FR2362215A1 - Procede et dispositif de nickelage - Google Patents
Procede et dispositif de nickelageInfo
- Publication number
- FR2362215A1 FR2362215A1 FR7725592A FR7725592A FR2362215A1 FR 2362215 A1 FR2362215 A1 FR 2362215A1 FR 7725592 A FR7725592 A FR 7725592A FR 7725592 A FR7725592 A FR 7725592A FR 2362215 A1 FR2362215 A1 FR 2362215A1
- Authority
- FR
- France
- Prior art keywords
- nickel plating
- degrees
- gas
- finished
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B04—CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
- B04B—CENTRIFUGES
- B04B5/00—Other centrifuges
- B04B5/08—Centrifuges for separating predominantly gaseous mixtures
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45578—Elongated nozzles, tubes with holes
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Nozzles (AREA)
- Centrifugal Separators (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
a. Procédé et dispositif pour le nickelage de pièces terminées. b. Procédé de nickelage d'une pièce terminée, consistant essentiellement à chauffer la pièce à une température comprise entre 150 degrés et 200 degrés C, et en même temps à faire agir sur la pièce un courant de gaz s'écoulant en continu, et se composant de tétracarbonyl de nickel et d'un gaz vecteur. L'invention vise également un dispositif particulier pour la mise en oeuvre de ce procédé. c. L'invention trouve son application principale dans le nickelage de pièces terminées et notamment le nickelage de tambours d'accélération de centrifugeuses à gaz.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2637836A DE2637836C2 (de) | 1976-08-21 | 1976-08-21 | Vorrichtung zum Vernickeln von Bauteilen |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2362215A1 true FR2362215A1 (fr) | 1978-03-17 |
FR2362215B3 FR2362215B3 (fr) | 1980-05-16 |
Family
ID=5986093
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7725592A Granted FR2362215A1 (fr) | 1976-08-21 | 1977-08-22 | Procede et dispositif de nickelage |
Country Status (6)
Country | Link |
---|---|
US (1) | US4183320A (fr) |
JP (1) | JPS5953350B2 (fr) |
DE (1) | DE2637836C2 (fr) |
FR (1) | FR2362215A1 (fr) |
GB (1) | GB1540339A (fr) |
NL (1) | NL7709141A (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5925335U (ja) * | 1982-07-31 | 1984-02-16 | ジエコ−株式会社 | インテリア時計、アクセサリ−等に於ける線材の結合構造 |
DE3804805A1 (de) * | 1988-02-16 | 1989-08-24 | Max Planck Gesellschaft | Cvd-verfahren zum niederschlagen einer schicht auf einer duennschicht-metallstruktur |
US9512519B2 (en) * | 2012-12-03 | 2016-12-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Atomic layer deposition apparatus and method |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE57637C (de) * | L. MOND in Northwich, England | Verfahren zum Vernickeln und zur Herstellung von Gegenständen und Abdrücken aus Nickel | ||
US2792806A (en) * | 1951-10-08 | 1957-05-21 | Ohio Commw Eng Co | Apparatus for plating the interior of hollow objects |
US2700365A (en) * | 1951-10-08 | 1955-01-25 | Ohio Commw Eng Co | Apparatus for plating surfaces with carbonyls and other volatile metal bearing compounds |
US2781280A (en) * | 1953-03-11 | 1957-02-12 | Ransburg Electro Coating Corp | Method and apparatus for spray coating of articles |
US3050417A (en) * | 1954-03-18 | 1962-08-21 | Union Carbide Corp | Chromium nickel alloy gas plating |
US3196826A (en) * | 1958-07-23 | 1965-07-27 | Edward O Norris | Apparatus for spraying the interiors of drum shells |
NL6509968A (fr) * | 1965-07-31 | 1967-02-01 | ||
US3865647A (en) * | 1970-09-30 | 1975-02-11 | Siemens Ag | Method for precipitation of semiconductor material |
JPS4712925U (fr) * | 1971-03-12 | 1972-10-16 | ||
DE2117933A1 (de) * | 1971-04-14 | 1972-10-19 | Siemens Ag | Verfahren zum Herstellen von Hohlkörpern aus Halbleitermaterial von beliebiger Länge |
JPS5229630Y2 (fr) * | 1971-05-24 | 1977-07-06 | ||
US4030964A (en) * | 1976-04-29 | 1977-06-21 | The United States Of America As Represented By The United States Energy Research And Development Administration | Temperature cycling vapor deposition HgI2 crystal growth |
-
1976
- 1976-08-21 DE DE2637836A patent/DE2637836C2/de not_active Expired
-
1977
- 1977-08-12 GB GB33904/77A patent/GB1540339A/en not_active Expired
- 1977-08-17 US US05/825,472 patent/US4183320A/en not_active Expired - Lifetime
- 1977-08-18 JP JP52099397A patent/JPS5953350B2/ja not_active Expired
- 1977-08-18 NL NL7709141A patent/NL7709141A/xx not_active Application Discontinuation
- 1977-08-22 FR FR7725592A patent/FR2362215A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5953350B2 (ja) | 1984-12-24 |
FR2362215B3 (fr) | 1980-05-16 |
JPS5326238A (en) | 1978-03-10 |
NL7709141A (nl) | 1978-02-23 |
DE2637836C2 (de) | 1983-12-08 |
US4183320A (en) | 1980-01-15 |
GB1540339A (en) | 1979-02-07 |
DE2637836A1 (de) | 1978-02-23 |
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