FR2694644B1 - Procédé pour la réalisation de tampons d'impression et installation mettant en Óoeuvre ce procédé. - Google Patents

Procédé pour la réalisation de tampons d'impression et installation mettant en Óoeuvre ce procédé.

Info

Publication number
FR2694644B1
FR2694644B1 FR9209890A FR9209890A FR2694644B1 FR 2694644 B1 FR2694644 B1 FR 2694644B1 FR 9209890 A FR9209890 A FR 9209890A FR 9209890 A FR9209890 A FR 9209890A FR 2694644 B1 FR2694644 B1 FR 2694644B1
Authority
FR
France
Prior art keywords
installation
producing printing
printing stamps
stamps
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9209890A
Other languages
English (en)
Other versions
FR2694644A1 (fr
Inventor
Serge Crasnianski
Roland Sezanne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kis France SA
Original Assignee
Kis France SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kis France SA filed Critical Kis France SA
Priority to FR9209890A priority Critical patent/FR2694644B1/fr
Publication of FR2694644A1 publication Critical patent/FR2694644A1/fr
Application granted granted Critical
Publication of FR2694644B1 publication Critical patent/FR2694644B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Methods (AREA)
FR9209890A 1992-08-05 1992-08-05 Procédé pour la réalisation de tampons d'impression et installation mettant en Óoeuvre ce procédé. Expired - Fee Related FR2694644B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9209890A FR2694644B1 (fr) 1992-08-05 1992-08-05 Procédé pour la réalisation de tampons d'impression et installation mettant en Óoeuvre ce procédé.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9209890A FR2694644B1 (fr) 1992-08-05 1992-08-05 Procédé pour la réalisation de tampons d'impression et installation mettant en Óoeuvre ce procédé.

Publications (2)

Publication Number Publication Date
FR2694644A1 FR2694644A1 (fr) 1994-02-11
FR2694644B1 true FR2694644B1 (fr) 1994-09-23

Family

ID=9432765

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9209890A Expired - Fee Related FR2694644B1 (fr) 1992-08-05 1992-08-05 Procédé pour la réalisation de tampons d'impression et installation mettant en Óoeuvre ce procédé.

Country Status (1)

Country Link
FR (1) FR2694644B1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994021469A1 (fr) * 1993-03-15 1994-09-29 King Jim Co., Ltd. Appareil de fabrication de sceaux
JP3159610B2 (ja) * 1994-08-23 2001-04-23 株式会社キングジム 印画作成装置
JPH10119403A (ja) * 1996-08-30 1998-05-12 Seiko Epson Corp スタンプ素材およびスタンプ素材のセット治具

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2016599A (en) * 1932-01-22 1935-10-08 Graves Process Inc Master sheet
JPS58143348A (ja) * 1982-02-19 1983-08-25 Asahi Chem Ind Co Ltd 液状感光性樹脂の露光方法
US4915519A (en) * 1987-10-30 1990-04-10 International Business Machines Corp. Direct negative from resistive ribbon
JPH0214184A (ja) * 1988-06-30 1990-01-18 Union Kemikaa Kk リスフィルム材
DE4035306C2 (de) * 1989-11-10 1995-01-05 Krause Biagosch Gmbh Vorrichtung zur Herstellung von Druckplatten

Also Published As

Publication number Publication date
FR2694644A1 (fr) 1994-02-11

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Legal Events

Date Code Title Description
ST Notification of lapse