GB2442766B - Workpiece height adjustment in an eletron beam lithography machine - Google Patents

Workpiece height adjustment in an eletron beam lithography machine

Info

Publication number
GB2442766B
GB2442766B GB0620287A GB0620287A GB2442766B GB 2442766 B GB2442766 B GB 2442766B GB 0620287 A GB0620287 A GB 0620287A GB 0620287 A GB0620287 A GB 0620287A GB 2442766 B GB2442766 B GB 2442766B
Authority
GB
United Kingdom
Prior art keywords
height adjustment
beam lithography
lithography machine
workpiece height
eletron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0620287A
Other versions
GB2442766A (en
GB0620287D0 (en
Inventor
Paul George Harris
John Melbourne Tingay
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vistec Lithography Ltd
Original Assignee
Vistec Lithography Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vistec Lithography Ltd filed Critical Vistec Lithography Ltd
Priority to GB0620287A priority Critical patent/GB2442766B/en
Publication of GB0620287D0 publication Critical patent/GB0620287D0/en
Priority to PCT/GB2007/003866 priority patent/WO2008044030A1/en
Publication of GB2442766A publication Critical patent/GB2442766A/en
Application granted granted Critical
Publication of GB2442766B publication Critical patent/GB2442766B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/023—Means for mechanically adjusting components not otherwise provided for
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20221—Translation
    • H01J2237/20235—Z movement or adjustment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20292—Means for position and/or orientation registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2482—Optical means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
GB0620287A 2006-10-12 2006-10-12 Workpiece height adjustment in an eletron beam lithography machine Expired - Fee Related GB2442766B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB0620287A GB2442766B (en) 2006-10-12 2006-10-12 Workpiece height adjustment in an eletron beam lithography machine
PCT/GB2007/003866 WO2008044030A1 (en) 2006-10-12 2007-10-11 Workpiece height adjustment in an electron beam lithography machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0620287A GB2442766B (en) 2006-10-12 2006-10-12 Workpiece height adjustment in an eletron beam lithography machine

Publications (3)

Publication Number Publication Date
GB0620287D0 GB0620287D0 (en) 2006-11-22
GB2442766A GB2442766A (en) 2008-04-16
GB2442766B true GB2442766B (en) 2009-06-24

Family

ID=37491420

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0620287A Expired - Fee Related GB2442766B (en) 2006-10-12 2006-10-12 Workpiece height adjustment in an eletron beam lithography machine

Country Status (2)

Country Link
GB (1) GB2442766B (en)
WO (1) WO2008044030A1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4560880A (en) * 1983-09-19 1985-12-24 Varian Associates, Inc. Apparatus for positioning a workpiece in a localized vacuum processing system
US4891526A (en) * 1986-12-29 1990-01-02 Hughes Aircraft Company X-Y-θ-Z positioning stage
GB2324650A (en) * 1997-04-25 1998-10-28 Leica Lithography Systems Ltd Pattern-writing machine
EP1003201A2 (en) * 1998-11-17 2000-05-24 Advantest Corporation Electron beam exposure apparatus and exposure method
WO2001095364A1 (en) * 2000-06-09 2001-12-13 Advantest Corporation Electron beam generator and method of electron beam irradiation

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2644290A1 (en) * 1989-03-10 1990-09-14 Labo Electronique Physique MICROMANIPULATOR
US5731641A (en) * 1996-02-28 1998-03-24 Aerotech, Inc. Linear motor driven vertical lift stage
JP3704694B2 (en) * 1996-03-22 2005-10-12 株式会社ニコン Charged particle beam transfer device
JP3940310B2 (en) * 2002-04-04 2007-07-04 株式会社日立ハイテクノロジーズ Electron beam drawing method, drawing apparatus, and semiconductor manufacturing method using the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4560880A (en) * 1983-09-19 1985-12-24 Varian Associates, Inc. Apparatus for positioning a workpiece in a localized vacuum processing system
US4891526A (en) * 1986-12-29 1990-01-02 Hughes Aircraft Company X-Y-θ-Z positioning stage
GB2324650A (en) * 1997-04-25 1998-10-28 Leica Lithography Systems Ltd Pattern-writing machine
EP1003201A2 (en) * 1998-11-17 2000-05-24 Advantest Corporation Electron beam exposure apparatus and exposure method
WO2001095364A1 (en) * 2000-06-09 2001-12-13 Advantest Corporation Electron beam generator and method of electron beam irradiation

Also Published As

Publication number Publication date
WO2008044030A1 (en) 2008-04-17
GB2442766A (en) 2008-04-16
GB0620287D0 (en) 2006-11-22

Similar Documents

Publication Publication Date Title
GB2430696B (en) Cab for work machine
GB0724432D0 (en) Work machine
TWI346597B (en) Precision machining apparatus
SG123679A1 (en) Laser beam processing machine
EP1859761A4 (en) Underwear for lower parts
EP2079611A4 (en) Bumper beam
EP1864735A4 (en) Digitally-controlled engraving machine
EP1862253A4 (en) Machine tool
PL2065206T3 (en) Device for finishing workpieces
GB2431370B (en) An apparatus for electromagnetically forming a workpiece
GB2439688B (en) Machine tool
EP1961870A4 (en) Work machine
EP2065293A4 (en) Track frame for work machine
GB2426805B (en) Machine tool
PL1882570T3 (en) Machining centre for machining elongated workpieces
ZA201001002B (en) Steel for producing machine components formed from solid stock
EP1888260A4 (en) Process for moisture-proofing wood
GB2442766B (en) Workpiece height adjustment in an eletron beam lithography machine
GB2448789B (en) Support for machine tool
GB0621797D0 (en) Mold for an i s machine
GB2425276B (en) Workpiece Support for Sheetboard Cutting Machine
GB2443016B (en) Electron beam influencing in an electron beam lithography machine
GB0620288D0 (en) Electron beam influencing in an electron beam lithography machine
PL1832799T3 (en) Workpiece support
GB0500005D0 (en) Gauges for projection

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20111012