FR2880988A1 - TREATMENT OF A LAYER IN SI1-yGEy TAKEN - Google Patents

Abstract

The invention relates to a method for forming a structure (30) comprising a withdrawn layer (2) from a donor plate (10), the donor plate (10) comprising, before sampling, a first layer (1) of Si1 -xGex and a second layer (2) on the first Si1-yGey layer (1) (x, y being 0 to 1, respectively, and x being different from y), the method comprising the steps of: (a) implanting atomic species to form an embrittlement zone (4) under the second layer (2); (b) bonding the donor plate (10) to a receiving plate (20); (c) supplying energy to detach the layers taken (1 'and 2) from the donor plate (10) at the zone of weakness (4), (d) rapid thermal annealing (also called RTA) carried out at a temperature equal to or greater than about 1000 ° C for a period not exceeding 5 minutes (e) selective etching of the remaining part of the first layer (1 ') opposite the second layer (2).

Description

The present invention relates to a method of forming a structure

  comprising a layer taken of semiconductor material from a donor plate, the donor plate comprising before sampling a first layer Si1_XGe, and a second layer in

  Sii_yGey on the first layer (x, y being respectively between 0 and 1, and x being different from y), the method comprising the following successive steps: (a) implantation of atomic species to form an embrittlement zone under the second layer; (b) gluing the donor plate to a receiver plate; (c) supplying thermal and / or mechanical energy to detach the layer taken from the donor plate at the zone of weakening; (d) treatment of the sampled layer.

  This type of layer sampling uses the Smart-Cut technique, well known to those skilled in the art. An example of implementation of such a sampling method is described in particular in document US2004 / 0053477 in which the second layer has a crystallographic structure elastically constrained by that of the first layer.

  The step (d) of treatment of the layers taken is often necessary to implement to remove defective areas and reduce the roughness present at the surface and which are mainly derived from the implementation of steps (a) and (c). The defect area has a thickness typically around 150 nm for atomic hydrogen implantation.

  For example, mechanical polishing or mechanical-chemical planarization (CMP) can be used to compensate for the surface roughness, and / or sacrificial oxidation steps of the defective zones.

  The bonding according to step (b) being conventionally carried out by means of a layer of electrical insulating material, it will thus be possible to produce a semiconductor-on-insulator structure, such as a Sil _ (Gex / Sii_yGey on insulator structure). .

  As disclosed in US2004 / 0053477, a step subsequent to step (d) may be carried out so as to remove the remaining portion of the first layer, thereby retaining only the second layer on the receiver plate. It will thus be possible to produce a Si1_yGey on insulator structure.

  The removal operation of the remaining portion of the first layer can be effected effectively by selective chemical etching by employing suitable etching agents. In particular, selective chemical etching makes it possible to obtain the desired layer in the end with a good surface quality, without risk of damaging it too much (which could be the case if a single polishing operation were used).

  However, selective chemical etching requires prior preparation of the etching surface, typically performed by mechanical polishing means. Indeed, this preparation for etching remains necessary to reduce the high roughness which could subsequently cause a locally too inhomogeneous etching capable of creating through defects or holes in the second layer.

  However, the successive actions of polishing and chemical etching make the post-detachment finishing step (as well as the entire picking process) long, complex and costly from an economic point of view.

  In addition, the chemical etching may in certain cases cause problems of at least partial delamination of the bonding interface. Indeed, it can in particular delaminate edge of the bonding layer, that is to say attack the latter at its outcropping by the edge of the structure produced. For example, the case of an HF treatment on a sSOI structure (strained Silicon On Insulator) comprising SiO 2 buried under the constrained Si, or the case of an H2O2: HF: HAc treatment (HAc being the abbreviation of acetic acid) on a sSi / SiGeOI structure (strained Silicon on SiGe On Insulator), where the buried SiGe and SiO2 layers are likely to be etched under the constrained Si layer.

  The results obtained in terms of quality of the final product are therefore not satisfactory.

  An alternative that could be considered to circumvent this last problem would be to dilute more strongly the etching agents so as to better control their action. But this solution is not satisfactory because it does not completely solve the delamination problem by substantially extending the duration of the process.

  Another solution that could be considered would be to reinforce the bonding interface before etching, so as to make this interface more resistant to chemical agents. For this purpose, a post-stripping stabilization heat treatment at about 1000 C or more for a few hours could be envisaged.

  However, this well-known solution in the realization of SOI (Silicon On Insulator) structure, is not adapted to the case of the transfer of heterogeneous layers in Sii_XGex and Sii_yGey. Indeed, such heat treatment results in the diffusion of Ge from the layer having the highest Ge content to the layer having the lowest Ge content, thus tending to homogenize the Ge content in all of the two layers. , and thus to no longer differentiate the physical and electrical properties of the two layers.

