FR2524713B1 - - Google Patents

Info

Publication number
FR2524713B1
FR2524713B1 FR8205781A FR8205781A FR2524713B1 FR 2524713 B1 FR2524713 B1 FR 2524713B1 FR 8205781 A FR8205781 A FR 8205781A FR 8205781 A FR8205781 A FR 8205781A FR 2524713 B1 FR2524713 B1 FR 2524713B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8205781A
Other languages
French (fr)
Other versions
FR2524713A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR8205781A priority Critical patent/FR2524713A1/fr
Priority to EP83400604A priority patent/EP0091342B1/fr
Priority to DE8383400604T priority patent/DE3362238D1/de
Priority to JP58056846A priority patent/JPS58182880A/ja
Publication of FR2524713A1 publication Critical patent/FR2524713A1/fr
Application granted granted Critical
Publication of FR2524713B1 publication Critical patent/FR2524713B1/fr
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/061Manufacture or treatment of FETs having Schottky gates
    • H10D30/0618Manufacture or treatment of FETs having Schottky gates of lateral Schottky gate FETs having multiple independently-addressable gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/80FETs having rectifying junction gate electrodes
    • H10D30/87FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
    • H10D30/873FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET] having multiple gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311Gate electrodes for field-effect devices
    • H10D64/411Gate electrodes for field-effect devices for FETs
FR8205781A 1982-04-02 1982-04-02 Transistor a effet de champ du type planar a grille supplementaire enterree et procede de realisation d'un tel transistor Granted FR2524713A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR8205781A FR2524713A1 (fr) 1982-04-02 1982-04-02 Transistor a effet de champ du type planar a grille supplementaire enterree et procede de realisation d'un tel transistor
EP83400604A EP0091342B1 (fr) 1982-04-02 1983-03-23 Procédé de réalisation d'un transistor à effet de champ du type planar à grille supplémentaire enterrée
DE8383400604T DE3362238D1 (en) 1982-04-02 1983-03-23 Process for manufacturing a planar field-effect transistor having a supplementary buried gate
JP58056846A JPS58182880A (ja) 1982-04-02 1983-04-02 電界効果トランジスタおよびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8205781A FR2524713A1 (fr) 1982-04-02 1982-04-02 Transistor a effet de champ du type planar a grille supplementaire enterree et procede de realisation d'un tel transistor

Publications (2)

Publication Number Publication Date
FR2524713A1 FR2524713A1 (fr) 1983-10-07
FR2524713B1 true FR2524713B1 (en:Method) 1984-05-04

Family

ID=9272704

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8205781A Granted FR2524713A1 (fr) 1982-04-02 1982-04-02 Transistor a effet de champ du type planar a grille supplementaire enterree et procede de realisation d'un tel transistor

Country Status (4)

Country Link
EP (1) EP0091342B1 (en:Method)
JP (1) JPS58182880A (en:Method)
DE (1) DE3362238D1 (en:Method)
FR (1) FR2524713A1 (en:Method)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2677808B2 (ja) * 1987-12-12 1997-11-17 工業技術院長 電界効果型トランジスタ
JP2010056521A (ja) * 2008-07-30 2010-03-11 Sharp Corp 半導体装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1543363A (en) * 1975-02-26 1979-04-04 Nippon Electric Co Dual-gate schottky barrier gate field effect transistors
GB1601059A (en) * 1978-05-31 1981-10-21 Secr Defence Fet devices and their fabrication
US4249190A (en) * 1979-07-05 1981-02-03 Bell Telephone Laboratories, Incorporated Floating gate vertical FET

Also Published As

Publication number Publication date
DE3362238D1 (en) 1986-04-03
FR2524713A1 (fr) 1983-10-07
JPS58182880A (ja) 1983-10-25
EP0091342B1 (fr) 1986-02-26
EP0091342A1 (fr) 1983-10-12

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Legal Events

Date Code Title Description
ST Notification of lapse