GB0620287D0 - Workpiece height adjustment in an eletron beam lithography machine - Google Patents

Workpiece height adjustment in an eletron beam lithography machine

Info

Publication number
GB0620287D0
GB0620287D0 GBGB0620287.3A GB0620287A GB0620287D0 GB 0620287 D0 GB0620287 D0 GB 0620287D0 GB 0620287 A GB0620287 A GB 0620287A GB 0620287 D0 GB0620287 D0 GB 0620287D0
Authority
GB
United Kingdom
Prior art keywords
height adjustment
beam lithography
lithography machine
workpiece height
eletron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB0620287.3A
Other versions
GB2442766B (en
GB2442766A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vistec Lithography Ltd
Original Assignee
Vistec Lithography Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vistec Lithography Ltd filed Critical Vistec Lithography Ltd
Priority to GB0620287A priority Critical patent/GB2442766B/en
Publication of GB0620287D0 publication Critical patent/GB0620287D0/en
Priority to PCT/GB2007/003866 priority patent/WO2008044030A1/en
Publication of GB2442766A publication Critical patent/GB2442766A/en
Application granted granted Critical
Publication of GB2442766B publication Critical patent/GB2442766B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174Particle-beam lithography, e.g. electron beam lithography
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/023Means for mechanically adjusting components not otherwise provided for
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20221Translation
    • H01J2237/20235Z movement or adjustment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20292Means for position and/or orientation registration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248Components associated with the control of the tube
    • H01J2237/2482Optical means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
GB0620287A 2006-10-12 2006-10-12 Workpiece height adjustment in an eletron beam lithography machine Expired - Fee Related GB2442766B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB0620287A GB2442766B (en) 2006-10-12 2006-10-12 Workpiece height adjustment in an eletron beam lithography machine
PCT/GB2007/003866 WO2008044030A1 (en) 2006-10-12 2007-10-11 Workpiece height adjustment in an electron beam lithography machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0620287A GB2442766B (en) 2006-10-12 2006-10-12 Workpiece height adjustment in an eletron beam lithography machine

Publications (3)

Publication Number Publication Date
GB0620287D0 true GB0620287D0 (en) 2006-11-22
GB2442766A GB2442766A (en) 2008-04-16
GB2442766B GB2442766B (en) 2009-06-24

Family

ID=37491420

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0620287A Expired - Fee Related GB2442766B (en) 2006-10-12 2006-10-12 Workpiece height adjustment in an eletron beam lithography machine

Country Status (2)

Country Link
GB (1) GB2442766B (en)
WO (1) WO2008044030A1 (en)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4560880A (en) * 1983-09-19 1985-12-24 Varian Associates, Inc. Apparatus for positioning a workpiece in a localized vacuum processing system
US4891526A (en) * 1986-12-29 1990-01-02 Hughes Aircraft Company X-Y-θ-Z positioning stage
FR2644290A1 (en) * 1989-03-10 1990-09-14 Labo Electronique Physique MICROMANIPULATOR
US5731641A (en) * 1996-02-28 1998-03-24 Aerotech, Inc. Linear motor driven vertical lift stage
JP3704694B2 (en) * 1996-03-22 2005-10-12 株式会社ニコン Charged particle beam transfer device
GB2324650A (en) * 1997-04-25 1998-10-28 Leica Lithography Systems Ltd Pattern-writing machine
TW546549B (en) * 1998-11-17 2003-08-11 Advantest Corp Electron beam exposure apparatus and exposure method
JP2001349997A (en) * 2000-06-09 2001-12-21 Advantest Corp Electron beam irradiation device and method
JP3940310B2 (en) * 2002-04-04 2007-07-04 株式会社日立ハイテクノロジーズ Electron beam drawing method, drawing apparatus, and semiconductor manufacturing method using the same

Also Published As

Publication number Publication date
WO2008044030A1 (en) 2008-04-17
GB2442766B (en) 2009-06-24
GB2442766A (en) 2008-04-16

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20111012