  Now, if the two layers thus become essentially identical, the subsequent etching can no longer be selective.

  In addition, it is often desirable to avoid any diffusion from one layer to another. This is particularly the case when the second layer is constrained Si (i.e. y = 0) and it is ultimately desired to obtain a sSOI structure to fully benefit from the electrical properties of such a structure (i.e. increased mobility of charges).

  Thus, the treatment temperature is limited by the diffusion of Ge from one layer to another (this diffusion typically starting around 800 C), and the reinforcement carried out at low temperature can then be only partial. The delamination problem therefore remains.

  An object of the invention is to avoid the delamination at the edge of the bonding layer during the implementation of a chemical finishing etching.

  Another object of the invention is to reduce the duration, the economic cost, and the number of processing means, after step (c), of the layers removed, and in particular no longer use mechanical polishing means.

  Another object of the invention is to provide a structure, such as a semiconductor on insulator structure, comprising a withdrawn layer including a less stable material than Si, such as constrained Si or SiGe.

  Another objective of the invention is to reduce the quantity of material sacrificed during the treatment of the sampled layer.

  Another objective of the invention is to propose a simple method for treating the sampled layer and easily integrating into the entire sampling process using the Smart-Cut technique.

  The present invention attempts to overcome these problems by proposing in a first aspect, a method of forming a structure comprising a layer taken from a donor plate, the donor plate comprising before sampling a first layer of Si1, Gex and a second layer on the first Sii_yGey layer (x, y being between 0 and 1 respectively, and x being different from y), the method comprising the following steps: (a) implantation of atomic species to form an embrittlement zone under the second layer; (b) bonding the donor plate to a receiving plate; (c) supply of energy to detach the layers taken from the donor plate at the zone of weakening; (d) rapid thermal annealing (also known as RTA) carried out at a temperature equal to or greater than about 1000 C for a period not exceeding 5 minutes; (e) selectively etching the remaining portion of the first layer with respect to the second layer.

  Other possible features of the invention are: step (d) is carried out at a temperature of between about 1000C and about 1200C for about 10 seconds to about 30 seconds; step (d) is carried out at a temperature around 1100 C for about 10 seconds; step (d) is carried out under a reducing atmosphere; step (d) is carried out under a reducing atmosphere of argon and hydrogen or under a reducing atmosphere of argon; a sacrificial oxidation of a part of the first layer is carried out between step (c) and step (d); - A plasma activation of at least one bonding surface is implemented before step (b); a heat treatment of more than 30 minutes approximately and able to reinforce the bonding is furthermore carried out after step (b); the atomic species implanted during step (a) consist of a single atomic element; the atomic species implanted during step (a) comprise two distinct atomic elements, step (a) thus being a co-implantation; - After step (c), the method does not include the implementation of mechanical polishing means; the method further comprises, after step (e), a crystalline growth of Sii_yGey on the second layer to thicken the latter; the second layer is Si1_yGey elastically constrained; the donor plate further comprises a third Si layer (Gex on the second layer), the donor plate comprises a solid Si support substrate, a SiGe buffer structure, and a multilayer structure alternately comprising first layers of Si1 , Gex and second layers in Si, _yGey constrained, so as to be able to achieve a plurality of samples from the same donor plate; - each layer Sii_yGey constrained to a thickness greater than the critical equilibrium thickness; the method further comprises, prior to step (b), a step of forming a bonding layer on the donor plate (10) and / or on the receiving plate, the bonding layer comprising an electrically insulating material, such as as for example SiO2, Si3N4 or SiXOyNZ.

  According to a second aspect, the invention proposes an application of said method of forming a structure, to the formation of a semiconductor-on-insulator structure.

  Other features, objects and advantages of the invention will appear better on reading the following detailed description of implementation of preferred methods thereof, given by way of nonlimiting examples and with reference to the accompanying drawings for which: Figures 1a to 1f show schematically the various steps of a method according to the invention to form a structure comprising a layer taken by Smart-Cut.

  Figures 2a and 2b show schematically a first variant according to the invention.

  Figures 3a and 3b show schematically a second variant according to the invention.

  FIG. 4 represents results of measurements carried out by secondary ion mass spectrometry making it possible to determine the concentration of germanium in a strained silicon layer taken according to the invention, compared with concentrations of germanium in Si (unconstrained) calculated from diffusion constants of the literature.

  FIG. 5 represents a comparative study of the germanium diffusion coefficients in an unstressed silicon layer and in a strained silicon layer.

  The following are examples of implementations of processes according to the invention, as well as applications according to the invention, based on layers taken by Smart-Cut in material or alloy of type IV, and in particular in If and in SiGe.

