FR2978598B1 - Installation et procede de traitement d'un objet par des generateurs de plasma - Google Patents

Installation et procede de traitement d'un objet par des generateurs de plasma

Info

Publication number
FR2978598B1
FR2978598B1 FR1156975A FR1156975A FR2978598B1 FR 2978598 B1 FR2978598 B1 FR 2978598B1 FR 1156975 A FR1156975 A FR 1156975A FR 1156975 A FR1156975 A FR 1156975A FR 2978598 B1 FR2978598 B1 FR 2978598B1
Authority
FR
France
Prior art keywords
installation
processing
plasma generators
generators
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1156975A
Other languages
English (en)
Other versions
FR2978598A1 (fr
Inventor
Marc Brassier
Frederic Moret
Frederic Bretagnol
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Valeo Vision SAS
Original Assignee
Valeo Vision SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1156975A priority Critical patent/FR2978598B1/fr
Application filed by Valeo Vision SAS filed Critical Valeo Vision SAS
Priority to MX2014001141A priority patent/MX2014001141A/es
Priority to US14/234,849 priority patent/US20140231242A1/en
Priority to BR112014002263A priority patent/BR112014002263A2/pt
Priority to CN201280038054.6A priority patent/CN103890898A/zh
Priority to EP12740944.9A priority patent/EP2737515A1/fr
Priority to PCT/EP2012/064577 priority patent/WO2013017495A1/fr
Publication of FR2978598A1 publication Critical patent/FR2978598A1/fr
Application granted granted Critical
Publication of FR2978598B1 publication Critical patent/FR2978598B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/3442—Applying energy to the substrate during sputtering using an ion beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32366—Localised processing
    • H01J37/32376—Scanning across large workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32899—Multiple chambers, e.g. cluster tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
FR1156975A 2011-07-29 2011-07-29 Installation et procede de traitement d'un objet par des generateurs de plasma Expired - Fee Related FR2978598B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR1156975A FR2978598B1 (fr) 2011-07-29 2011-07-29 Installation et procede de traitement d'un objet par des generateurs de plasma
US14/234,849 US20140231242A1 (en) 2011-07-29 2012-07-25 Tool and process for treating an object by plasma generators
BR112014002263A BR112014002263A2 (pt) 2011-07-29 2012-07-25 instalação e processo de tratamento de um objeto por geradores de plasma
CN201280038054.6A CN103890898A (zh) 2011-07-29 2012-07-25 采用等离子体发生器处理对象的工具和方法
MX2014001141A MX2014001141A (es) 2011-07-29 2012-07-25 Herramienta y proceso para tratar un objeto por generadores de plasma.
EP12740944.9A EP2737515A1 (fr) 2011-07-29 2012-07-25 Installation et procédé de traitement d'un objet par des générateurs de plasma
PCT/EP2012/064577 WO2013017495A1 (fr) 2011-07-29 2012-07-25 Installation et procédé de traitement d'un objet par des générateurs de plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1156975A FR2978598B1 (fr) 2011-07-29 2011-07-29 Installation et procede de traitement d'un objet par des generateurs de plasma

Publications (2)

Publication Number Publication Date
FR2978598A1 FR2978598A1 (fr) 2013-02-01
FR2978598B1 true FR2978598B1 (fr) 2014-04-25

Family

ID=46598499

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1156975A Expired - Fee Related FR2978598B1 (fr) 2011-07-29 2011-07-29 Installation et procede de traitement d'un objet par des generateurs de plasma

Country Status (7)

Country Link
US (1) US20140231242A1 (fr)
EP (1) EP2737515A1 (fr)
CN (1) CN103890898A (fr)
BR (1) BR112014002263A2 (fr)
FR (1) FR2978598B1 (fr)
MX (1) MX2014001141A (fr)
WO (1) WO2013017495A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6584927B2 (ja) * 2015-11-13 2019-10-02 住友重機械イオンテクノロジー株式会社 イオン注入装置、およびイオン注入装置の制御方法
US10558192B2 (en) 2016-06-03 2020-02-11 William Wilder Movable gantry system configured to interface with jigs of different sizes
WO2020001774A1 (fr) * 2018-06-28 2020-01-02 Applied Materials, Inc. Procédé de traitement de surface pour un film polymère
CN110890266B (zh) * 2019-11-29 2022-09-23 广州立景创新科技有限公司 音圈马达表面处理方法和设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5273609A (en) * 1990-09-12 1993-12-28 Texas Instruments Incorporated Method and apparatus for time-division plasma chopping in a multi-channel plasma processing equipment
US5296272A (en) * 1990-10-10 1994-03-22 Hughes Aircraft Company Method of implanting ions from a plasma into an object
DE19643865C2 (de) * 1996-10-30 1999-04-08 Schott Glas Plasmaunterstütztes chemisches Abscheidungsverfahren (CVD) mit entfernter Anregung eines Anregungsgases (Remote-Plasma-CVD-Verfahren) zur Beschichtung oder zur Behandlung großflächiger Substrate und Vorrichtung zur Durchführung desselben
US5883374A (en) * 1997-03-27 1999-03-16 Advanced Micro Devices, Inc. Scanning system for identifying wafers in semiconductor process tool chambers
US20040040833A1 (en) * 2002-08-27 2004-03-04 General Electric Company Apparatus and method for plasma treating an article
CN1943002A (zh) * 2004-05-27 2007-04-04 通用电气公司 对物件进行等离子体处理的装置和方法
FR2899242B1 (fr) * 2007-04-05 2010-10-22 Quertech Ingenierie Procede de durcissement par implantation d'ions d'helium dans une piece metallique
CN101545582B (zh) * 2009-05-05 2011-01-05 浙江大学 半导体激光器阵列光束整形照明系统
EP2474642B1 (fr) * 2009-10-08 2016-03-02 Fujikura, Ltd. Procédé de pulvérisation cathodique assistée par faisceau d'ions.

Also Published As

Publication number Publication date
US20140231242A1 (en) 2014-08-21
FR2978598A1 (fr) 2013-02-01
BR112014002263A2 (pt) 2017-02-21
MX2014001141A (es) 2014-02-27
CN103890898A (zh) 2014-06-25
WO2013017495A1 (fr) 2013-02-07
EP2737515A1 (fr) 2014-06-04

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20160331