FR3123016B1 - Dispositif de manipulation magnétique - Google Patents

Dispositif de manipulation magnétique Download PDF

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Publication number
FR3123016B1
FR3123016B1 FR2105231A FR2105231A FR3123016B1 FR 3123016 B1 FR3123016 B1 FR 3123016B1 FR 2105231 A FR2105231 A FR 2105231A FR 2105231 A FR2105231 A FR 2105231A FR 3123016 B1 FR3123016 B1 FR 3123016B1
Authority
FR
France
Prior art keywords
tubular casing
ferromagnetic armature
magnetic
actuator
sliding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR2105231A
Other languages
English (en)
Other versions
FR3123016A1 (fr
Inventor
Richard Haettel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Original Assignee
Centre National de la Recherche Scientifique CNRS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR2105231A priority Critical patent/FR3123016B1/fr
Priority to PCT/EP2022/063034 priority patent/WO2022243191A1/fr
Priority to EP22728895.8A priority patent/EP4341463A1/fr
Publication of FR3123016A1 publication Critical patent/FR3123016A1/fr
Application granted granted Critical
Publication of FR3123016B1 publication Critical patent/FR3123016B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Electromagnets (AREA)

Abstract

L’invention concerne un dispositif (1) de manipulation magnétique, adapté pour manipuler un objet dans un espace de travail, le dispositif (1) comprenant : un boitier tubulaire (2) en matériau non magnétique ou faiblement magnétique, comprenant au moins deux faces adjacentes dites de coulissement (2a, 2b), une première extrémité du boitier tubulaire (2) étant ouverte et en communication avec l’espace de travail, une armature ferromagnétique (5) agencée dans le boitier tubulaire (2) de façon coulissante selon l’axe longitudinal du boitier tubulaire (2), un arbre de manipulation (6) s’étendant à travers le boitier tubulaire (2), l’arbre de manipulation (6) étant couplé à l’armature ferromagnétique (5) de sorte à pouvoir coulisser vers ou dans l’espace de travail, un actionneur (7) agencé à l’extérieur du boitier tubulaire (2), comprenant une pluralité d’aimants (8) formant un système magnétique (20) avec l’armature ferromagnétique (5), l’actionneur (7) étant configuré pour faire coulisser l’armature ferromagnétique (5) selon l’axe longitudinal du boitier tubulaire (2), des surfaces internes (9a, 9b) de l’actionneur (7) et des surfaces externes de l’armature ferromagnétique (5) étant configurées pour épouser les au moins deux faces de coulissement (2a, 2b), l’armature ferromagnétique (5) étant configurée pour être plaquée sur les au moins deux faces de coulissement (2a, 2b) du boitier tubulaire (2) par les aimants (8). Figure pour abrégé  : [Fig.1]
FR2105231A 2021-05-19 2021-05-19 Dispositif de manipulation magnétique Active FR3123016B1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR2105231A FR3123016B1 (fr) 2021-05-19 2021-05-19 Dispositif de manipulation magnétique
PCT/EP2022/063034 WO2022243191A1 (fr) 2021-05-19 2022-05-13 Dispositif de manipulation magnétique
EP22728895.8A EP4341463A1 (fr) 2021-05-19 2022-05-13 Dispositif de manipulation magnétique

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2105231 2021-05-19
FR2105231A FR3123016B1 (fr) 2021-05-19 2021-05-19 Dispositif de manipulation magnétique

Publications (2)

Publication Number Publication Date
FR3123016A1 FR3123016A1 (fr) 2022-11-25
FR3123016B1 true FR3123016B1 (fr) 2023-05-19

Family

ID=76284059

Family Applications (1)

Application Number Title Priority Date Filing Date
FR2105231A Active FR3123016B1 (fr) 2021-05-19 2021-05-19 Dispositif de manipulation magnétique

Country Status (3)

Country Link
EP (1) EP4341463A1 (fr)
FR (1) FR3123016B1 (fr)
WO (1) WO2022243191A1 (fr)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06232237A (ja) * 1993-02-03 1994-08-19 Hitachi Ltd 磁気カップリング式直進導入機
JP4749124B2 (ja) * 2005-11-11 2011-08-17 Ｓｍｃ株式会社 真空用直線搬送装置
US20080191155A1 (en) * 2007-02-09 2008-08-14 Intevac, Inc. Magnetically coupled valve actuator
DE102017122754A1 (de) * 2017-09-29 2019-04-04 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Vorrichtung sowie Vakuumkammer

Also Published As

Publication number Publication date
WO2022243191A1 (fr) 2022-11-24
EP4341463A1 (fr) 2024-03-27
FR3123016A1 (fr) 2022-11-25

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