  Referring to Figures 1a to 1e, there is illustrated a first method of sampling a first layer 1 Sii_xGex (with x E [0; 1]) and a second layer 2 Sii_yGey (with ye [0; 1 ] and yx), from a donor plate 10, for transfer to a receiving plate 20, according to the invention.

  With reference to FIG. 1a, a donor plate 10, comprising the first Si layer 1, _xGex and the second Si1_yGey layer 2 to be sampled, is illustrated.

  Typically, a donor plate 10 including Si1_xGex, comprises a solid Si substrate 5 on which has been formed, for example by crystal growth, a SiGe buffer structure (not shown) composed of different layers. In particular, the latter may have a gradual evolution in thickness of its Ge composition, ranging from 0% at the bulk Si substrate to about 100x% at the interface with the first layer 1 of Si1_xGex ( it also preferentially formed by crystalline growth). The thickness for the Si1_xGex layer may for example be chosen around 1 micrometer.

  A second layer 2 Si1_yGey is formed on the first layer 1 of Si1_xGex. In a first case, the growth of the second layer 2 is carried out in situ, directly in continuity with the formation of the first layer 1. In a second case, the growth of the second layer 2 is carried out after a slight step of preparing the first layer 2. surface of the first layer 1, for example by CMP polishing.

  The second layer 2 is advantageously formed by epitaxy using known techniques such as CVD and MBE techniques (abbreviations of Chemical Vapor Deposition and Molecular Beam Epitaxy respectively). Thus, for a first layer 1 in S10, 8Geo, 2 and a second layer 2 in constrained Si (i.e. y = 0), it will be possible to form a second layer 2 having a thickness of between about 100 Angstroms and about 800 Angstroms.

  Since the silicon concentration in the two layers 1 and 2 is different, the second layer 2 is then constrained by the first layer 1 so as to make its mesh parameter substantially identical to that of its growth substrate and thus present internal elastic stresses. These internal stresses are in tension if the silicon content in the alloy of the second layer 2 is greater than that of the first layer 1, and they are in compression in the opposite case. It is necessary to form a second, rather thin, layer 2: an excessively large layer thickness, greater than a critical equilibrium thickness, would indeed cause a relaxation of the stress in the thickness of this film towards the nominal mesh parameter of the film. Sii_yGey and / or a generation of defects. Reference can be made to Friedrich Scheler's "High-mobility Si and Ge Structures" ("Semiconductor Science Technology" 12 (1997) 1515-1549) for further details.

  However, in the particular case of a deposition of material constrained to a sufficiently low temperature, it may become possible to form such a second stressed layer 2 having a thickness greater than the critical equilibrium thickness (discussed below).

  With reference to FIG. 1b, an embrittlement zone 4 is then formed in the donor plate 10 under the second layer 2. In particular, this implantation can be made in the first Si1_xGex layer 1 (as shown in FIG. ).

  This embrittlement zone 4 is formed by implantation of atomic species whose dosage, nature, and energy are chosen so as to determine an implant depth and a level of embrittlement. In particular, the energy of the implantation is determined so that the weakening zone is formed below the second layer 2. For a first layer 1 of thickness of about 0.5 micrometer or more and a second layer 2 of thickness between about 100 Angstroms and about 800 Angstroms, for example about 200 Angstroms, this embrittlement zone 4 can be formed between about 1500 Angstroms and about 3000 Angstroms, and more particularly about 2000 Angstroms.

  For example, it is possible to implement an implantation of hydrogen species at an energy of between 20 and 80 keV and a dose of between 3.1016 and 10.1016 atoms / cm 2, more particularly an energy around 30 keV and a dose around 6.1016 atoms / cm2. It will thus be possible to obtain an implant depth of the order of 1000 to 5000 Angstroms.

  Optionally, the parameters determining the implantation of atomic species are adjusted so as to minimize the roughness appearing at the zone of weakening 4 after detachment. Indeed, the extent of post-detachment roughness is partly related to these last parameters. Thus, it may be chosen to implement a coimplantation of atomic species, such as for example a coimplantation of hydrogen, and helium or argon or other inert gas. In the case of co-implantation, it has indeed been noticed that the weakening zone 4 is often thinner than in the case of a simple implantation (see in particular FR 04/09980 for more details).

  Thus, for co-implantation with helium at about 1. 1016 / cm 2 and energy between 20 and 80 Kev and hydrogen at 1. 1016 / cm 2 and energy between 20 and 80 Kev, will be able to obtain an implant depth of the order of 1000 to 5000 Angstroms.

  With reference to FIG. 1c, a step of bonding a receiver plate 20 with the face of the donor plate 10 having undergone coimplantation, is carried out.

  The receiving plate 20 may be solid Si or other materials. Prior to the bonding step, a bonding layer may be formed, such as a layer comprising SiO 2, Si 3 N 4, SiO 2 N 2 on the one and / or the other of the respective surfaces to be bonded. The technique used to form this bonding layer may be a deposit, in order to avoid any deterioration of the stresses in the second layer 2 or any consequent diffusion in the first layer 1.

