FR2555613B1 - Procede pour la pulverisation cathodique sur un support d'une pellicule d'oxyde d'indium de basse resistance - Google Patents

Procede pour la pulverisation cathodique sur un support d'une pellicule d'oxyde d'indium de basse resistance

Info

Publication number
FR2555613B1
FR2555613B1 FR8418096A FR8418096A FR2555613B1 FR 2555613 B1 FR2555613 B1 FR 2555613B1 FR 8418096 A FR8418096 A FR 8418096A FR 8418096 A FR8418096 A FR 8418096A FR 2555613 B1 FR2555613 B1 FR 2555613B1
Authority
FR
France
Prior art keywords
support
oxide film
low resistance
indium oxide
cathode spraying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8418096A
Other languages
English (en)
Other versions
FR2555613A1 (fr
Inventor
Frank Howard Gillery
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PPG Industries Inc
Original Assignee
PPG Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PPG Industries Inc filed Critical PPG Industries Inc
Publication of FR2555613A1 publication Critical patent/FR2555613A1/fr
Application granted granted Critical
Publication of FR2555613B1 publication Critical patent/FR2555613B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12597—Noncrystalline silica or noncrystalline plural-oxide component [e.g., glass, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
FR8418096A 1983-11-30 1984-11-28 Procede pour la pulverisation cathodique sur un support d'une pellicule d'oxyde d'indium de basse resistance Expired FR2555613B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/556,657 US4512864A (en) 1983-11-30 1983-11-30 Low resistance indium oxide films

Publications (2)

Publication Number Publication Date
FR2555613A1 FR2555613A1 (fr) 1985-05-31
FR2555613B1 true FR2555613B1 (fr) 1987-01-02

Family

ID=24222281

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8418096A Expired FR2555613B1 (fr) 1983-11-30 1984-11-28 Procede pour la pulverisation cathodique sur un support d'une pellicule d'oxyde d'indium de basse resistance

Country Status (4)

Country Link
US (1) US4512864A (fr)
JP (1) JPS60138068A (fr)
FR (1) FR2555613B1 (fr)
GB (1) GB2150599B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4565616A (en) * 1984-04-30 1986-01-21 Ppg Industries, Inc. Method for producing a photoelectroforming mandrel
JPS6237052U (fr) * 1985-08-23 1987-03-05
DE3901046A1 (de) * 1988-01-22 1989-08-03 Ppg Industries Inc Verfahren und vorrichtung zum herstellen einer isolierten mehrscheibeneinheit
US5225273A (en) * 1989-12-28 1993-07-06 Teijin Limited Transparent electroconductive laminate
CH686747A5 (de) * 1993-04-01 1996-06-14 Balzers Hochvakuum Optisches Schichtmaterial.
WO2010034033A1 (fr) * 2008-09-22 2010-03-25 Madico, Inc. Système pour le filtrage de transmissions radiofréquence et optiques dans l’infrarouge

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4094763A (en) * 1970-07-31 1978-06-13 Ppg Industries, Inc. Sputter coating of glass with an oxide of a metal having an atomic number between 48 and 51 and mixtures thereof
CA934325A (en) * 1970-07-31 1973-09-25 Ppg Industries, Inc. Coating glass
US3907660A (en) * 1970-07-31 1975-09-23 Ppg Industries Inc Apparatus for coating glass
US4166018A (en) * 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US4046659A (en) * 1974-05-10 1977-09-06 Airco, Inc. Method for coating a substrate
CH611938A5 (fr) * 1976-05-19 1979-06-29 Battelle Memorial Institute
JPS5541959A (en) * 1978-09-18 1980-03-25 Sanyo Shinku Kogyo Kk Production of indium oxide transparent conductive film through sputtering
US4201649A (en) * 1978-11-29 1980-05-06 Ppg Industries, Inc. Low resistance indium oxide coatings
JPS5788028A (en) * 1980-11-14 1982-06-01 Asahi Glass Co Ltd Formation of electrically conductive transparent film of indium oxide
JPS58209549A (ja) * 1982-06-01 1983-12-06 株式会社豊田中央研究所 熱線しゃへい積層体

Also Published As

Publication number Publication date
US4512864A (en) 1985-04-23
GB2150599B (en) 1987-08-12
GB8430170D0 (en) 1985-01-09
JPS60138068A (ja) 1985-07-22
FR2555613A1 (fr) 1985-05-31
GB2150599A (en) 1985-07-03

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Legal Events

Date Code Title Description
TP Transmission of property