FR2358747A1 - Dispositif pour la detection des marques de cadrage d'une cible - Google Patents

Dispositif pour la detection des marques de cadrage d'une cible

Info

Publication number
FR2358747A1
FR2358747A1 FR7717619A FR7717619A FR2358747A1 FR 2358747 A1 FR2358747 A1 FR 2358747A1 FR 7717619 A FR7717619 A FR 7717619A FR 7717619 A FR7717619 A FR 7717619A FR 2358747 A1 FR2358747 A1 FR 2358747A1
Authority
FR
France
Prior art keywords
target
detection
framing
signal
marks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7717619A
Other languages
English (en)
Other versions
FR2358747B1 (fr
Inventor
Donald E Davis
Millard A Habegger
Hannon S Yourke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2358747A1 publication Critical patent/FR2358747A1/fr
Application granted granted Critical
Publication of FR2358747B1 publication Critical patent/FR2358747B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Dispositif pour la détection de marques de cadrage sur une cible bombardée par un faisceau de particules chargées. Un signal produit par un détecteur à diode recevant les particules réfléchies par la cible présentera une crête lorsque le faisceau passe sur chacun des bords de la marque de cadrage. Le signal est différencié et le signal résultant est filtré et amplifié pour fournir une information sur la position du faisceau par rapport à la cible. Si plusieurs détecteurs sont utilisés, les signaux sont ajoutés juste avant ou juste après la différenciation. Permet de diminuer les erreurs de cadrage et peut être utilisé dans le bombardement par électrons de pastilles semi-conductrices.
FR7717619A 1976-07-12 1977-06-02 Dispositif pour la detection des marques de cadrage d'une cible Granted FR2358747A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70460576A 1976-07-12 1976-07-12
US05/731,270 US4056730A (en) 1976-07-12 1976-10-12 Apparatus for detecting registration marks on a target such as a semiconductor wafer

Publications (2)

Publication Number Publication Date
FR2358747A1 true FR2358747A1 (fr) 1978-02-10
FR2358747B1 FR2358747B1 (fr) 1980-02-08

Family

ID=27107350

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7717619A Granted FR2358747A1 (fr) 1976-07-12 1977-06-02 Dispositif pour la detection des marques de cadrage d'une cible

Country Status (6)

Country Link
US (1) US4056730A (fr)
CA (1) CA1085065A (fr)
DE (1) DE2731142C3 (fr)
FR (1) FR2358747A1 (fr)
GB (1) GB1579280A (fr)
IT (1) IT1115358B (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4149085A (en) * 1978-01-16 1979-04-10 International Business Machines Corporation Automatic overlay measurements using an electronic beam system as a measurement tool
DE3172441D1 (en) * 1980-10-15 1985-10-31 Toshiba Kk Electron beam exposure system
EP0080526B1 (fr) * 1981-11-30 1985-11-06 International Business Machines Corporation Méthode et appareillage pour améliorer l'uniformité de motifs générés par lithographie par faisceau d'électrons
US4713784A (en) * 1983-07-04 1987-12-15 Canon Kabushiki Kaisha Alignment apparatus
US4803644A (en) * 1985-09-20 1989-02-07 Hughes Aircraft Company Alignment mark detector for electron beam lithography
US5169488A (en) * 1990-10-25 1992-12-08 International Business Machines Corporation Method of forming planarized, reusable calibration grids
US5043586A (en) * 1990-10-25 1991-08-27 International Business Machines Corporation Planarized, reusable calibration grids
US20020145118A1 (en) * 2001-04-10 2002-10-10 Applied Materials, Inc. Detection of backscattered electrons from a substrate
US10236161B2 (en) 2015-04-21 2019-03-19 Intel Corporation Fine alignment system for electron beam exposure system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3875415A (en) * 1974-01-28 1975-04-01 Ibm Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer
FR2337420A1 (fr) * 1975-12-31 1977-07-29 Fujitsu Ltd Appareil lithographique a faisceau electronique

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3866013A (en) * 1973-09-19 1975-02-11 Ibm Method and apparatus for controlling movable means such as an electron beam
US3901814A (en) * 1974-06-27 1975-08-26 Ibm Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3875415A (en) * 1974-01-28 1975-04-01 Ibm Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer
FR2337420A1 (fr) * 1975-12-31 1977-07-29 Fujitsu Ltd Appareil lithographique a faisceau electronique

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
EXTBK/76 *

Also Published As

Publication number Publication date
CA1085065A (fr) 1980-09-02
FR2358747B1 (fr) 1980-02-08
DE2731142C3 (de) 1982-02-04
IT1115358B (it) 1986-02-03
GB1579280A (en) 1980-11-19
DE2731142B2 (de) 1981-05-14
DE2731142A1 (de) 1978-01-19
US4056730A (en) 1977-11-01

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Legal Events

Date Code Title Description
ST Notification of lapse