FR2808378B1 - Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre - Google Patents
Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvreInfo
- Publication number
- FR2808378B1 FR2808378B1 FR0005367A FR0005367A FR2808378B1 FR 2808378 B1 FR2808378 B1 FR 2808378B1 FR 0005367 A FR0005367 A FR 0005367A FR 0005367 A FR0005367 A FR 0005367A FR 2808378 B1 FR2808378 B1 FR 2808378B1
- Authority
- FR
- France
- Prior art keywords
- crosslink
- patterns
- layer
- reticle
- active
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31777—Lithography by projection
- H01J2237/31789—Reflection mask
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Analytical Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Filters (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0005367A FR2808378B1 (fr) | 2000-04-27 | 2000-04-27 | Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre |
PCT/FR2001/001005 WO2001081999A1 (fr) | 2000-04-27 | 2001-04-04 | Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre |
EP01921469A EP1290500A1 (fr) | 2000-04-27 | 2001-04-04 | Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre |
AU48457/01A AU4845701A (en) | 2000-04-27 | 2001-04-24 | Active reticle, method for making same, ion projecting lithography method using same and equipment therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0005367A FR2808378B1 (fr) | 2000-04-27 | 2000-04-27 | Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2808378A1 FR2808378A1 (fr) | 2001-11-02 |
FR2808378B1 true FR2808378B1 (fr) | 2003-08-15 |
Family
ID=8849653
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0005367A Expired - Fee Related FR2808378B1 (fr) | 2000-04-27 | 2000-04-27 | Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1290500A1 (fr) |
AU (1) | AU4845701A (fr) |
FR (1) | FR2808378B1 (fr) |
WO (1) | WO2001081999A1 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112899740B (zh) * | 2019-11-15 | 2022-04-19 | 源秩科技(上海)有限公司 | 基于电化学的加工装置和方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4472636A (en) * | 1979-11-01 | 1984-09-18 | Eberhard Hahn | Method of and device for corpuscular projection |
JP2957669B2 (ja) * | 1990-09-28 | 1999-10-06 | 株式会社東芝 | 反射マスク及びこれを用いた荷電ビーム露光装置 |
US5354583A (en) * | 1992-11-09 | 1994-10-11 | Martin Marietta Energy Systems, Inc. | Apparatus and method for selective area deposition of thin films on electrically biased substrates |
-
2000
- 2000-04-27 FR FR0005367A patent/FR2808378B1/fr not_active Expired - Fee Related
-
2001
- 2001-04-04 WO PCT/FR2001/001005 patent/WO2001081999A1/fr not_active Application Discontinuation
- 2001-04-04 EP EP01921469A patent/EP1290500A1/fr not_active Withdrawn
- 2001-04-24 AU AU48457/01A patent/AU4845701A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
FR2808378A1 (fr) | 2001-11-02 |
WO2001081999A1 (fr) | 2001-11-01 |
AU4845701A (en) | 2001-11-07 |
EP1290500A1 (fr) | 2003-03-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FC | Favourable decision of inpi director general on an application for restauration. | ||
RN | Application for restoration | ||
ST | Notification of lapse |