FR2377654B1 - - Google Patents

Info

Publication number
FR2377654B1
FR2377654B1 FR7801186A FR7801186A FR2377654B1 FR 2377654 B1 FR2377654 B1 FR 2377654B1 FR 7801186 A FR7801186 A FR 7801186A FR 7801186 A FR7801186 A FR 7801186A FR 2377654 B1 FR2377654 B1 FR 2377654B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7801186A
Other languages
French (fr)
Other versions
FR2377654A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP433577A external-priority patent/JPS5391803A/ja
Priority claimed from JP3395677A external-priority patent/JPS53120905A/ja
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Publication of FR2377654A1 publication Critical patent/FR2377654A1/fr
Application granted granted Critical
Publication of FR2377654B1 publication Critical patent/FR2377654B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/34Imagewise removal by selective transfer, e.g. peeling away
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
FR7801186A 1977-01-18 1978-01-17 Procede de fabrication d'une plaque pour l'impression a plat Granted FR2377654A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP433577A JPS5391803A (en) 1977-01-18 1977-01-18 Method of producing lithographic printing plate
JP3395677A JPS53120905A (en) 1977-03-29 1977-03-29 Method of producing lithographic printing plate

Publications (2)

Publication Number Publication Date
FR2377654A1 FR2377654A1 (fr) 1978-08-11
FR2377654B1 true FR2377654B1 (pt) 1982-04-23

Family

ID=26338083

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7801186A Granted FR2377654A1 (fr) 1977-01-18 1978-01-17 Procede de fabrication d'une plaque pour l'impression a plat

Country Status (3)

Country Link
DE (1) DE2802085A1 (pt)
FR (1) FR2377654A1 (pt)
GB (1) GB1588063A (pt)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134854A (en) * 1979-04-05 1980-10-21 Dainippon Printing Co Ltd Manufacture of lithographic printing plate
EP0487797A1 (en) * 1990-11-28 1992-06-03 Toyo Ink Manufacturing Co., Ltd. Image forming method
US5565303A (en) * 1990-12-19 1996-10-15 Shaw; Sonya Y. Photosensitive printing plate developed by a peel-apart process
US5417164A (en) * 1991-07-24 1995-05-23 Nippon Shokubai Co., Ltd. Thermosensitive recording material and thermosensitive recording method
US7795462B2 (en) * 2005-01-13 2010-09-14 Xerox Corporation Crosslinked siloxane outmost layer having aromatic silicon-containing compounds for photoreceptors

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2153860C2 (de) * 1970-10-29 1982-06-09 Dai Nippon Printing Co., Ltd. Verwendung von photopolymerisierbaren Gemischen zur Herstellung ätzmittelbeständiger Masken
DE2207495A1 (de) * 1971-02-20 1972-08-24 Dainippon Printing Co Ltd Flachdruckplatten und Verfahren zu ihrer Herstellung
JPS51120804A (en) * 1975-04-14 1976-10-22 Dainippon Printing Co Ltd Plate for lithographic printing
JPS51134204A (en) * 1975-05-14 1976-11-20 Nippon Kakoh Seishi Kk Method of making lithographic press plate

Also Published As

Publication number Publication date
GB1588063A (en) 1981-04-15
DE2802085A1 (de) 1978-07-20
FR2377654A1 (fr) 1978-08-11

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Legal Events

Date Code Title Description
ST Notification of lapse