FR2477769A1 - Dispositif pour microscope electronique permettant un traitement in situ d'echantillons - Google Patents
Dispositif pour microscope electronique permettant un traitement in situ d'echantillons Download PDFInfo
- Publication number
- FR2477769A1 FR2477769A1 FR8005037A FR8005037A FR2477769A1 FR 2477769 A1 FR2477769 A1 FR 2477769A1 FR 8005037 A FR8005037 A FR 8005037A FR 8005037 A FR8005037 A FR 8005037A FR 2477769 A1 FR2477769 A1 FR 2477769A1
- Authority
- FR
- France
- Prior art keywords
- sample
- treatment
- electron microscope
- microscope
- sample carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8005037A FR2477769A1 (fr) | 1980-03-06 | 1980-03-06 | Dispositif pour microscope electronique permettant un traitement in situ d'echantillons |
| JP2893581U JPS579159U (enExample) | 1980-03-06 | 1981-03-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8005037A FR2477769A1 (fr) | 1980-03-06 | 1980-03-06 | Dispositif pour microscope electronique permettant un traitement in situ d'echantillons |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2477769A1 true FR2477769A1 (fr) | 1981-09-11 |
| FR2477769B1 FR2477769B1 (enExample) | 1982-09-24 |
Family
ID=9239385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8005037A Granted FR2477769A1 (fr) | 1980-03-06 | 1980-03-06 | Dispositif pour microscope electronique permettant un traitement in situ d'echantillons |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS579159U (enExample) |
| FR (1) | FR2477769A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0369913A1 (fr) * | 1988-11-18 | 1990-05-23 | CHAIXMECA, Sàrl | Dispositif pour le transfert et des réactions in-situ sous atmosphère contrôlée d'échantillons destinés à l'examen en microscopie électronique en transmission |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3858049A (en) * | 1973-09-17 | 1974-12-31 | Etec Corp | Method and apparatus for sem specimen coating and transfer |
| DE2511449A1 (de) * | 1975-03-15 | 1976-09-16 | Leybold Heraeus Gmbh & Co Kg | Probenschleuse |
-
1980
- 1980-03-06 FR FR8005037A patent/FR2477769A1/fr active Granted
-
1981
- 1981-03-02 JP JP2893581U patent/JPS579159U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3858049A (en) * | 1973-09-17 | 1974-12-31 | Etec Corp | Method and apparatus for sem specimen coating and transfer |
| DE2511449A1 (de) * | 1975-03-15 | 1976-09-16 | Leybold Heraeus Gmbh & Co Kg | Probenschleuse |
Non-Patent Citations (1)
| Title |
|---|
| EXRV/76 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0369913A1 (fr) * | 1988-11-18 | 1990-05-23 | CHAIXMECA, Sàrl | Dispositif pour le transfert et des réactions in-situ sous atmosphère contrôlée d'échantillons destinés à l'examen en microscopie électronique en transmission |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2477769B1 (enExample) | 1982-09-24 |
| JPS579159U (enExample) | 1982-01-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6875326B2 (en) | Plasma processing apparatus with real-time particle filter | |
| US5442193A (en) | Microelectronic field emission device with breakdown inhibiting insulated gate electrode | |
| CA1107234A (en) | Method and apparatus for rejuvenating ion sources | |
| FR2515872A1 (fr) | Tube a rayons cathodiques et dispositif semiconducteur convenant a un tel tube a rayons cathodiques | |
| CN105828954A (zh) | 用于电气接地的电喷雾的大气接口 | |
| FR2477769A1 (fr) | Dispositif pour microscope electronique permettant un traitement in situ d'echantillons | |
| EP2984203B1 (fr) | Machine d'implantation ionique presentant une productivite accrue | |
| JPH0317904B2 (enExample) | ||
| EP0389051B1 (fr) | Tube photomultiplicateur rapide à grande homogénéité de collection | |
| CN105097413B (zh) | 新型离子源及离子化方法 | |
| EP1052672A1 (fr) | Source ionique pour spectromètre de masse à temps de vol analysant des echantillons gazeux | |
| EP0241362B1 (fr) | Dispositif et notamment duoplasmatron utilisable pour ioniser un gaz et procédé d'utilisation de ce dispositif | |
| FR2681186A1 (fr) | Source d'ions a resonance cyclotronique electronique et a injection coaxiale d'ondes electromagnetiques. | |
| EP3797289A1 (de) | Analyseeinrichtung und verfahren zur analyse von substanzen durch ionenmobilitätsspektrometrie | |
| JP2020013784A (ja) | 流れ及び1投与量の変動を減少させる方法によるアスペクト比が大きい物体への異なるコーティング | |
| CN204991648U (zh) | 离子源 | |
| EP0002406B1 (fr) | Source d'ions notamment pour implanteur ionique | |
| CH295227A (fr) | Dispositif amplificateur électrique comprenant un corps de matériau semi-conducteur. | |
| Kessi et al. | Etching of Si (111) by SF6 plasma in a triode RF (13.56 MHz) multipolar reactor | |
| JPH0542609Y2 (enExample) | ||
| JP2925395B2 (ja) | 電気泳動−質量分析装置 | |
| JPH09279339A (ja) | スパッタ装置 | |
| JP3805004B2 (ja) | スパッタリング装置 | |
| FR2448213A1 (fr) | Conducteur electrique et procede de fabrication d'un tel conducteur | |
| JPH0915125A (ja) | 表面分析装置用プラズマエッチング装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |