FR2358021A1 - Procede de depot epitaxique d'un semi-conducteur par polarisation electrique d'une phase liquide - Google Patents
Procede de depot epitaxique d'un semi-conducteur par polarisation electrique d'une phase liquideInfo
- Publication number
- FR2358021A1 FR2358021A1 FR7621107A FR7621107A FR2358021A1 FR 2358021 A1 FR2358021 A1 FR 2358021A1 FR 7621107 A FR7621107 A FR 7621107A FR 7621107 A FR7621107 A FR 7621107A FR 2358021 A1 FR2358021 A1 FR 2358021A1
- Authority
- FR
- France
- Prior art keywords
- semiconductor
- liquid phase
- epitaxic
- deposit process
- electric polarization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000010287 polarization Effects 0.000 title abstract 3
- 239000007791 liquid phase Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 230000005679 Peltier effect Effects 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/08—Heating of the reaction chamber or the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/10—Controlling or regulating
- C30B19/103—Current controlled or induced growth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02387—Group 13/15 materials
- H01L21/02395—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02625—Liquid deposition using melted materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Procédé de dépôt épitaxique d'un semi-conducteur, par polarisation électrique d'une phase liquide à température constante. En dehors du temps de croissance, la polarisation est appliquée dans le sens du refroidissement par effet Peltier, avec une densité de courant inférieure au seuil provoquant la croissance et proche de ce dernier. Application aux interfaces d'hétérostructures III-V.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7621107A FR2358021A1 (fr) | 1976-07-09 | 1976-07-09 | Procede de depot epitaxique d'un semi-conducteur par polarisation electrique d'une phase liquide |
DE2728771A DE2728771C2 (de) | 1976-07-09 | 1977-06-25 | Verfahren zur epitaktischen Ablagerung einer Schicht aus Verbindungshalbleitermaterial |
US05/812,262 US4133705A (en) | 1976-07-09 | 1977-07-01 | Method for the epitaxial deposition of a semiconductor material by electrical polarization of a liquid phase at constant temperature |
GB28294/77A GB1581457A (en) | 1976-07-09 | 1977-07-06 | Method of epitaxially depositing a semiconductor material |
JP8004577A JPS538563A (en) | 1976-07-09 | 1977-07-06 | Method of piling up epitaxial semiconductor material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7621107A FR2358021A1 (fr) | 1976-07-09 | 1976-07-09 | Procede de depot epitaxique d'un semi-conducteur par polarisation electrique d'une phase liquide |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2358021A1 true FR2358021A1 (fr) | 1978-02-03 |
FR2358021B1 FR2358021B1 (fr) | 1978-12-22 |
Family
ID=9175520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7621107A Granted FR2358021A1 (fr) | 1976-07-09 | 1976-07-09 | Procede de depot epitaxique d'un semi-conducteur par polarisation electrique d'une phase liquide |
Country Status (5)
Country | Link |
---|---|
US (1) | US4133705A (fr) |
JP (1) | JPS538563A (fr) |
DE (1) | DE2728771C2 (fr) |
FR (1) | FR2358021A1 (fr) |
GB (1) | GB1581457A (fr) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4381598A (en) * | 1981-06-11 | 1983-05-03 | General Electric Company | Method of making anode and cathode connections for electromigration |
US4549912A (en) * | 1981-06-11 | 1985-10-29 | General Electric Company | Anode and cathode connections for the practice of electromigration |
DE3479523D1 (en) * | 1983-09-19 | 1989-09-28 | Fujitsu Ltd | Method for growing multicomponent compound semiconductor crystals |
US6090651A (en) * | 1999-11-05 | 2000-07-18 | Lsi Logic Corporation | Depletion free polysilicon gate electrodes |
US11140838B2 (en) | 2017-08-10 | 2021-10-12 | Valmont Industries, Inc. | System and method for variable rate, high speed irrigation control |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2842467A (en) * | 1954-04-28 | 1958-07-08 | Ibm | Method of growing semi-conductors |
US2999776A (en) * | 1955-01-13 | 1961-09-12 | Siemens Ag | Method of producing differentiated doping zones in semiconductor crystals |
BE562932A (fr) * | 1957-01-23 | |||
NL301226A (fr) * | 1962-12-03 | |||
GB1034503A (en) * | 1963-05-14 | 1966-06-29 | Nat Res Dev | Improvements in or relating to the production of crystalline material |
US3411946A (en) * | 1963-09-05 | 1968-11-19 | Raytheon Co | Process and apparatus for producing an intermetallic compound |
US3752713A (en) * | 1970-02-14 | 1973-08-14 | Oki Electric Ind Co Ltd | Method of manufacturing semiconductor elements by liquid phase epitaxial growing method |
US3879235A (en) * | 1973-06-11 | 1975-04-22 | Massachusetts Inst Technology | Method of growing from solution materials exhibiting a peltier effect at the solid-melt interface |
US4012242A (en) * | 1973-11-14 | 1977-03-15 | International Rectifier Corporation | Liquid epitaxy technique |
US3948692A (en) * | 1974-06-24 | 1976-04-06 | Lev Vasilievich Golubev | Method of preparing multi-layer semiconductor hetero-structures on the basis of compounds AIII BV where AIII is a metal of group three and BV is a non-metal of group five |
US3993511A (en) * | 1975-05-30 | 1976-11-23 | North American Philips Corporation | High temperature electrical contact for Peltier-induced liquid phase epitaxy on intermetallic III-V compounds of gallium |
-
1976
- 1976-07-09 FR FR7621107A patent/FR2358021A1/fr active Granted
-
1977
- 1977-06-25 DE DE2728771A patent/DE2728771C2/de not_active Expired
- 1977-07-01 US US05/812,262 patent/US4133705A/en not_active Expired - Lifetime
- 1977-07-06 JP JP8004577A patent/JPS538563A/ja active Granted
- 1977-07-06 GB GB28294/77A patent/GB1581457A/en not_active Expired
Non-Patent Citations (1)
Title |
---|
NEANT * |
Also Published As
Publication number | Publication date |
---|---|
US4133705A (en) | 1979-01-09 |
JPS538563A (en) | 1978-01-26 |
DE2728771A1 (de) | 1978-01-12 |
GB1581457A (en) | 1980-12-17 |
DE2728771C2 (de) | 1986-07-24 |
JPS5516532B2 (fr) | 1980-05-02 |
FR2358021B1 (fr) | 1978-12-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |