FR2370302A2 - PHOTOSENSITIVE COMPOSITIONS BASED ON POLYMERISABLE UNSATURATED COMPOUNDS - Google Patents

PHOTOSENSITIVE COMPOSITIONS BASED ON POLYMERISABLE UNSATURATED COMPOUNDS

Info

Publication number
FR2370302A2
FR2370302A2 FR7730996A FR7730996A FR2370302A2 FR 2370302 A2 FR2370302 A2 FR 2370302A2 FR 7730996 A FR7730996 A FR 7730996A FR 7730996 A FR7730996 A FR 7730996A FR 2370302 A2 FR2370302 A2 FR 2370302A2
Authority
FR
France
Prior art keywords
carbon atoms
unsaturated compounds
double bonds
compositions based
photosensitive compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7730996A
Other languages
French (fr)
Other versions
FR2370302B2 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hercules LLC
Original Assignee
Hercules LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hercules LLC filed Critical Hercules LLC
Publication of FR2370302A2 publication Critical patent/FR2370302A2/en
Application granted granted Critical
Publication of FR2370302B2 publication Critical patent/FR2370302B2/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

Composition photosensible utilisable dans la formation d'images photographiques. La composition contient 1 un composant monomère et/ou polymère à insaturation éthylénique capable de former par polymérisation par addition ou par réticulation un polymère à haut poids moléculaire, 2 un composant photo-oxydable contenant une insaturation oléfinique du type dans lequel chacun des atomes de carbone des doubles liaisons ne porte pas plus d'un atome d'hydrogène et l'un au moins des atomes de carbone voisins des atomes de carbone des doubles liaisons porte au moins un hydrogène allylique qui n'est pas sur un atome de carbone et 3 un sensibilisant à la photo-oxygénation. La composition selon l'invention exposee à la lumière actinique polymérise permettant en particulier la préparation de plaques d'impression.Photosensitive composition for use in forming photographic images. The composition contains 1 an ethylenically unsaturated monomer and / or polymer component capable of forming by addition polymerization or crosslinking a high molecular weight polymer, 2 a photooxidizable component containing an olefinic unsaturation of the type in which each of the carbon atoms of double bonds does not carry more than one hydrogen atom and at least one of the neighboring carbon atoms of the carbon atoms of double bonds carries at least one allylic hydrogen which is not on a carbon atom and 3 a sensitizer to photo-oxygenation. The composition according to the invention is exposed to actinic light which polymerizes, in particular allowing the preparation of printing plates.

FR7730996A 1976-11-08 1977-10-14 PHOTOSENSITIVE COMPOSITIONS BASED ON POLYMERISABLE UNSATURATED COMPOUNDS Granted FR2370302A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73992876A 1976-11-08 1976-11-08
US75874677A 1977-01-12 1977-01-12

Publications (2)

Publication Number Publication Date
FR2370302A2 true FR2370302A2 (en) 1978-06-02
FR2370302B2 FR2370302B2 (en) 1983-01-28

Family

ID=27113598

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7730996A Granted FR2370302A2 (en) 1976-11-08 1977-10-14 PHOTOSENSITIVE COMPOSITIONS BASED ON POLYMERISABLE UNSATURATED COMPOUNDS

Country Status (3)

Country Link
CA (1) CA1110899A (en)
FR (1) FR2370302A2 (en)
GB (1) GB1560304A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0200463A2 (en) * 1985-04-24 1986-11-05 E.I. Du Pont De Nemours And Company Coating compositions for use in the production of light-sensitive reproduction materials

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4563413A (en) * 1984-04-23 1986-01-07 Hercules Incorporated Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides
US4666824A (en) * 1984-04-23 1987-05-19 Hercules Incorporated Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2010867A1 (en) * 1969-03-07 1970-09-24 Kansai Paint Company Ltd., Amagasaki, Hyogo, (Japan) Process for the production of a coating from polymerized plastic
FR2206525A1 (en) * 1972-11-09 1974-06-07 Hercules Inc

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2010867A1 (en) * 1969-03-07 1970-09-24 Kansai Paint Company Ltd., Amagasaki, Hyogo, (Japan) Process for the production of a coating from polymerized plastic
FR2206525A1 (en) * 1972-11-09 1974-06-07 Hercules Inc

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0200463A2 (en) * 1985-04-24 1986-11-05 E.I. Du Pont De Nemours And Company Coating compositions for use in the production of light-sensitive reproduction materials
EP0200463A3 (en) * 1985-04-24 1987-11-04 E.I. Du Pont De Nemours And Company Coating compositions for use in the production of light-sensitive reproduction materials

Also Published As

Publication number Publication date
GB1560304A (en) 1980-02-06
CA1110899A (en) 1981-10-20
FR2370302B2 (en) 1983-01-28

Similar Documents

Publication Publication Date Title
AU747516C (en) Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
AU748214B2 (en) Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
DE69733469T2 (en) PHOTORESIS COMPOSITIONS WITH POLYCLY POLYMERS WITH SAVERELABILEN GROUPS AT THE END
US4250063A (en) Method for chain-opening polymerization of norbornene derivatives
US3857885A (en) Photopolymerizable compounds
FR2369290A1 (en) ADSORBANT FOR PROTEIN
GB1507956A (en) Photosensitive resin composition for producing flexographic printing plates
GB1464942A (en) Polymers process for their preparation and their use in photo polymerizable compositions and elements for relief images
FR2370302A2 (en) PHOTOSENSITIVE COMPOSITIONS BASED ON POLYMERISABLE UNSATURATED COMPOUNDS
FR2370712A1 (en)
KR890003821A (en) Hydrogenated cycloopened polymer of cycloolefin
KR910012800A (en) Dye-benzyltriaryl borate photoinitiators
ES412138A1 (en) Dispersing agents
US3948667A (en) Photosensitive compositions
US4167415A (en) Photocurable composition comprising copolymer of maleic acid monoester and α-olefin compound
FI833082A0 (en) HOMOGEN ELASTOMERISK PHOTOSENSITIVE COMPOSITION LAEMPLIG FOER TRYCKNING
DE3577192D1 (en) LIGHT-SENSITIVE FLAT PRINT PLATE.
KR860009077A (en) Instant Curable Composition
GB1181958A (en) A process for the production of Polymers of Cyclopentene
FR2401444A1 (en) CURING POLYMER COMPOSITION OF THE POLYTHIOL TYPE AND ITS APPLICATION TO PRINTING PLATES
GB1361272A (en) Photosensitive polymeric materials and photoresist compositions
GB1484061A (en) Radiation sensitive composition
FR2362184A1 (en) RUBBER MIXTURES OF A MONOOLEFINS COPOLYMER WITH A HIGHLY UNSATURE RUBBER
FR2371515A1 (en) NICKEL BASED ALLOY
FR2415540A1 (en) DEVELOPING COMPOSITION FOR PRESSURE SENSITIVE SHEET TO TRANSCRIBE MATERIAL