FR2993392B1 - Procede de fabrication de source d'ions - Google Patents
Procede de fabrication de source d'ionsInfo
- Publication number
- FR2993392B1 FR2993392B1 FR1256764A FR1256764A FR2993392B1 FR 2993392 B1 FR2993392 B1 FR 2993392B1 FR 1256764 A FR1256764 A FR 1256764A FR 1256764 A FR1256764 A FR 1256764A FR 2993392 B1 FR2993392 B1 FR 2993392B1
- Authority
- FR
- France
- Prior art keywords
- ion source
- manufacturing ion
- manufacturing
- source
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0802—Field ionization sources
- H01J2237/0805—Liquid metal sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0802—Field ionization sources
- H01J2237/0807—Gas field ion sources [GFIS]
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1256764A FR2993392B1 (fr) | 2012-07-13 | 2012-07-13 | Procede de fabrication de source d'ions |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1256764A FR2993392B1 (fr) | 2012-07-13 | 2012-07-13 | Procede de fabrication de source d'ions |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2993392A1 FR2993392A1 (fr) | 2014-01-17 |
FR2993392B1 true FR2993392B1 (fr) | 2016-03-11 |
Family
ID=46963894
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1256764A Active FR2993392B1 (fr) | 2012-07-13 | 2012-07-13 | Procede de fabrication de source d'ions |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2993392B1 (fr) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58135557A (ja) * | 1982-02-04 | 1983-08-12 | Jeol Ltd | イオンビ−ム発生方法及び装置 |
JPH01296552A (ja) * | 1988-05-24 | 1989-11-29 | Hitachi Ltd | イオンおよび電子ビーム複合装置 |
US8080930B2 (en) * | 2006-09-07 | 2011-12-20 | Michigan Technological University | Self-regenerating nanotips for low-power electric propulsion (EP) cathodes |
-
2012
- 2012-07-13 FR FR1256764A patent/FR2993392B1/fr active Active
Also Published As
Publication number | Publication date |
---|---|
FR2993392A1 (fr) | 2014-01-17 |
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Legal Events
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