  Prior to bringing the receiving plate 20 into contact with the donor plate 10, a preparation of at least one of the surfaces to be bonded may optionally be carried out, using the known cleaning and surface preparation techniques such as SC1 and SC2 solutions, ozonated solutions, or others.

  The bonding as such can be carried out firstly by molecular adhesion, taking into account the hydrophilicity that each of the two surfaces to be bonded has.

  It will also be possible to implement a plasma activation of one or both bonding surfaces just before bonding, mainly to strengthen the future bonding interface without implementing high temperature heat treatment. In particular, the plasma activation can be implemented so that in the end, after bonding and after sampling, the bonding energy is greater than or equal to about 0.8 J / m2. The plasma can be obtained for example from an inert gas, such as Ar or N2, or from an oxidizing gas, such as O2.

  Optionally, a low temperature annealing heat treatment (less than or equal to 800 ° C.) can be implemented before bonding, so as to further strengthen the bonding interface.

  With reference to FIG. 1d, detachment of the layers taken at the weakening zone 4 is achieved by a supply of thermal energy and / or mechanical energy, sufficient to break the weak links at the level of the embrittlement 4, and thus detach the donor plate 10 in a first portion 10 'comprising a remainder of the first layer 1 "and in a second portion 30 comprising the other part of the first layer 1' and the second layer 2. This energy thermal can then be sufficient to cause, at the level of the embrittlement zone 4, thermal effects on the gaseous species enclosed therein causing the breaking of weak bonds.

  The detachment may be obtained at temperatures of between about 300 ° C. and about 600 ° C. for longer or shorter periods depending on whether the temperature is respectively lower or higher.

  For example, it will be possible, for a layer to be sampled with Si1_xGex and Si1_yGey, to heat treat at a temperature of about 500 ° C. to about 600 ° C. for a period ranging from 15 to 30 minutes to 2 hours. and more particularly around 600 C.

  In the case where the detachment is carried out solely by heat treatment, it may allow detachment without necessarily removing contact with the remaining portion of the donor plate 10 '.

  In the latter case, and optionally, it will be possible to carry out a new heat treatment directly after the detachment, without leaving the plates of the furnace (in which the detachment heat treatment took place), and without performing additional manipulations which would represent a waste of time, and would require the use of appropriate equipment. In addition, the remaining portion of the donor plate 10 'provides protection to the first and second layers 1' and 2 taken against possible contaminants, oxidants, or other species, which offers the possibility of implementing the new heat treatment in different atmospheres.

  Heat treatment can also be done after the plates have been physically separated (and out of the detachment oven). This heat treatment can be implemented in addition to or in replacement of the plasma activation possibly used before bonding. In all cases, the heat treatment for reinforcing the bonding interface 6 is carried out at a temperature of between about 350 ° C. and about 800 ° C., in particular between about 350 ° C. and about 700 ° C., in particular at about 600 ° C. maintained for about 30 minutes to about 4 hours, and is implemented so as to sufficiently reinforce the bonding (and thus prevent the risk of edge delamination during the selective etching that will be implemented after sampling).

  According to the invention, then, after detachment, with or without the previous step of reinforcing the bonding interface, a rapid thermal annealing (also known as RTA, of the Rapid Thermal Annealing) is implemented. at a temperature greater than or equal to about 1000 ° C. for a period not exceeding about 5 minutes.

  This RTA is preferably carried out under a reducing atmosphere, such as an atmosphere of Argon and Hydrogen or Argon only.

  For example, such an RTA may be used at about 1000 ° C to about 1200 ° C for about 10 to about 30 seconds, particularly at about 1100 ° C for about 10 seconds.

  This temperature of 1000 C or more is a temperature which is conventionally not used when there are two layers 1 is and 2 having different concentrations of Ge. Indeed, it has been recognized (see for example the paper by M. Griglione et al entitled Diffusion of Ge in Si1_xGex / Si single quantum well in inert and oxidazing ambients (Journal of Applied Physics, vol 88, n 3, 1st August 2000)) that thermal treatments carried out at these temperatures resulted in the diffusion of Ge from the layer with the highest Ge content to the layer with the lowest Ge content, thus tending to homogenize the Ge content in the set of two layers, and thus to no longer differentiate the physical and electrical properties of the two layers. This diffusion is not desired in the context of the invention, as well as in most conventional processes, in particular because a differentiation of the layers 1 'and 2 will allow subsequent implementation of selective etching of the first layer. This is why the known processes, as has been specified above, have been implemented using techniques allowing to remain below 1000 C, and more particularly below 800 C (see in particular FR 04/09980).

