635B (en) 2014-05-14
EP2216681A3 (en) 2012-05-16
GB2468635A (en) 2010-09-22
US20100196617A1 (en) 2010-08-05

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20140814