GB0714121D0 - Schottky diode - Google Patents

Schottky diode

Info

Publication number
GB0714121D0
GB0714121D0 GBGB0714121.1A GB0714121A GB0714121D0 GB 0714121 D0 GB0714121 D0 GB 0714121D0 GB 0714121 A GB0714121 A GB 0714121A GB 0714121 D0 GB0714121 D0 GB 0714121D0
Authority
GB
United Kingdom
Prior art keywords
schottky diode
schottky
diode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB0714121.1A
Other versions
GB2451124A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
X Fab UK Ltd
Original Assignee
X Fab UK Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by X Fab UK Ltd filed Critical X Fab UK Ltd
Priority to GB0714121A priority Critical patent/GB2451124A/en
Publication of GB0714121D0 publication Critical patent/GB0714121D0/en
Publication of GB2451124A publication Critical patent/GB2451124A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0603Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
    • H01L29/0607Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
    • H01L29/0611Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
    • H01L29/0615Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/47Schottky barrier electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • H01L29/872Schottky diodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)
GB0714121A 2007-07-20 2007-07-20 Schottky diode with overlaid polysilicon guard ring Withdrawn GB2451124A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB0714121A GB2451124A (en) 2007-07-20 2007-07-20 Schottky diode with overlaid polysilicon guard ring

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0714121A GB2451124A (en) 2007-07-20 2007-07-20 Schottky diode with overlaid polysilicon guard ring

Publications (2)

Publication Number Publication Date
GB0714121D0 true GB0714121D0 (en) 2007-08-29
GB2451124A GB2451124A (en) 2009-01-21

Family

ID=38476642

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0714121A Withdrawn GB2451124A (en) 2007-07-20 2007-07-20 Schottky diode with overlaid polysilicon guard ring

Country Status (1)

Country Link
GB (1) GB2451124A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8513764B2 (en) * 2011-02-18 2013-08-20 X-Fab Semiconductor Foundries Ag Schottky diode
CN105206685A (en) * 2015-09-28 2015-12-30 上海华虹宏力半导体制造有限公司 High-voltage Schottky diode device
CN116093164B (en) * 2023-04-07 2023-07-11 深圳市晶扬电子有限公司 High-voltage Schottky diode with floating island type protection ring

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2193255B2 (en) * 1972-07-21 1976-07-23 Commissariat Energie Atomique
JPS60157268A (en) * 1984-01-26 1985-08-17 Rohm Co Ltd Schottky barrier diode
JP2535885B2 (en) * 1987-03-10 1996-09-18 三菱電機株式会社 Schottky barrier diode and manufacturing method thereof
US5418185A (en) * 1993-01-21 1995-05-23 Texas Instruments Incorporated Method of making schottky diode with guard ring
JP3466543B2 (en) * 2000-06-19 2003-11-10 日本インター株式会社 Schottky barrier type semiconductor device and manufacturing method thereof
JP2004186660A (en) * 2002-10-11 2004-07-02 Nippon Inter Electronics Corp Schottky barrier diode and method for manufacturing the same
US20060006394A1 (en) * 2004-05-28 2006-01-12 Caracal, Inc. Silicon carbide Schottky diodes and fabrication method

Also Published As

Publication number Publication date
GB2451124A (en) 2009-01-21

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)