  The Applicant, however, has carried out series of studies on Si1_, Gex / Sii_yGey constrained / SiO2 / solid Si plate structures obtained just after detachment, showing that the diffusion of Ge during a treatment at 800 C or more is not as marked as what was advanced. In particular, the Applicant has demonstrated that an RTA as previously described can thus be implemented without the diffusion between the first layer 1 'and the second layer 2 is consistent.

  Referring to Figure 4, there is shown a series of these results obtained by the Applicant.

  Measurements were made on structures each similar to the structure shown in Figure 1c, obtained after detachment of the sampled layers and 2. The first layer 1 'was, in the context of this study, 20% germanium. (ie x = 0.2) and a thickness of about 200 Angstroms, and the second layer 2 was constrained silicon (ie y = 0) and of a thickness of about 200 Angstroms.

  The x-axis of the graph of FIG. 4 represents the depth probed in the samples tested, starting from the free surface of the first layer 1 '.

  FIG. 4 is divided into a left part 1 'representing the first layer 1' and a straight part 2 representing the second layer 2, separated by a vertical line 12 representing the interface between the first layer 1 'and the second layer 2.

  The y-axis of FIG. 4 represents the concentration of germanium found by the measurements.

  The measurements were carried out by secondary ion mass spectrometry on three samples, after these have undergone heat treatments at temperatures of 750 C, 800 C and 850 C for four hours, and the results of respective measurements being represented by the diffusion profiles 62, 63 and 64.

  In accordance with what has already been observed in the state of the art, it is observed that the more the temperature is increased around 800 ° C., the more the germanium diffusion takes place in the depth of the silicon layer 2 underlying the layer 1 'of Sio, 8Geo, 2.

  Figure 4 further includes diffusion profiles calculated theoretically from the data provided in the document by M. Griglione et al. entitled Diffusion of Ge in Sii_XGex / Si single quantum well in inert and oxidazing ambients (Journal of Applied Physics, vol 88, n 3, Aug. 1, 2000), in which a study of a relaxed silicon layer / SiO, 55Geo, 15 was done. The diffusion profiles 52, 53, 54 are then found after thermal calculations have been incorporated into the calculations at temperatures of 750 ° C., 800 ° C., 850 ° C. for four hours, respectively.

  Comparing respectively the measured diffusion profiles 62, 63, 64 and corresponding theoretical 52, 53, 54, it is found that there is significantly less Ge in the second layer 2 in Si forced away from the interface 12 with the first layer 1 'in the context of the measurements made by the Applicant, than in the theoretical case of a second layer 2 in relaxed Si. This difference in concentration of Ge between the measurements and the theory is moreover all the more important as one moves away from the interface 12 between the two layers. It is notably from a depth of about 10 Angstroms under the interface 12 that the differences between the theory and the measurements become sensitive. These differences are summarized in the table below, giving the ratios between the concentrations of Ge calculated in theory and the concentrations of Ge measured by the Applicant: Depth 220 Angstroms 230 Angstroms 250 Angstroms Treatment 1/9 1/70 1/600 thermal at 800 ° C. 1/2 1/6 1/25 thermal treatment at 850 ° C The differences between the theory and the measurements in the case of a pre-treatment heat treatment at 750 ° C. are less important when comparing the diffusion profiles 62 and 52. In addition, a measurement on a sample that had not been subjected to a heat treatment gave a diffusion profile almost identical to that given on a sample treated at 750 C. The Applicant thus confirmed that the diffusion profile does not change significantly between room temperature and 750 C.

  On the other hand, the Applicant has shown that the diffusion profiles 62 and 63 tend to be closer to the initial profile (after epitaxy) than the diffusion profiles given in the state of the art (ie diffusion profiles 53, 54). .

  With reference to FIG. 5, the Applicant has calculated the diffusion coefficient D (in square centimeters per second) (ie the y-axis) according to the temperature of the heat treatment performed on the samples (the abscissa axis representing the inverse of temperature T in Kelvin multiplied by 10,000).

  The points 83 and 84 respectively represent the diffusion coefficients found from the broadcast distribution profiles 63 and 64 of FIG. 3. The points 73 and 74 were found by Griglione (see the document reference above) and correspond to diffusions found after heat treatments respectively at 800 C and 850 C for four hours.

  It is then found that the diffusion coefficients in the second strained Si layer 2 are of the order of four times lower than in a second relaxed Si layer 2, at the temperatures considered.

  The results obtained by the Applicant thus show that the diffusion of Ge is surprisingly reduced in the case of a second layer 2 in constrained Si compared to the case where it would be in Si relaxed. Post-stripping heat treatments carried out at temperatures above the temperatures conventionally employed can then be envisaged.

