GB0229161D0 - Polishing composition - Google Patents

Polishing composition

Info

Publication number
GB0229161D0
GB0229161D0 GBGB0229161.5A GB0229161A GB0229161D0 GB 0229161 D0 GB0229161 D0 GB 0229161D0 GB 0229161 A GB0229161 A GB 0229161A GB 0229161 D0 GB0229161 D0 GB 0229161D0
Authority
GB
United Kingdom
Prior art keywords
polishing composition
polishing
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB0229161.5A
Other versions
GB2385057A (en
GB2385057B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujimi Inc
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of GB0229161D0 publication Critical patent/GB0229161D0/en
Publication of GB2385057A publication Critical patent/GB2385057A/en
Application granted granted Critical
Publication of GB2385057B publication Critical patent/GB2385057B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/06—Other polishing compositions
    • C09G1/14—Other polishing compositions based on non-waxy substances
    • C09G1/18—Other polishing compositions based on non-waxy substances on other substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
GB0229161A 2001-12-20 2002-12-13 Polishing composition Expired - Lifetime GB2385057B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001387175A JP4095798B2 (en) 2001-12-20 2001-12-20 Polishing composition

Publications (3)

Publication Number Publication Date
GB0229161D0 true GB0229161D0 (en) 2003-01-22
GB2385057A GB2385057A (en) 2003-08-13
GB2385057B GB2385057B (en) 2005-02-09

Family

ID=19188039

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0229161A Expired - Lifetime GB2385057B (en) 2001-12-20 2002-12-13 Polishing composition

Country Status (4)

Country Link
JP (1) JP4095798B2 (en)
CN (2) CN1854224A (en)
GB (1) GB2385057B (en)
MY (1) MY131820A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4291665B2 (en) * 2003-10-15 2009-07-08 日本化学工業株式会社 Abrasive composition for siliceous material and polishing method using the same
JP2006077127A (en) * 2004-09-09 2006-03-23 Fujimi Inc Polishing composition and polishing method using the composition

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61291674A (en) * 1985-06-17 1986-12-22 Kobe Steel Ltd Polishing agent
JPS62236669A (en) * 1986-04-07 1987-10-16 Kobe Steel Ltd Abrasive
US5084071A (en) * 1989-03-07 1992-01-28 International Business Machines Corporation Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor
JP3825827B2 (en) * 1996-01-30 2006-09-27 昭和電工株式会社 Polishing composition, magnetic disk substrate polishing method, and manufacturing method
JP3653133B2 (en) * 1996-01-30 2005-05-25 昭和電工株式会社 Polishing composition, magnetic disk substrate polishing method, and manufacturing method
JPH10172936A (en) * 1996-12-05 1998-06-26 Fujimi Inkooporeetetsudo:Kk Composition for polishing
JPH10172937A (en) * 1996-12-05 1998-06-26 Fujimi Inkooporeetetsudo:Kk Composition for polishing
JPH10172934A (en) * 1996-12-05 1998-06-26 Fujimi Inkooporeetetsudo:Kk Composition for polishing
JPH10172935A (en) * 1996-12-05 1998-06-26 Fujimi Inkooporeetetsudo:Kk Composition for polishing
JPH1180708A (en) * 1997-09-09 1999-03-26 Fujimi Inkooporeetetsudo:Kk Composition for polishing
JP4090589B2 (en) * 1998-09-01 2008-05-28 株式会社フジミインコーポレーテッド Polishing composition
WO2001012741A1 (en) * 1999-08-13 2001-02-22 Cabot Microelectronics Corporation Polishing system with stopping compound and method of its use
JP4273475B2 (en) * 1999-09-21 2009-06-03 株式会社フジミインコーポレーテッド Polishing composition
US6280490B1 (en) * 1999-09-27 2001-08-28 Fujimi America Inc. Polishing composition and method for producing a memory hard disk
US6258140B1 (en) * 1999-09-27 2001-07-10 Fujimi America Inc. Polishing composition
US6280489B1 (en) * 1999-10-29 2001-08-28 Nihon Micro Coating Co., Ltd. Polishing compositions
JP4213858B2 (en) * 2000-02-03 2009-01-21 花王株式会社 Polishing liquid composition
TW528645B (en) * 2000-04-17 2003-04-21 Showa Denko Kk Composition for polishing magnetic disk substrate
JP2001294848A (en) * 2000-04-17 2001-10-23 Sanyo Chem Ind Ltd Abrasive grain dispersant for polishing, and slurry for polishing
JP4251516B2 (en) * 2000-05-12 2009-04-08 花王株式会社 Polishing liquid composition
US6976905B1 (en) * 2000-06-16 2005-12-20 Cabot Microelectronics Corporation Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system
KR100398141B1 (en) * 2000-10-12 2003-09-13 아남반도체 주식회사 Chemical mechanical polishing slurry composition and planarization method using same for semiconductor device
JP4231632B2 (en) * 2001-04-27 2009-03-04 花王株式会社 Polishing liquid composition

Also Published As

Publication number Publication date
MY131820A (en) 2007-09-28
CN1285686C (en) 2006-11-22
GB2385057A (en) 2003-08-13
GB2385057B (en) 2005-02-09
JP4095798B2 (en) 2008-06-04
CN1854224A (en) 2006-11-01
JP2003183630A (en) 2003-07-03
CN1427055A (en) 2003-07-02

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