FR2671931B1 - - Google Patents

Info

Publication number
FR2671931B1
FR2671931B1 FR9100894A FR9100894A FR2671931B1 FR 2671931 B1 FR2671931 B1 FR 2671931B1 FR 9100894 A FR9100894 A FR 9100894A FR 9100894 A FR9100894 A FR 9100894A FR 2671931 B1 FR2671931 B1 FR 2671931B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9100894A
Other languages
French (fr)
Other versions
FR2671931A1 (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to FR9100894A priority Critical patent/FR2671931A1/fr
Priority to EP92420021A priority patent/EP0496681A1/fr
Priority to JP4009196A priority patent/JPH05190294A/ja
Priority to US07/824,210 priority patent/US5216329A/en
Publication of FR2671931A1 publication Critical patent/FR2671931A1/fr
Application granted granted Critical
Publication of FR2671931B1 publication Critical patent/FR2671931B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32688—Multi-cusp fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
FR9100894A 1991-01-22 1991-01-22 Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma. Granted FR2671931A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR9100894A FR2671931A1 (fr) 1991-01-22 1991-01-22 Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma.
EP92420021A EP0496681A1 (fr) 1991-01-22 1992-01-20 Dispositif de répartition d'une énergie micro-onde pour l'excitation d'un plasma
JP4009196A JPH05190294A (ja) 1991-01-22 1992-01-22 プラズマを励起するためにマイクロ波エネルギーを分布させるための装置
US07/824,210 US5216329A (en) 1991-01-22 1992-01-22 Device for distributing a microwave energy for exciting a plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9100894A FR2671931A1 (fr) 1991-01-22 1991-01-22 Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma.

Publications (2)

Publication Number Publication Date
FR2671931A1 FR2671931A1 (fr) 1992-07-24
FR2671931B1 true FR2671931B1 (US06815460-20041109-C00097.png) 1997-02-21

Family

ID=9409082

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9100894A Granted FR2671931A1 (fr) 1991-01-22 1991-01-22 Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma.

Country Status (4)

Country Link
US (1) US5216329A (US06815460-20041109-C00097.png)
EP (1) EP0496681A1 (US06815460-20041109-C00097.png)
JP (1) JPH05190294A (US06815460-20041109-C00097.png)
FR (1) FR2671931A1 (US06815460-20041109-C00097.png)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1262897B (it) * 1992-03-11 1996-07-22 Proel Tecnologie Spa Generatore di plasma perfezionato e relativo metodo di ionizzazione
US5231334A (en) * 1992-04-15 1993-07-27 Texas Instruments Incorporated Plasma source and method of manufacturing
FR2702119B1 (fr) * 1993-02-25 1995-07-13 Metal Process Dispositif d'excitation d'un plasma à la résonance cyclotronique électronique par l'intermédiaire d'un applicateur filaire d'un champ micro-onde et d'un champ magnétique statique.
US5466295A (en) * 1993-10-25 1995-11-14 Board Of Regents Acting For The Univ. Of Michigan ECR plasma generation apparatus and methods
US5518547A (en) * 1993-12-23 1996-05-21 International Business Machines Corporation Method and apparatus for reducing particulates in a plasma tool through steady state flows
FR2715019B1 (fr) * 1994-01-13 1996-04-05 Plasmion Dispositif pour former un plasma par application de micro-ondes afin de produire un faisceau d'ions.
FR2726729B1 (fr) * 1994-11-04 1997-01-31 Metal Process Dispositif de production d'un plasma permettant une dissociation entre les zones de propagation et d'absorption des micro-ondes
US5800619A (en) * 1996-06-10 1998-09-01 Lam Research Corporation Vacuum plasma processor having coil with minimum magnetic field in its center
US5707452A (en) * 1996-07-08 1998-01-13 Applied Microwave Plasma Concepts, Inc. Coaxial microwave applicator for an electron cyclotron resonance plasma source
DE19756774B4 (de) * 1997-12-19 2009-12-31 Tec Tra Gmbh Mikrowellenplasmaquelle
US6189484B1 (en) 1999-03-05 2001-02-20 Applied Materials Inc. Plasma reactor having a helicon wave high density plasma source
FR2775986B1 (fr) * 1998-03-10 2000-05-05 Air Liquide Procede et installation de traitement de surface d'une piece metallique
WO2000037206A2 (en) * 1998-12-23 2000-06-29 Applied Science And Technology, Inc. Permanent magnet ecr plasma source with integrated multipolar magnetic confinement
KR100725105B1 (ko) * 2006-07-12 2007-06-04 삼성전자주식회사 반도체 제조설비의 애플리케이터
FR2904177B1 (fr) * 2006-07-21 2008-11-07 Centre Nat Rech Scient Dispositif et procede de production et de confinement d'un plasma.
FR2938150B1 (fr) * 2008-10-30 2010-12-17 Centre Nat Rech Scient Dispositif et procede de production et/ou de confinement d'un plasma
KR20120042748A (ko) 2009-05-13 2012-05-03 씨브이 홀딩스 엘엘씨 코팅된 표면 검사를 위한 가스제거 방법
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
JP6095678B2 (ja) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 薬剤パッケージ用の不動態化、ｐＨ保護又は滑性皮膜、被覆プロセス及び装置
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
WO2014085346A1 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Hollow body with inside coating
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
KR20140087215A (ko) * 2012-12-28 2014-07-09 주식회사 윈텔 플라즈마 장치 및 기판 처리 장치
EP2961858B1 (en) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Coated syringe.
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
CA2904611C (en) 2013-03-11 2021-11-23 Sio2 Medical Products, Inc. Coated packaging
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
FR3005825B1 (fr) 2013-05-17 2015-06-19 Thales Sa Generateur de plasma etendu comprenant des generateurs elementaires integres
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US10249479B2 (en) * 2015-01-30 2019-04-02 Applied Materials, Inc. Magnet configurations for radial uniformity tuning of ICP plasmas
CA2995225C (en) 2015-08-18 2023-08-29 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
US10163609B2 (en) * 2016-12-15 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Plasma generation for ion implanter

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0740468B2 (ja) * 1984-12-11 1995-05-01 株式会社日立製作所 高周波プラズマ発生装置
WO1986006923A1 (en) * 1985-05-03 1986-11-20 The Australian National University Method and apparatus for producing large volume magnetoplasmas
FR2583250B1 (fr) * 1985-06-07 1989-06-30 France Etat Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique
JPS6276137A (ja) * 1985-09-30 1987-04-08 Hitachi Ltd イオン源
DE3705666A1 (de) * 1987-02-21 1988-09-01 Leybold Ag Einrichtung zum herstellen eines plasmas und zur behandlung von substraten darin
US4992696A (en) * 1989-02-17 1991-02-12 The United States Of America As Represented By The United States Department Of Energy Apparatus having reduced mechanical forces for supporting high magnetic fields
US5081398A (en) * 1989-10-20 1992-01-14 Board Of Trustees Operating Michigan State University Resonant radio frequency wave coupler apparatus using higher modes

Also Published As

Publication number Publication date
FR2671931A1 (fr) 1992-07-24
JPH05190294A (ja) 1993-07-30
EP0496681A1 (fr) 1992-07-29
US5216329A (en) 1993-06-01

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Legal Events

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