  The Applicant has thus implemented rapid thermal annealing at high temperature (RTA) according to the invention, and then demonstrated that their influence on the diffusion of germanium in the second layer 2 of Si constrained were much less than which would have been deduced from prior technical education.

  The implementation of an RTA then makes it possible both to reduce the post-detachment roughness before the selective etching, and to sufficiently stabilize the bonding interface to limit delamination problems during this selective etching.

  This latter post-detachment roughness could previously be limited by having previously adapted the implantation conditions, as previously seen (co-implantation H and He), and / or a fracture annealing at 600 C, in order to reduce the roughness. .

  In addition, the RTA can lead to an encapsulation of the oxide layer by smoothing effect of the SiGe layer on the plate edges, as described in the document FR 03/02623, which tends to limit further advantage delamination problems at the interface at the time of selective etching.

  Optionally, it will be possible to carry out, before the ATR, a sacrificial oxidation of a part of the first layer 1 ', which will then have the effect of reducing the thickness of Si1_xGex to be removed by etching and to further reduce the roughness before the implementation of the ATR.

  This sacrificial oxidation is carried out for example at a temperature of less than 650 ° C. The thickness removed may be around 500 to 1500 A, preferably around 1000 A, depending on the thickness of the first remaining layer 1 '. .

  Referring to Figure 1f, the first layer 1 'of Si1_xGex is optionally removed to obtain a final structure Si1_yGey constrained on insulator. It will then be possible optionally to thicken the thickness of Sil_ yGey constrained by epitaxy.

  To selectively remove the layer 1 'Sii_XGex, we can implement a selective chemical etching using chemical agents suitable for the materials in the presence.

  Thus, according to a first example, the second layer 2 is constrained Si (ie y = 0), it will then be possible to use HF: H2O2: CH3COOH, SC1 (NH4OH / H2O2 / H2O), or HNA (HF / HNO3 / H2O) to remove the remainder of the first layer 1 '. Also, a selectivity of about 40: 1 between SiGe and sSi can be obtained with CH3COOH / H2O2 / HF.

  An example of a concentration that can be selected for CH3COOH / H2O2 / HF is 4: 3: 0.25, and for SC1 is 1: 1: 5.

  The etching time is directly correlated with the speed of the etching. It is typically about 5 minutes for 800A to be etched with CH3COOH / H2O2 / HF.

  Thus, according to a second example, the first layer 1 'has a concentration of Ge less than or equal to 20% (ie x <_0.2) and the second layer 2 has a concentration of Ge greater than 25% (ie y> _0 , 25), TMAH or KOH can then be used to remove the remainder of the first layer 1 '.

  Thus, the implementation of RTA, possibly combined with the prior implementation of a co-implantation and / or a plasma activation and / or a low temperature heat treatment for reinforcing the bonding interface and / or sacrificial oxidation, having considerably reduced the surface roughness and thickness nonuniformities in the sampled layers 1 'and 2, makes it possible to implement a selective etching substantially identical to those of the state of the art but also by eliminating the disadvantages it could present, such as the need to previously implement mechanical polishing means.

  In addition, the strengthening of the bonding (carried out at least by RTA) is sufficient to overcome the problems of edge delamination mentioned above.

  Finally, a fine etching of the surface layer of Si1_yGey constrained (by SC1 treatment for example) can follow the selective etching to remove on the surface of this layer, a thin layer of materials in which the Ge could have diffused.

  The process may optionally be terminated by a high temperature stabilization step to close the bonding interface and / or by a furnace or RTA annealing to achieve a final smoothing of the Si1_XGex constrained layer, if it is necessary to further improve the level of roughness obtained after selective etching.

  Optionally, a subsequent crystalline growth step (epitaxy for example MBE or CVD) is used to thicken the second layer 2 with forced Si1_yGey.

  According to a second variant of the invention, with reference to FIGS. 2a and 2b, the donor plate 10 comprises, successively before sampling, a first layer 1 of Si1_XGex, a second layer 2 made of Si1_yGey constrained, and then a third layer 3 of Si1_XGex. The embrittlement zone is then formed according to the invention under the second layer 2, for example in the first layer 1. A selective etching of the Si1_XGex can then be carried out after RTA, in accordance with what has been seen previously, so that to finally produce a structure Si1_yGey forced / Sii_XGex on insulator (as shown in Figure 2b) with a second layer 2 of Si, _yGey constraint and a third layer 3 in Si1_XGex.

  Optionally, it may optionally thicken the second layer 2 Si1_yGey constrained by crystal growth.

