FR2933811B1 - STEAM ETCHING METHOD OF A MATERIAL, FOR DECOMPOSING A DEFINED PART - Google Patents
STEAM ETCHING METHOD OF A MATERIAL, FOR DECOMPOSING A DEFINED PARTInfo
- Publication number
- FR2933811B1 FR2933811B1 FR0854673A FR0854673A FR2933811B1 FR 2933811 B1 FR2933811 B1 FR 2933811B1 FR 0854673 A FR0854673 A FR 0854673A FR 0854673 A FR0854673 A FR 0854673A FR 2933811 B1 FR2933811 B1 FR 2933811B1
- Authority
- FR
- France
- Prior art keywords
- decomposing
- etching method
- defined part
- steam etching
- steam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/32—Polishing; Etching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/40—Concentrating samples
- G01N1/4044—Concentrating samples by chemical techniques; Digestion; Chemical decomposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/24—Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
Landscapes
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- Immunology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0854673A FR2933811B1 (en) | 2008-07-09 | 2008-07-09 | STEAM ETCHING METHOD OF A MATERIAL, FOR DECOMPOSING A DEFINED PART |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0854673A FR2933811B1 (en) | 2008-07-09 | 2008-07-09 | STEAM ETCHING METHOD OF A MATERIAL, FOR DECOMPOSING A DEFINED PART |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2933811A1 FR2933811A1 (en) | 2010-01-15 |
FR2933811B1 true FR2933811B1 (en) | 2010-09-17 |
Family
ID=40364459
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0854673A Expired - Fee Related FR2933811B1 (en) | 2008-07-09 | 2008-07-09 | STEAM ETCHING METHOD OF A MATERIAL, FOR DECOMPOSING A DEFINED PART |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2933811B1 (en) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08330271A (en) * | 1995-06-02 | 1996-12-13 | Shin Etsu Handotai Co Ltd | Method and device for etching surface of silicon wafer |
JPH08321535A (en) * | 1996-07-04 | 1996-12-03 | Matsushita Electric Ind Co Ltd | Recovery method of impurities |
JP3487334B2 (en) * | 1998-07-17 | 2004-01-19 | 三菱住友シリコン株式会社 | Method for analyzing impurities in silicon substrate |
JP4514267B2 (en) * | 2000-01-11 | 2010-07-28 | 富士フイルム株式会社 | Impurity extraction method and impurity extraction apparatus for semiconductor substrate |
JP3473699B2 (en) * | 2001-10-24 | 2003-12-08 | 三菱住友シリコン株式会社 | Silicon wafer etching method and apparatus and impurity analysis method |
JP2008130696A (en) * | 2006-11-17 | 2008-06-05 | Shin Etsu Handotai Co Ltd | Silicon elimination method for silicon wafer surface, liquid sample extraction method for region under surface layer of silicon wafer, and analysis method for metal impurity in the region |
-
2008
- 2008-07-09 FR FR0854673A patent/FR2933811B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2933811A1 (en) | 2010-01-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
CD | Change of name or company name |
Owner name: SOITEC, FR Effective date: 20120423 |
|
ST | Notification of lapse |
Effective date: 20140331 |