FR2996015B1 - Illuminateur de dispositif de photolithographie permettant la diffraction controlee - Google Patents

Illuminateur de dispositif de photolithographie permettant la diffraction controlee

Info

Publication number
FR2996015B1
FR2996015B1 FR1259004A FR1259004A FR2996015B1 FR 2996015 B1 FR2996015 B1 FR 2996015B1 FR 1259004 A FR1259004 A FR 1259004A FR 1259004 A FR1259004 A FR 1259004A FR 2996015 B1 FR2996015 B1 FR 2996015B1
Authority
FR
France
Prior art keywords
permitting controlled
photolithographic device
controlled diffraction
device illuminator
illuminator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1259004A
Other languages
English (en)
Other versions
FR2996015A1 (fr
Inventor
Bertrand Plainchamp
Ythier Renaud Mercier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Micro Electronics Equipment Co Ltd
Safran Electronics and Defense SAS
Original Assignee
Shanghai Micro Electronics Equipment Co Ltd
Sagem Defense Securite SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment Co Ltd, Sagem Defense Securite SA filed Critical Shanghai Micro Electronics Equipment Co Ltd
Priority to FR1259004A priority Critical patent/FR2996015B1/fr
Priority to JP2015532464A priority patent/JP6296665B2/ja
Priority to EP13766352.2A priority patent/EP2901214A1/fr
Priority to CN201380057302.6A priority patent/CN104969128B/zh
Priority to PCT/EP2013/069984 priority patent/WO2014049001A1/fr
Priority to US14/430,896 priority patent/US9933703B2/en
Publication of FR2996015A1 publication Critical patent/FR2996015A1/fr
Application granted granted Critical
Publication of FR2996015B1 publication Critical patent/FR2996015B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
FR1259004A 2012-09-25 2012-09-25 Illuminateur de dispositif de photolithographie permettant la diffraction controlee Expired - Fee Related FR2996015B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR1259004A FR2996015B1 (fr) 2012-09-25 2012-09-25 Illuminateur de dispositif de photolithographie permettant la diffraction controlee
JP2015532464A JP6296665B2 (ja) 2012-09-25 2013-09-25 回折の制御を可能にするフォトリソグラフィック照明装置
EP13766352.2A EP2901214A1 (fr) 2012-09-25 2013-09-25 Illuminateur de dispositif de photolithographie permettant la diffraction controlee
CN201380057302.6A CN104969128B (zh) 2012-09-25 2013-09-25 使衍射能够受控的光刻照射设备
PCT/EP2013/069984 WO2014049001A1 (fr) 2012-09-25 2013-09-25 Illuminateur de dispositif de photolithographie permettant la diffraction controlee
US14/430,896 US9933703B2 (en) 2012-09-25 2013-09-25 Photolithographic illuminator device enabling controlled diffraction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1259004A FR2996015B1 (fr) 2012-09-25 2012-09-25 Illuminateur de dispositif de photolithographie permettant la diffraction controlee

Publications (2)

Publication Number Publication Date
FR2996015A1 FR2996015A1 (fr) 2014-03-28
FR2996015B1 true FR2996015B1 (fr) 2014-09-12

Family

ID=47666215

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1259004A Expired - Fee Related FR2996015B1 (fr) 2012-09-25 2012-09-25 Illuminateur de dispositif de photolithographie permettant la diffraction controlee

Country Status (6)

Country Link
US (1) US9933703B2 (fr)
EP (1) EP2901214A1 (fr)
JP (1) JP6296665B2 (fr)
CN (1) CN104969128B (fr)
FR (1) FR2996015B1 (fr)
WO (1) WO2014049001A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2996016B1 (fr) * 2012-09-25 2014-09-19 Sagem Defense Securite Illuminateur de photolithographie telecentrique selon deux directions
JP7240803B2 (ja) 2017-02-24 2023-03-16 三菱鉛筆株式会社 筆記具