  Optionally and alternatively, a second selective chemical etching of the Si1_yGey constraint can then be carried out In the case where x = 0, (ie the second layer 2 is in forced Si), chemical species based for example on KOH (potassium hydroxide), NH 4 OH (ammonium hydroxide), TMAH (tetramethyl ammonium hydroxide), EDP (ethylene diamine / pyrocatechol / pyrazine) can then be used. In this case, the second layer 2 in constrained Si plays only the role of a barrier layer protecting the third layer 3 Si1_, Ge, the first etching. A SiGeOI structure (not shown) is then obtained. Optionally, it will be possible to grow a strained Si layer on the SiGeOI, this new strained layer may then have a crystal structure of better quality than the first layer 1 which has been etched before.

  According to a third variant of the invention, with reference to FIGS. 3a and 3b, the donor plate 10 comprises before sampling a multilayer structure comprising alternately first layers 1A, 1B, 1C, 1D, 1E in Si1_XGex and second layers 2A, 2B, 2C, 2D, 2E in Si1_yGey constrained. It is thus possible to carry out a plurality of samples according to the invention from the same donor plate 10, each sample then being followed by recycling of the remaining part of the donor plate 10 in order to prepare it for a new sample. Thus, for example, a first structure 30A Si1_yGey constrained on an insulator and a second structure 30B Si1_yGey constrained on insulator from the same donor plate 10 will be formed. This type of sampling is taught in the document US2004 / 0053477.

  According to a particular case of the invention, each stressed layer [referenced 2 in FIGS. 1a to 1f, 2a and 2b, and 2A, 2B, 2C, 2D or 2E in FIGS. 3a and 3b] of the donor plate 10 is thick. , that is to say that it has a thickness greater than the critical thickness of equilibrium (thickness from which the elastic stresses begin to relax) without presenting relaxation of its elastic stresses. This has been made possible by low temperature epitaxial formation. For example, a strained Si layer deposited at temperatures of between approximately 450 ° C. and 650 ° C. on a growth support in SiO 8 Ge 2 can typically reach a thickness of between approximately 30 nm and 60 nm without its stresses loosening. one way or another.

  If one thus forms such a thick stressed layer, one must then take care not to exceed a certain limit temperature (which is around the deposition temperature) in the following treatments, and in particular the treatments being located between the deposit of the layer and detachment of it by Smart-Cut, in order to avoid relaxation of the stresses.

  Thus, in this case of thick stress layer, it will advantageously be implemented plasma activation before bonding (as discussed above) which is typically done at an ambient temperature of less than about 100 C. On the other hand, at least one layer bonding material of dielectric material, such as SiO 2, is advantageously formed on one or both surfaces to be bonded, this layer of dielectric material subsequently helping (ie after detachment) to retain the elastic stresses. In addition to the plasma activation, a post-detachment thermal treatment at a temperature T (as discussed above) can be implemented, T being advantageously less than the deposition temperature of the thick-stressed layer in the case where no bonding layer has been planned.

  Of course, those skilled in the art can easily implement the invention in the case where minority species are added to the Si1_XGex and Si1_yGey layers, for example by adding dopant species and / or carbon in a small amount (about 5 % or less).

Claims (35)

