FR2788708B3 - Appareil et son procede de traitement des surfaces de substrats semi-conducteurs - Google Patents

Appareil et son procede de traitement des surfaces de substrats semi-conducteurs

Info

Publication number
FR2788708B3
FR2788708B3 FR9900977A FR9900977A FR2788708B3 FR 2788708 B3 FR2788708 B3 FR 2788708B3 FR 9900977 A FR9900977 A FR 9900977A FR 9900977 A FR9900977 A FR 9900977A FR 2788708 B3 FR2788708 B3 FR 2788708B3
Authority
FR
France
Prior art keywords
semiconductor substrates
treating surfaces
treating
substrates
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9900977A
Other languages
English (en)
Other versions
FR2788708A1 (fr
Inventor
Lionel Girardie
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to FR9900977A priority Critical patent/FR2788708B3/fr
Publication of FR2788708A1 publication Critical patent/FR2788708A1/fr
Application granted granted Critical
Publication of FR2788708B3 publication Critical patent/FR2788708B3/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
FR9900977A 1999-01-26 1999-01-26 Appareil et son procede de traitement des surfaces de substrats semi-conducteurs Expired - Fee Related FR2788708B3 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9900977A FR2788708B3 (fr) 1999-01-26 1999-01-26 Appareil et son procede de traitement des surfaces de substrats semi-conducteurs

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9900977A FR2788708B3 (fr) 1999-01-26 1999-01-26 Appareil et son procede de traitement des surfaces de substrats semi-conducteurs

Publications (2)

Publication Number Publication Date
FR2788708A1 FR2788708A1 (fr) 2000-07-28
FR2788708B3 true FR2788708B3 (fr) 2001-05-04

Family

ID=9541341

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9900977A Expired - Fee Related FR2788708B3 (fr) 1999-01-26 1999-01-26 Appareil et son procede de traitement des surfaces de substrats semi-conducteurs

Country Status (1)

Country Link
FR (1) FR2788708B3 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7984566B2 (en) * 2003-10-27 2011-07-26 Staples Wesley A System and method employing turbofan jet engine for drying bulk materials
US7980000B2 (en) 2006-12-29 2011-07-19 Applied Materials, Inc. Vapor dryer having hydrophilic end effector
RU2484358C1 (ru) * 2011-12-19 2013-06-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Санкт-Петербургский государственный горный университет" Устройство для устранения скоплений жидкости или газа из проблемных участков газонефтепроводов

Also Published As

Publication number Publication date
FR2788708A1 (fr) 2000-07-28

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Legal Events

Date Code Title Description
ST Notification of lapse