FR2518807A1 - Procede de realisation d'une diode en silicium amorphe, equipement pour la mise en oeuvre d'un tel procede et application a un dispositif d'affichage a cristal liquide - Google Patents
Procede de realisation d'une diode en silicium amorphe, equipement pour la mise en oeuvre d'un tel procede et application a un dispositif d'affichage a cristal liquide Download PDFInfo
- Publication number
- FR2518807A1 FR2518807A1 FR8124166A FR8124166A FR2518807A1 FR 2518807 A1 FR2518807 A1 FR 2518807A1 FR 8124166 A FR8124166 A FR 8124166A FR 8124166 A FR8124166 A FR 8124166A FR 2518807 A1 FR2518807 A1 FR 2518807A1
- Authority
- FR
- France
- Prior art keywords
- deposition
- mixture
- decomposition
- silane
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/132—Thermal activation of liquid crystals exhibiting a thermo-optic effect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/40—Crystalline structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/50—PIN diodes
-
- H10P14/24—
-
- H10P14/2905—
-
- H10P14/3411—
-
- H10P14/3442—
-
- H10P14/3444—
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8124166A FR2518807A1 (fr) | 1981-12-23 | 1981-12-23 | Procede de realisation d'une diode en silicium amorphe, equipement pour la mise en oeuvre d'un tel procede et application a un dispositif d'affichage a cristal liquide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8124166A FR2518807A1 (fr) | 1981-12-23 | 1981-12-23 | Procede de realisation d'une diode en silicium amorphe, equipement pour la mise en oeuvre d'un tel procede et application a un dispositif d'affichage a cristal liquide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2518807A1 true FR2518807A1 (fr) | 1983-06-24 |
| FR2518807B1 FR2518807B1 (OSRAM) | 1984-04-06 |
Family
ID=9265364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8124166A Granted FR2518807A1 (fr) | 1981-12-23 | 1981-12-23 | Procede de realisation d'une diode en silicium amorphe, equipement pour la mise en oeuvre d'un tel procede et application a un dispositif d'affichage a cristal liquide |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2518807A1 (OSRAM) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2556882A1 (fr) * | 1983-12-14 | 1985-06-21 | Fairchild Camera Instr Co | Composant semiconducteur rapide, notamment diode pin haute tension |
| US4868616A (en) * | 1986-12-11 | 1989-09-19 | Energy Conversion Devices, Inc. | Amorphous electronic matrix array for liquid crystal display |
| US5061040A (en) * | 1984-01-23 | 1991-10-29 | Ois Optical Imaging Systems, Inc. | Liquid crystal displays operated by amorphous silicon alloy diodes |
-
1981
- 1981-12-23 FR FR8124166A patent/FR2518807A1/fr active Granted
Non-Patent Citations (2)
| Title |
|---|
| EXBK/78 * |
| EXBK/81 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2556882A1 (fr) * | 1983-12-14 | 1985-06-21 | Fairchild Camera Instr Co | Composant semiconducteur rapide, notamment diode pin haute tension |
| EP0148065A3 (fr) * | 1983-12-14 | 1985-11-21 | FAIRCHILD CAMERA & INSTRUMENT CORPORATION | Composant semiconducteur rapide, notamment diode pin haute tension |
| US5061040A (en) * | 1984-01-23 | 1991-10-29 | Ois Optical Imaging Systems, Inc. | Liquid crystal displays operated by amorphous silicon alloy diodes |
| US4868616A (en) * | 1986-12-11 | 1989-09-19 | Energy Conversion Devices, Inc. | Amorphous electronic matrix array for liquid crystal display |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2518807B1 (OSRAM) | 1984-04-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5133986A (en) | Plasma enhanced chemical vapor processing system using hollow cathode effect | |
| US5667597A (en) | Polycrystalline silicon semiconductor having an amorphous silicon buffer layer | |
| EP0263788B1 (fr) | Procédé et installation de dépôt de silicium amorphe hydrogène sur un substrat dans une enceinte à plasma | |
| FR2872826A1 (fr) | Croissance a basse temperature de nanotubes de carbone orientes | |
| FR2780601A1 (fr) | Procede de depot par plasma a la resonance cyclotron electronique de couches de carbone emetteur d'electrons sous l'effet d'un champ electrique applique | |
| FR2542500A1 (fr) | Procede de fabrication d'un dispositif semiconducteur du type comprenant au moins une couche de silicium deposee sur un substrat isolant | |
| FR2589168A1 (fr) | Appareil et son procede d'utilisation pour la formation de films minces assistee par plasma | |
| FR2518788A1 (fr) | Dispositif a resistance dependant de la tension, son procede de fabrication et sa mise en oeuvre dans un ecran de visualisation a commande electrique | |
| FR2518807A1 (fr) | Procede de realisation d'une diode en silicium amorphe, equipement pour la mise en oeuvre d'un tel procede et application a un dispositif d'affichage a cristal liquide | |
| Kruzelecky et al. | The preparation of amorphous Si: H thin films for optoelectronic applications by glow discharge dissociation of SiH4 using a direct‐current saddle‐field plasma chamber | |
| EP0149408A2 (fr) | Procédé et dispositif pour le dépôt, sur un support, d'une couche mince d'un matériau à partir d'un plasma réactif | |
| Pinarbasi et al. | Hydrogenated amorphous silicon films deposited by DC planar magnetron reactive sputtering | |
| FR2471671A1 (fr) | Dispositif photovoltaique au silicium amorphe produisant une tension elevee en circuit ouvert | |
| JP2608456B2 (ja) | 薄膜形成装置 | |
| Yahya | Density of gap states in hydrogenated amorphous silicon | |
| JPH01275761A (ja) | 堆積膜形成装置 | |
| JPH0273979A (ja) | 薄膜形成法 | |
| FR2811686A1 (fr) | Procede de fabrication de couches de carbone aptes a emettre des electrons, par depot chimique en phase vapeur | |
| EP0045676B1 (fr) | Procédé de réalisation d'une couche en silicium amorphe, et dispositif électronique mettant en oeuvre ce procédé | |
| Bhatnagar et al. | Direct UV photoenhanced chemical vapour deposition of a-Si: H from disilane using a deuterium lamp | |
| JPH0645882B2 (ja) | 堆積膜形成法 | |
| JPH0562917A (ja) | アモルフアスシリコン薄膜の製造法 | |
| Akwani | Structural and photoelectron emission properties of chemical vapor deposition-grown diamond films | |
| JPS6188514A (ja) | 堆積膜形成法 | |
| JPS6210275A (ja) | 堆積膜形成法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |