FR2758480B1 - Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substrat - Google Patents
Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substratInfo
- Publication number
- FR2758480B1 FR2758480B1 FR9700488A FR9700488A FR2758480B1 FR 2758480 B1 FR2758480 B1 FR 2758480B1 FR 9700488 A FR9700488 A FR 9700488A FR 9700488 A FR9700488 A FR 9700488A FR 2758480 B1 FR2758480 B1 FR 2758480B1
- Authority
- FR
- France
- Prior art keywords
- substrate
- properties
- compound
- producing
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
- B05D1/283—Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
- B41M3/003—Printing processes to produce particular kinds of printed work, e.g. patterns on optical devices, e.g. lens elements; for the production of optical devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/165—Monolayers, e.g. Langmuir-Blodgett
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Laminated Bodies (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9700488A FR2758480B1 (fr) | 1997-01-17 | 1997-01-17 | Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substrat |
US08/992,405 US6020026A (en) | 1997-01-17 | 1997-12-17 | Process for the production of a coating of molecular thickness on a substrate |
DE69801382T DE69801382T2 (de) | 1997-01-17 | 1998-01-09 | Verfahren zur herstellung einer Beschichtung von monomolekulares Dicke auf einem Substrat |
EP98100274A EP0854389B1 (fr) | 1997-01-17 | 1998-01-09 | Procédé pour l'obtention d'une couche à épaisseur moléculaire sur un substrat |
JP10006456A JPH10323609A (ja) | 1997-01-17 | 1998-01-16 | 基体上に分子厚のコーティングを形成する方法 |
CN98104343A CN1196281A (zh) | 1997-01-17 | 1998-01-19 | 在基材上制造分子厚度的涂层的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9700488A FR2758480B1 (fr) | 1997-01-17 | 1997-01-17 | Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substrat |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2758480A1 FR2758480A1 (fr) | 1998-07-24 |
FR2758480B1 true FR2758480B1 (fr) | 1999-04-23 |
Family
ID=9502718
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9700488A Expired - Fee Related FR2758480B1 (fr) | 1997-01-17 | 1997-01-17 | Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substrat |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2758480B1 (fr) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07122055B2 (ja) * | 1989-11-17 | 1995-12-25 | 富士写真フイルム株式会社 | ポリペプチド薄膜 |
US5512131A (en) * | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
WO1996029629A2 (fr) * | 1995-03-01 | 1996-09-26 | President And Fellows Of Harvard College | Procede d'impression par microcontact sur des surfaces et articles obtenus par ce procede |
-
1997
- 1997-01-17 FR FR9700488A patent/FR2758480B1/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2758480A1 (fr) | 1998-07-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20070930 |