FR2715168B1 - Procédé pour déposer, à la température ambiante, une couche de métal ou de semi-métal et leur oxyde sur un substrat. - Google Patents

Procédé pour déposer, à la température ambiante, une couche de métal ou de semi-métal et leur oxyde sur un substrat.

Info

Publication number
FR2715168B1
FR2715168B1 FR9400387A FR9400387A FR2715168B1 FR 2715168 B1 FR2715168 B1 FR 2715168B1 FR 9400387 A FR9400387 A FR 9400387A FR 9400387 A FR9400387 A FR 9400387A FR 2715168 B1 FR2715168 B1 FR 2715168B1
Authority
FR
France
Prior art keywords
metal
depositing
semi
oxide
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9400387A
Other languages
English (en)
Other versions
FR2715168A1 (fr
Inventor
Odile Dessaux
Pierre Goudmand
Brigitte Mutel
Taleb Abdellah Ben
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universite de Lille 1 Sciences et Technologies
Original Assignee
Universite de Lille 1 Sciences et Technologies
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universite de Lille 1 Sciences et Technologies filed Critical Universite de Lille 1 Sciences et Technologies
Priority to FR9400387A priority Critical patent/FR2715168B1/fr
Priority to PCT/FR1995/000046 priority patent/WO1995019456A1/fr
Priority to AU15390/95A priority patent/AU1539095A/en
Priority to NZ27034095A priority patent/NZ270340A/en
Publication of FR2715168A1 publication Critical patent/FR2715168A1/fr
Application granted granted Critical
Publication of FR2715168B1 publication Critical patent/FR2715168B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
FR9400387A 1994-01-14 1994-01-14 Procédé pour déposer, à la température ambiante, une couche de métal ou de semi-métal et leur oxyde sur un substrat. Expired - Fee Related FR2715168B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR9400387A FR2715168B1 (fr) 1994-01-14 1994-01-14 Procédé pour déposer, à la température ambiante, une couche de métal ou de semi-métal et leur oxyde sur un substrat.
PCT/FR1995/000046 WO1995019456A1 (fr) 1994-01-14 1995-01-13 Procede pour deposer, une couche de metal ou de semi-metal et de leur oxyde
AU15390/95A AU1539095A (en) 1994-01-14 1995-01-13 Method for depositing a film consisting of a metal or semi-metal and an oxide thereof
NZ27034095A NZ270340A (en) 1994-01-14 1995-01-16 Method of depositing a layer of metal, semi-metal and the oxide thereof on a substrate by first treating the substrate with a cold nitrogen plasma in an enclosed space and then admitting a (semi) metal alkyl

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9400387A FR2715168B1 (fr) 1994-01-14 1994-01-14 Procédé pour déposer, à la température ambiante, une couche de métal ou de semi-métal et leur oxyde sur un substrat.

Publications (2)

Publication Number Publication Date
FR2715168A1 FR2715168A1 (fr) 1995-07-21
FR2715168B1 true FR2715168B1 (fr) 1996-03-08

Family

ID=9459058

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9400387A Expired - Fee Related FR2715168B1 (fr) 1994-01-14 1994-01-14 Procédé pour déposer, à la température ambiante, une couche de métal ou de semi-métal et leur oxyde sur un substrat.

Country Status (4)

Country Link
AU (1) AU1539095A (fr)
FR (1) FR2715168B1 (fr)
NZ (1) NZ270340A (fr)
WO (1) WO1995019456A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE218594T1 (de) * 1995-09-15 2002-06-15 Tarkett Sommer Sa Verfahren zur herstellung eines bodenbelages und so hergestelltes produkt
GB9717368D0 (en) * 1997-08-18 1997-10-22 Crowther Jonathan Cold plasma metallization
US6783627B1 (en) 2000-01-20 2004-08-31 Kokusai Semiconductor Equipment Corporation Reactor with remote plasma system and method of processing a semiconductor substrate

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5432184A (en) * 1977-08-18 1979-03-09 Toshiba Corp Forming apparatus for nitride coating
JPS61222534A (ja) * 1985-03-28 1986-10-03 Anelva Corp 表面処理方法および装置
FR2664294B1 (fr) * 1990-07-06 1992-10-23 Plasmametal Procede de metallisation d'une surface.

Also Published As

Publication number Publication date
AU1539095A (en) 1995-08-01
FR2715168A1 (fr) 1995-07-21
NZ270340A (en) 1996-01-26
WO1995019456A1 (fr) 1995-07-20

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Legal Events

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Effective date: 20110930