FR3105748B1 - Dispositif pour traitement par laser et procédé de traitement au laser - Google Patents
Dispositif pour traitement par laser et procédé de traitement au laser Download PDFInfo
- Publication number
- FR3105748B1 FR3105748B1 FR1915606A FR1915606A FR3105748B1 FR 3105748 B1 FR3105748 B1 FR 3105748B1 FR 1915606 A FR1915606 A FR 1915606A FR 1915606 A FR1915606 A FR 1915606A FR 3105748 B1 FR3105748 B1 FR 3105748B1
- Authority
- FR
- France
- Prior art keywords
- laser treatment
- laser processing
- laser
- treatment method
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000013532 laser treatment Methods 0.000 title 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000004038 photonic crystal Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/7806—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/20—Bonding
- B23K26/32—Bonding taking account of the properties of the material involved
- B23K26/322—Bonding taking account of the properties of the material involved involving coated metal parts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/42—Printed circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68368—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optical Integrated Circuits (AREA)
- Semiconductor Lasers (AREA)
- Laser Beam Processing (AREA)
- Led Devices (AREA)
Abstract
Dispositif pour traitement par laser et procédé de traitement au laser La présente description concerne un dispositif (20) configuré pour un traitement au laser, comprenant un substrat (22) transparent pour le laser et des objets (30), chaque objet étant fixé au substrat par l'intermédiaire d'un cristal photonique (40). Figure pour l'abrégé : Fig. 2
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1915606A FR3105748B1 (fr) | 2019-12-26 | 2019-12-26 | Dispositif pour traitement par laser et procédé de traitement au laser |
JP2022539285A JP2023508443A (ja) | 2019-12-26 | 2020-12-18 | レーザ処理デバイス及びレーザ処理方法 |
KR1020227022957A KR20220119630A (ko) | 2019-12-26 | 2020-12-18 | 레이저 처리 장치 및 레이저 처리 방법 |
PCT/EP2020/087242 WO2021130136A1 (fr) | 2019-12-26 | 2020-12-18 | Dispositif pour traitement par laser et procédé de traitement au laser |
CN202080089847.5A CN114868241A (zh) | 2019-12-26 | 2020-12-18 | 激光处理装置和激光处理方法 |
US17/788,259 US20230035764A1 (en) | 2019-12-26 | 2020-12-18 | Laser treatment device and laser treatment method |
EP20824294.1A EP4082037A1 (fr) | 2019-12-26 | 2020-12-18 | Dispositif pour traitement par laser et procédé de traitement au laser |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1915606 | 2019-12-26 | ||
FR1915606A FR3105748B1 (fr) | 2019-12-26 | 2019-12-26 | Dispositif pour traitement par laser et procédé de traitement au laser |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3105748A1 FR3105748A1 (fr) | 2021-07-02 |
FR3105748B1 true FR3105748B1 (fr) | 2022-09-02 |
Family
ID=70918521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1915606A Active FR3105748B1 (fr) | 2019-12-26 | 2019-12-26 | Dispositif pour traitement par laser et procédé de traitement au laser |
Country Status (7)
Country | Link |
---|---|
US (1) | US20230035764A1 (fr) |
EP (1) | EP4082037A1 (fr) |
JP (1) | JP2023508443A (fr) |
KR (1) | KR20220119630A (fr) |
CN (1) | CN114868241A (fr) |
FR (1) | FR3105748B1 (fr) |
WO (1) | WO2021130136A1 (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11908723B2 (en) | 2021-12-03 | 2024-02-20 | International Business Machines Corporation | Silicon handler with laser-release layers |
EP4389692A1 (fr) * | 2022-12-19 | 2024-06-26 | Epinovatech AB | Dispositif et procédé de stockage d'hydrogène |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7052941B2 (en) * | 2003-06-24 | 2006-05-30 | Sang-Yun Lee | Method for making a three-dimensional integrated circuit structure |
WO2016114382A1 (fr) * | 2015-01-16 | 2016-07-21 | 住友電気工業株式会社 | Procédé de fabrication de substrat semi-conducteur, substrat semi-conducteur, procédé de fabrication de substrat semi-conducteur composite, substrat semi-conducteur composite, et substrat de soudage semi-conducteur |
WO2017004497A1 (fr) * | 2015-07-01 | 2017-01-05 | Sensor Electronic Technology, Inc. | Élimination de structure de substrat |
US10892381B2 (en) * | 2018-02-28 | 2021-01-12 | Sensor Electronic Technology, Inc. | Semiconductor structure with layer having protrusions |
-
2019
- 2019-12-26 FR FR1915606A patent/FR3105748B1/fr active Active
-
2020
- 2020-12-18 CN CN202080089847.5A patent/CN114868241A/zh active Pending
- 2020-12-18 JP JP2022539285A patent/JP2023508443A/ja active Pending
- 2020-12-18 KR KR1020227022957A patent/KR20220119630A/ko active Search and Examination
- 2020-12-18 WO PCT/EP2020/087242 patent/WO2021130136A1/fr unknown
- 2020-12-18 EP EP20824294.1A patent/EP4082037A1/fr active Pending
- 2020-12-18 US US17/788,259 patent/US20230035764A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
US20230035764A1 (en) | 2023-02-02 |
WO2021130136A1 (fr) | 2021-07-01 |
KR20220119630A (ko) | 2022-08-30 |
FR3105748A1 (fr) | 2021-07-02 |
CN114868241A (zh) | 2022-08-05 |
EP4082037A1 (fr) | 2022-11-02 |
JP2023508443A (ja) | 2023-03-02 |
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Legal Events
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PLFP | Fee payment |
Year of fee payment: 2 |
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PLSC | Publication of the preliminary search report |
Effective date: 20210702 |
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PLFP | Fee payment |
Year of fee payment: 3 |
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PLFP | Fee payment |
Year of fee payment: 4 |
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PLFP | Fee payment |
Year of fee payment: 5 |