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58147708A (ja) * 1982-02-26 1983-09-02 Nippon Kogaku Kk <Nikon> 照明用光学装置
JPS6247124A (ja) * 1985-08-27 1987-02-28 Canon Inc 露光装置用高速シヤツタ−
US5130213A (en) * 1989-08-07 1992-07-14 At&T Bell Laboratories Device manufacture involving lithographic processing
US6157039A (en) * 1998-05-07 2000-12-05 Etec Systems, Inc. Charged particle beam illumination of blanking aperture array
US6597430B1 (en) * 1998-05-18 2003-07-22 Nikon Corporation Exposure method, illuminating device, and exposure system
US6583937B1 (en) * 1998-11-30 2003-06-24 Carl-Zeiss Stiftung Illuminating system of a microlithographic projection exposure arrangement
JPWO2002029870A1 (ja) * 2000-10-05 2004-02-19 株式会社ニコン 露光条件の決定方法、露光方法、デバイス製造方法及び記録媒体
JP3605064B2 (ja) * 2001-10-15 2004-12-22 株式会社ルネサステクノロジ フォーカスモニタ用フォトマスク、フォーカスモニタ方法、フォーカスモニタ用装置および装置の製造方法
US7210820B2 (en) * 2003-05-07 2007-05-01 Resonetics, Inc. Methods and apparatuses for homogenizing light
JP3977311B2 (ja) * 2003-10-10 2007-09-19 キヤノン株式会社 照明装置及び当該照明装置を有する露光装置
US6967711B2 (en) * 2004-03-09 2005-11-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005309380A (ja) * 2004-03-26 2005-11-04 Fuji Photo Film Co Ltd 画像露光装置
KR20070090246A (ko) * 2004-12-22 2007-09-05 칼 짜이스 레이저 옵틱스 게엠베하 선형 빔을 형성하기 위한 광 조명 시스템
US7304731B2 (en) * 2005-09-02 2007-12-04 Kla-Tencor Technologies Corp. Systems and methods for providing illumination of a specimen for inspection
FR2890461B1 (fr) * 2005-09-05 2008-12-26 Sagem Defense Securite Obturateur et illuminateur d'un dispositif de photolithographie
CN101416076A (zh) * 2006-04-03 2009-04-22 株式会社尼康 对浸没液体为疏溶的入射表面和光学窗
US20080013182A1 (en) * 2006-07-17 2008-01-17 Joerg Ferber Two-stage laser-beam homogenizer
CN101587302B (zh) * 2006-11-03 2011-10-12 上海微电子装备有限公司 一种光刻照明系统
US7834980B2 (en) * 2006-12-21 2010-11-16 Asml Netherlands B. V. Lithographic apparatus and method
US8115904B2 (en) * 2008-05-30 2012-02-14 Corning Incorporated Illumination system for sizing focused spots of a patterning system for maskless lithography
CN101458451B (zh) * 2008-12-31 2012-01-11 北京航空航天大学 一种适用于飞秒激光双光子微纳加工系统的光路结构
EP2389606B1 (fr) * 2009-01-24 2019-08-28 Ecole Polytechnique Federale De Lausanne (EPFL) EPFL-TTO Microscopie haute résolution et dispositifs de photolithographie utilisant des miroirs microscopiques de focalisation
DE102009045219A1 (de) * 2009-09-30 2011-03-31 Carl Zeiss Smt Gmbh Beleuchtungssystem für die Mikrolithographie
NL2005548A (en) * 2009-11-20 2011-05-23 Asml Netherlands Bv Homogenizer.
FR2996016B1 (fr) * 2012-09-25 2014-09-19 Sagem Defense Securite Illuminateur de photolithographie telecentrique selon deux directions

Also Published As

Publication number Publication date
WO2014049001A1 (fr) 2014-04-03
CN104969128A (zh) 2015-10-07
JP2015535949A (ja) 2015-12-17
US9933703B2 (en) 2018-04-03
EP2901214A1 (fr) 2015-08-05
CN104969128B (zh) 2017-08-01
US20150248063A1 (en) 2015-09-03
JP6296665B2 (ja) 2018-03-20
FR2996015A1 (fr) 2014-03-28

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