FR2803850B1 - ANTI-REFLECTIVE COATING COMPOSITION, PREPARATION METHOD AND SEMICONDUCTOR DEVICE - Google Patents

ANTI-REFLECTIVE COATING COMPOSITION, PREPARATION METHOD AND SEMICONDUCTOR DEVICE

Info

Publication number
FR2803850B1
FR2803850B1 FR0007512A FR0007512A FR2803850B1 FR 2803850 B1 FR2803850 B1 FR 2803850B1 FR 0007512 A FR0007512 A FR 0007512A FR 0007512 A FR0007512 A FR 0007512A FR 2803850 B1 FR2803850 B1 FR 2803850B1
Authority
FR
France
Prior art keywords
preparation
semiconductor device
coating composition
reflective coating
reflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0007512A
Other languages
French (fr)
Other versions
FR2803850A1 (en
Inventor
Min Ho Jung
Sung Eun Hong
Ki Ho Baik
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SK Hynix Inc
Original Assignee
Hyundai Electronics Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Industries Co Ltd filed Critical Hyundai Electronics Industries Co Ltd
Priority to FR0007512A priority Critical patent/FR2803850B1/en
Publication of FR2803850A1 publication Critical patent/FR2803850A1/en
Application granted granted Critical
Publication of FR2803850B1 publication Critical patent/FR2803850B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
FR0007512A 2000-06-13 2000-06-13 ANTI-REFLECTIVE COATING COMPOSITION, PREPARATION METHOD AND SEMICONDUCTOR DEVICE Expired - Fee Related FR2803850B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR0007512A FR2803850B1 (en) 2000-06-13 2000-06-13 ANTI-REFLECTIVE COATING COMPOSITION, PREPARATION METHOD AND SEMICONDUCTOR DEVICE

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0007512A FR2803850B1 (en) 2000-06-13 2000-06-13 ANTI-REFLECTIVE COATING COMPOSITION, PREPARATION METHOD AND SEMICONDUCTOR DEVICE

Publications (2)

Publication Number Publication Date
FR2803850A1 FR2803850A1 (en) 2001-07-20
FR2803850B1 true FR2803850B1 (en) 2002-05-17

Family

ID=8851211

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0007512A Expired - Fee Related FR2803850B1 (en) 2000-06-13 2000-06-13 ANTI-REFLECTIVE COATING COMPOSITION, PREPARATION METHOD AND SEMICONDUCTOR DEVICE

Country Status (1)

Country Link
FR (1) FR2803850B1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6544717B2 (en) * 1999-01-28 2003-04-08 Tokyo Ohka Kogyo Co., Ltd. Undercoating composition for photolithographic resist
KR100721181B1 (en) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 Organic anti-reflective coating material and preparation thereof
KR100687851B1 (en) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 Organic anti-reflective coating material and preparation thereof
KR100574486B1 (en) * 2000-06-30 2006-04-27 주식회사 하이닉스반도체 Organic anti-reflective coating material and preparation thereof
KR100687850B1 (en) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 Organic anti-reflective coating material and preparation thereof
KR100721182B1 (en) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 Organic anti-reflective coating material and preparation thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2025789A1 (en) * 1989-09-22 1991-03-23 Rama S. Chandran Monomers and polymers containing acetal and aldehyde groups
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions

Also Published As

Publication number Publication date
FR2803850A1 (en) 2001-07-20

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20100930