FR2532790B1 - Appareil laser - Google Patents
Appareil laserInfo
- Publication number
- FR2532790B1 FR2532790B1 FR8314093A FR8314093A FR2532790B1 FR 2532790 B1 FR2532790 B1 FR 2532790B1 FR 8314093 A FR8314093 A FR 8314093A FR 8314093 A FR8314093 A FR 8314093A FR 2532790 B1 FR2532790 B1 FR 2532790B1
- Authority
- FR
- France
- Prior art keywords
- laser apparatus
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0404—Air- or gas cooling, e.g. by dry nitrogen
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57153539A JPS5943584A (ja) | 1982-09-03 | 1982-09-03 | レ−ザ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2532790A1 FR2532790A1 (fr) | 1984-03-09 |
| FR2532790B1 true FR2532790B1 (fr) | 1987-01-09 |
Family
ID=15564723
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8314093A Expired FR2532790B1 (fr) | 1982-09-03 | 1983-09-02 | Appareil laser |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4697269A (enExample) |
| JP (1) | JPS5943584A (enExample) |
| FR (1) | FR2532790B1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL81190A (en) * | 1987-01-07 | 1990-11-29 | Scitex Corp Ltd | Device for stabilization of beam intensity distribution in laser scanners |
| JPH0810775B2 (ja) * | 1988-08-03 | 1996-01-31 | ファナック株式会社 | Ncレーザ装置 |
| JPH02101207U (enExample) * | 1989-01-30 | 1990-08-13 | ||
| US5235607A (en) * | 1990-12-27 | 1993-08-10 | Mitsui Petrochemical Industries, Ltd. | Solid-state laser device and machining apparatus |
| US5550853A (en) * | 1994-12-21 | 1996-08-27 | Laser Physics, Inc. | Integral laser head and power supply |
| US6282013B1 (en) | 1997-04-30 | 2001-08-28 | Lasermed, Inc. | System for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation |
| US6008264A (en) | 1997-04-30 | 1999-12-28 | Laser Med, Inc. | Method for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation |
| JP2001520913A (ja) | 1997-10-29 | 2001-11-06 | ビスコ インコーポレイテッド | 歯科用の複合材の光硬化システム |
| US6116900A (en) * | 1997-11-17 | 2000-09-12 | Lumachem, Inc. | Binary energizer and peroxide delivery system for dental bleaching |
| US6200134B1 (en) | 1998-01-20 | 2001-03-13 | Kerr Corporation | Apparatus and method for curing materials with radiation |
| US6157661A (en) * | 1999-05-12 | 2000-12-05 | Laserphysics, Inc. | System for producing a pulsed, varied and modulated laser output |
| US6421361B1 (en) * | 1999-06-22 | 2002-07-16 | Ceramoptec Industries, Inc. | Tunable diode laser system for photodynamic therapy |
| JP3302672B2 (ja) * | 2000-03-23 | 2002-07-15 | ファナック株式会社 | レーザ加工装置 |
| JP4060155B2 (ja) * | 2002-09-25 | 2008-03-12 | 富士通株式会社 | 光装置 |
| US20050271096A1 (en) * | 2004-04-12 | 2005-12-08 | Rolland Zeleny | Laser output temperature compensation |
| US9066777B2 (en) | 2009-04-02 | 2015-06-30 | Kerr Corporation | Curing light device |
| US9072572B2 (en) | 2009-04-02 | 2015-07-07 | Kerr Corporation | Dental light device |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4513780Y1 (enExample) * | 1967-08-09 | 1970-06-12 | ||
| DE1614585B2 (de) * | 1967-08-19 | 1971-09-23 | Optischer sender oder verstaerker | |
| US3588737A (en) * | 1968-04-22 | 1971-06-28 | Electro Nuclear Lab Inc | Thermally stabilized laser |
| CH532992A (de) * | 1971-02-25 | 1972-07-14 | Inst Angewandte Physik | Anlage zur automatischen Bearbeitung von Uhrsteinen mittels Laserstrahlen |
| US3781709A (en) * | 1972-08-02 | 1973-12-25 | Siemens Ag | Laser arrangement |
| US3783407A (en) * | 1972-09-26 | 1974-01-01 | Coherent Radiation Labor | Improved laser optical resonator |
| US3921098A (en) * | 1973-03-09 | 1975-11-18 | Avco Everett Res Lab Inc | Pressurized laser housing |
| US4316157A (en) * | 1979-08-13 | 1982-02-16 | Canadian Patents & Development Ltd. | Gas recirculation system for carbon dioxide lasers |
| US4328464A (en) * | 1980-02-07 | 1982-05-04 | Nasa | High power metallic halide laser |
| JPS5712576A (en) * | 1980-06-26 | 1982-01-22 | Nec Corp | Gas laser oscillator |
| DE3028421C2 (de) * | 1980-07-26 | 1984-08-16 | Messerschmitt-Bölkow-Blohm GmbH, 8000 München | CO↓2↓-Wellenleiterlaser |
| JPS57133690A (en) * | 1981-02-12 | 1982-08-18 | Nec Corp | Gas laser device |
| US4387462A (en) * | 1981-06-16 | 1983-06-07 | Joseph Markus | Single-frequency stabilized laser |
| JPS6021582A (ja) * | 1983-07-15 | 1985-02-02 | Fuji Photo Film Co Ltd | レ−ザ温調装置 |
-
1982
- 1982-09-03 JP JP57153539A patent/JPS5943584A/ja active Granted
-
1983
- 1983-08-31 US US06/528,250 patent/US4697269A/en not_active Expired - Lifetime
- 1983-09-02 FR FR8314093A patent/FR2532790B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US4697269A (en) | 1987-09-29 |
| JPS6343904B2 (enExample) | 1988-09-01 |
| JPS5943584A (ja) | 1984-03-10 |
| FR2532790A1 (fr) | 1984-03-09 |
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