FR2758480B1 - Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substrat - Google Patents

Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substrat

Info

Publication number
FR2758480B1
FR2758480B1 FR9700488A FR9700488A FR2758480B1 FR 2758480 B1 FR2758480 B1 FR 2758480B1 FR 9700488 A FR9700488 A FR 9700488A FR 9700488 A FR9700488 A FR 9700488A FR 2758480 B1 FR2758480 B1 FR 2758480B1
Authority
FR
France
Prior art keywords
substrate
properties
compound
producing
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9700488A
Other languages
English (en)
Other versions
FR2758480A1 (fr
Inventor
Alain Carre
William Birch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Priority to FR9700488A priority Critical patent/FR2758480B1/fr
Priority to US08/992,405 priority patent/US6020026A/en
Priority to DE69801382T priority patent/DE69801382T2/de
Priority to EP98100274A priority patent/EP0854389B1/fr
Priority to JP10006456A priority patent/JPH10323609A/ja
Priority to CN98104343A priority patent/CN1196281A/zh
Publication of FR2758480A1 publication Critical patent/FR2758480A1/fr
Application granted granted Critical
Publication of FR2758480B1 publication Critical patent/FR2758480B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/18Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/28Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B05D1/283Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/003Printing processes to produce particular kinds of printed work, e.g. patterns on optical devices, e.g. lens elements; for the production of optical devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/161Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/165Monolayers, e.g. Langmuir-Blodgett

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Laminated Bodies (AREA)
FR9700488A 1997-01-17 1997-01-17 Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substrat Expired - Fee Related FR2758480B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR9700488A FR2758480B1 (fr) 1997-01-17 1997-01-17 Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substrat
US08/992,405 US6020026A (en) 1997-01-17 1997-12-17 Process for the production of a coating of molecular thickness on a substrate
DE69801382T DE69801382T2 (de) 1997-01-17 1998-01-09 Verfahren zur herstellung einer Beschichtung von monomolekulares Dicke auf einem Substrat
EP98100274A EP0854389B1 (fr) 1997-01-17 1998-01-09 Procédé pour l'obtention d'une couche à épaisseur moléculaire sur un substrat
JP10006456A JPH10323609A (ja) 1997-01-17 1998-01-16 基体上に分子厚のコーティングを形成する方法
CN98104343A CN1196281A (zh) 1997-01-17 1998-01-19 在基材上制造分子厚度的涂层的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9700488A FR2758480B1 (fr) 1997-01-17 1997-01-17 Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substrat

Publications (2)

Publication Number Publication Date
FR2758480A1 FR2758480A1 (fr) 1998-07-24
FR2758480B1 true FR2758480B1 (fr) 1999-04-23

Family

ID=9502718

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9700488A Expired - Fee Related FR2758480B1 (fr) 1997-01-17 1997-01-17 Procede de production d'un revetement d'epaisseur moleculaire sur un substrat tridimensionnel par transfert a sec d'un compose en vue de modifier selectivement les proprietes de certaines parties de la surface de ce substrat

Country Status (1)

Country Link
FR (1) FR2758480B1 (fr)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07122055B2 (ja) * 1989-11-17 1995-12-25 富士写真フイルム株式会社 ポリペプチド薄膜
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
WO1996029629A2 (fr) * 1995-03-01 1996-09-26 President And Fellows Of Harvard College Procede d'impression par microcontact sur des surfaces et articles obtenus par ce procede

Also Published As

Publication number Publication date
FR2758480A1 (fr) 1998-07-24

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20070930