  A method of forming a structure (30) comprising a withdrawn layer (2) from a donor plate (10), the donor plate (10) comprising before sampling a first layer (1) of Si1_XGeX and a second layer (2) on the first layer (1) Sii_yGey (x, y being respectively between 0 and 1, and x being different from y), the method comprising the following steps: io (a) implantation of atomic species for forming an embrittlement zone (4) under the second layer (2); (b) bonding the donor plate (10) to a receiving plate (20); (c) providing energy to detach the sampled layers (1 'and 2) from the donor plate (10) at the weakening zone (4); (d) rapid thermal annealing (also called RTA) carried out at a temperature equal to or greater than about 1000 C for a period not exceeding 5 minutes; (e) selectively etching the remaining portion of the first layer (1 ') with respect to the second layer (2).   2. Training method according to the preceding claim, characterized in that step (d) is carried out at a temperature between about 1000 C and about 1200 C for about 10 seconds to about 30 seconds.   3. Training method according to the preceding claim, characterized in that step (d) is carried out at a temperature around 1100 C for about 10 seconds.   4. Formation method according to one of the preceding claims, characterized in that step (d) is carried out under a reducing atmosphere.   5. Formation process according to the preceding claim, characterized in that step (d) is carried out under a reducing atmosphere of argon and hydrogen or under an argon reducing atmosphere.   6. Formation process according to one of the preceding claims, characterized in that a sacrificial oxidation of a portion of the first layer (1 ') is carried out between step (c) and step (d). ).   io 7. Formation method according to one of the preceding claims, characterized in that a plasma activation of at least one bonding surface is implemented before step (b).   8. Training method according to one of the preceding claims, is characterized in that a heat treatment of more than 30 minutes and capable of reinforcing the bonding is further implemented after step (b).   9. A process for forming a structure according to the preceding claim, characterized in that the heat treatment is carried out before step (d) and is carried out at a temperature of between about 350 ° C. and about 800 ° C. for 30 minutes at 4 ° C. hours.   10.Process of forming a structure according to the preceding claim, characterized in that the heat treatment is at a temperature between about 350 C and about 700 C.   11.Process of forming a structure according to the preceding claim, characterized in that the heat treatment is at a temperature around 600 C.   12.Process of forming a structure according to one of the three preceding claims, characterized in that the heat treatment is carried out after step (c) and continuity of step (c), in the same oven.   13.Process of forming a structure according to the preceding claim, characterized in that the heat treatment comprises a simple change in temperature from the detachment temperature of step (c) to the temperature chosen for the heat treatment.   io 14.Procédé formation of a structure according to the preceding claim, characterized in that step (c) is implemented around 600 C for a period of time ranging from about 30 minutes to 2 hours.   15.Procédé de formation of a structure according to claim 8, characterized in that the heat treatment is carried out after step (e) at a temperature between about 1000 C and about 1100 C for about 2 hours.   16. A method of forming a structure according to one of the preceding claims, characterized in that the atomic species implanted in step (a) consist of a single atomic element.   17. A method of forming a structure according to the preceding claim, characterized in that the atomic species implanted in step (a) are hydrogen.   18. A method of forming a structure according to the preceding claim, characterized in that the dosages of hydrogen are chosen to be of the order of 3.1016 atoms / cm 2 to 10.1016 atoms / cm 2, and in that the energy Hydrogen implantation is chosen in a range of 20 to 80 keV.   19. A method of forming a structure according to the preceding claim, characterized in that the determination of hydrogen is chosen to be of the order of 6.1016 atoms / cm 2, and in that the implantation energy of the hydrogen is chosen to be of the order of 30 keV.   20. A method of forming a structure according to one of claims 1 to 15, characterized in that the atomic species implanted in step (a) comprise two distinct atomic elements, step (a) being thus a co-implantation.   21. A method of forming a structure according to the preceding claim, characterized in that the co-implantation of step (a) is a co-implantation of helium and hydrogen.   22. A method of forming a structure according to the preceding claim, characterized in that the assays of helium and hydrogen are chosen to be, respectively, of the order of 1. 1016 atoms / cm 2 and 1 order of 1.1016 atoms / cm 2, and in that the implantation energies of helium and hydrogen are chosen in a range of 20 to 80 keV.   23. A method of forming a structure according to the preceding claim, characterized in that the implantation energies of helium and hydrogen are chosen to be, respectively, of the order of 50 keV and the order of 30 keV.   24. A method of forming a structure according to one of the preceding claims, characterized in that, after step (c), the method does not include the implementation of mechanical polishing means.   25. A method of forming a structure according to one of the preceding claims, characterized in that it further comprises, after step (e), a crystalline growth of Sii_yGey on the second layer (2) to thicken this last.   26. A method of forming a structure according to one of the preceding claims, characterized in that the second layer (2) is Si, _yGey elastically constrained.   27. A process for forming a structure according to the preceding claim, characterized in that the donor plate (10) comprises, under the first and second layers, a solid Si support substrate and a SiGe buffer structure.   28. A method of forming a structure according to one of claims 1 to 25, characterized in that the donor plate (10) further comprises is a third layer (3) of Si1, Gex on the second layer (2) .   29. A method of forming a structure according to the preceding claim, characterized in that it further comprises, after step (e), a selective etching of the second layer (2) with respect to the third layer ( 3).   30. A method of forming a structure according to one of claims 1 to 25, characterized in that the donor plate (10) comprises a solid Si support substrate, a SiGe buffer structure, and a multilayer structure comprising alternately first layers (1A, 1B, 1C, 1D, 1E) in Si1_XGex and second layers (2A, 2B, 2C, 2D, 2E) in Si1_yGey constrained, so that a plurality of samples can be made from the same donor plate (10).   31. A method of forming a structure according to one of claims 26 to 30, characterized in that each layer of Si1_yGey constrained to a thickness greater than the critical equilibrium thickness.   32. A method of forming a structure according to the preceding claim, characterized in that it further comprises, prior to step (a), the formation of this strained layer has a deposition temperature of between about 450 C and about 650 C, and in that the treatments implemented between this deposit and the detachment obtained in step (c) are carried out at temperatures less than or equal to the deposition temperature.   33. A method of forming a structure according to one of claims 26 to 32, characterized in that y is equal to 0.   34. A method of forming a structure according to one of the preceding claims, characterized in that it further comprises, before step (b), a step of forming a bonding layer on the donor plate ( 10) and / or on the receiver plate (20), the bonding layer comprising an electrically insulating material, such as, for example, SiO 2, Si 3 N 4 or SixOyNZ.   35. Application of the method of formation of a structure according to the preceding claim, to the formation of a semiconductorsur-insulator structure.